scholarly journals High repetition rate, femtosecond and picosecond laser induced damage thresholds of Rb:KTiOPO_4 at 103 µm

2017 ◽  
Vol 7 (3) ◽  
pp. 744 ◽  
Author(s):  
Florian Bach ◽  
Mark Mero ◽  
Valdas Pasiskevicius ◽  
Andrius Zukauskas ◽  
Valentin Petrov
Keyword(s):  
Repetition Rate ◽  
Picosecond Laser ◽  
High Repetition Rate ◽  
High Repetition ◽  
Laser Induced Damage

Research on Industrial Processing Used High Repetition Rate Cavity-Dumping Mode-Locked Picosecond Laser

Applied laser ◽  
2013 ◽  
Vol 33 (2) ◽  
pp. 204-207
Author(s):  
杨超 Yang Chao ◽  
陈檬 Chen Meng ◽  
白振旭 Bai Zhenxu ◽  
伊肖静 Yi Xiaojing ◽  
李港 Li Gang
Keyword(s):  
Repetition Rate ◽  
Picosecond Laser ◽  
High Repetition Rate ◽  
Industrial Processing ◽  
High Repetition

scholarly journals High Repetition Rate UV versus VIS Picosecond Laser Fabrication of 3D Microfluidic Channels Embedded in Photosensitive Glass

Nanomaterials ◽  
2018 ◽  
Vol 8 (8) ◽  
pp. 583 ◽  
Author(s):  
Florin Jipa ◽  
Stefana Iosub ◽  
Bogdan Calin ◽  
Emanuel Axente ◽  
Felix Sima ◽  
...  
Keyword(s):  
Repetition Rate ◽  
Three Dimensional ◽  
Picosecond Laser ◽  
Basic Structure ◽  
High Repetition Rate ◽  
Microfluidic Channels ◽  
Hollow Structures ◽  
High Repetition ◽  
Glass Processing ◽  
Fs Laser

Glass is an alternative solution to polymer for the fabrication of three-dimensional (3D) microfluidic biochips. Femtosecond (fs) lasers are nowadays the most promising tools for transparent glass processing. Specifically, the multiphoton process induced by fs pulses enables fabrication of embedded 3D channels with high precision. The subtractive fabrication process creating 3D hollow structures in glass, known as fs laser-assisted etching (FLAE), is based on selective removal of the laser-modified regions by successive chemical etching in diluted hydrofluoric acid solutions. In this work we demonstrate the possibility to generate embedded hollow channels in photosensitive Foturan glass volume by high repetition rate picosecond (ps) laser-assisted etching (PLAE). In particular, the influence of the critical irradiation doses and etching rates are discussed in comparison of two different wavelengths of ultraviolet (355 nm) and visible (532 nm) ranges. Fast and controlled fabrication of a basic structure composed of an embedded micro-channel connected with two open reservoirs, commonly used in the biochip design, are achieved inside glass. Distinct advantages such as good aspect-ratio, reduced processing time for large areas, and lower fabrication cost are evidenced.

scholarly journals Direct Waveguide Writing with High Energy High Repetition Rate Picosecond Laser Pulses

2012 ◽  
Vol 39 ◽  
pp. 621-627 ◽  
Author(s):  
Ilya Alexeev ◽  
Kristian Cvecek ◽  
Jan Genser ◽  
Michael Schmidt
Keyword(s):  
Repetition Rate ◽  
Picosecond Laser ◽  
Laser Pulses ◽  
High Energy ◽  
High Repetition Rate ◽  
High Repetition ◽  
Picosecond Laser Pulses
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