scholarly journals Ultraviolet laser damage properties of single-layer SiO2 film grown by atomic layer deposition

2020 ◽  
Vol 10 (8) ◽  
pp. 1981
Author(s):  
Feng Geng ◽  
Haipeng Cheng ◽  
Qinghua Zhang ◽  
Mincai Liu ◽  
And Yaguo Li
Keyword(s):  
Atomic Layer Deposition ◽  
Single Layer ◽  
Atomic Layer ◽  
Sio2 Film ◽  
Laser Damage ◽  
Ultraviolet Laser ◽  
Layer Deposition

Laser Damage Properties of Optical Coatings with Nanoscale Layers Grown by Atomic Layer Deposition

2004 ◽  
Vol 43 (3) ◽  
pp. 1034-1035 ◽  
Author(s):  
Shin-ichi Zaitsu ◽  
Shinji Motokoshi ◽  
Takahisa Jitsuno ◽  
Masahiro Nakatsuka ◽  
Tatsuhiko Yamanaka
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Laser Damage ◽  
Optical Coatings ◽  
Layer Deposition

scholarly journals Atomic Layer Deposition of Titanium Oxide on Single-Layer Graphene: An Atomic-Scale Study toward Understanding Nucleation and Growth

2017 ◽  
Vol 29 (5) ◽  
pp. 2232-2238 ◽  
Author(s):  
Yucheng Zhang ◽  
Carlos Guerra-Nuñez ◽  
Ivo Utke ◽  
Johann Michler ◽  
Piyush Agrawal ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Oxide ◽  
Single Layer ◽  
Atomic Layer ◽  
Nucleation And Growth ◽  
Atomic Scale ◽  
Single Layer Graphene ◽  
Layer Graphene ◽  
Layer Deposition

Microstructural evolution of ZrO2–HfO2 nanolaminate structures grown by atomic layer deposition

2004 ◽  
Vol 19 (2) ◽  
pp. 643-650 ◽  
Author(s):  
Hyoungsub Kim ◽  
Paul C. McIntyre ◽  
Krishna C. Saraswat
Keyword(s):  
Surface Roughness ◽  
Atomic Layer Deposition ◽  
Microstructural Evolution ◽  
Single Layer ◽  
Atomic Layer ◽  
Individual Layer ◽  
Force Microscopy ◽  
Layer Sequence ◽  
Transmission Electron ◽  
Layer Deposition

Zirconia–hafnia (ZrO2–HfO2) nanolaminate structures were grown using the atomic layer deposition (ALD) technique with different stacking sequences and layer thickness layer thicknesses. The microstructural evolution and surface roughness were compared with those of single-layer ZrO2 or HfO2 films using transmission electron microscopy and atomic force microscopy. Thin single-layer ALD-ZrO2 films were polycrystalline and composed of the tetragonal ZrO2 phase as-deposited, whereas thicker (>14 nm) films were composed mainly of the monoclinic phase. HfO2 films were amorphous as-deposited and crystallized into primarily monoclinic during subsequent anneals at temperatures over 500 °C. All the nanolaminate structures having individual layer thicknesses greater than approximately 2 nm were crystalline (mixture of tetragonal and monoclinic phases) independent of layer sequence and also exhibited a layer-to-layer epitaxy relationship within each grain. However, the identity of the starting layer determined the final grain size and surface roughness of the nanolaminates. A qualitative model for the observed microstructure evolution of the laminate films is proposed.

scholarly journals Characterization of oxide barrier layers prepared by atomic layer deposition

2017 ◽  
Vol 9 (7) ◽  
pp. 168781401771180 ◽  
Author(s):  
Fa-Ta Tsai ◽  
Ching-Kong Chao ◽  
Kai-Jyun Jhong ◽  
Rwei-Ching Chang
Keyword(s):  
Water Vapor ◽  
Atomic Layer Deposition ◽  
Layer Structure ◽  
Transmission Rate ◽  
Single Layer ◽  
Atomic Layer ◽  
Optical Transmittance ◽  
Double Layer Structure ◽  
Layer Deposition ◽  
Water Vapor Transmission

Atomic layer deposition has become an important thin-film growth technique for producing gas diffusion barriers because of its low process temperature and its ability to produce uniform films. In this work, atomic layer deposition was used to deposit various Al2O3 and ZnO thin films on polyethylene terephthalate substrates; subsequently, the physical properties and water vapor transmission rates of the films were characterized. Single and hybrid films (Al2O3, ZnO, Al2O3/ZnO, and ZnO/Al2O3) with thicknesses of 25, 50, and 100 nm at a deposition temperature of 60°C were investigated. The deposited films were characterized for surface roughness, optical transmittance, adhesion, water vapor transmission rate, and contact angle. The results showed that the double-layer structure provided a higher water vapor transmission rate and higher adhesion strength than those of the single-layer structure although both the surface roughness and optical transmittance of the single-layer structure were slightly better than those of the double-layer structure. The results revealed that the atomic layer deposition-grown hybrids could act as water vapor barriers.

Temperature dependence of SiO2 film growth with plasma-enhanced atomic layer deposition

2012 ◽  
Vol 520 (11) ◽  
pp. 3994-3998 ◽  
Author(s):  
Akiko Kobayashi ◽  
Naoto Tsuji ◽  
Atsuki Fukazawa ◽  
Nobuyoshi Kobayashi
Keyword(s):  
Atomic Layer Deposition ◽  
Temperature Dependence ◽  
Film Growth ◽  
Atomic Layer ◽  
Sio2 Film ◽  
Layer Deposition

Laser damage properties of TiO_2/Al_2O_3 thin films grown by atomic layer deposition

2011 ◽  
Vol 50 (24) ◽  
pp. 4720 ◽  
Author(s):  
Yaowei Wei ◽  
Hao Liu ◽  
Ouyang Sheng ◽  
Zhichao Liu ◽  
Songlin Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Laser Damage ◽  
Layer Deposition

Optical and laser damage properties of HfO2/Al2O3 thin films deposited by atomic layer deposition

2016 ◽  
Vol 659 ◽  
pp. 288-294 ◽  
Author(s):  
Qinghua Zhang ◽  
Feng Pan ◽  
Jin Luo ◽  
Qian Wu ◽  
Zhen Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Laser Damage ◽  
Layer Deposition

Fabrication of Multilayer ZnO/TiO2/ZnO Thin Films with Enhancement of Optical Properties by Atomic Layer Deposition (ALD)

2013 ◽  
Vol 465-466 ◽  
pp. 916-921 ◽  
Author(s):  
Rosniza Hussin ◽  
Kwang Leong Choy ◽  
Xiang Hui Hou
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Atomic Layer Deposition ◽  
Single Layer ◽  
Atomic Layer ◽  
Degree Of Crystallinity ◽  
Multilayer Thin Films ◽  
Layer Deposition ◽  
Vis Spectroscopy ◽  
Wide Range

Atomic layer deposition (ALD) is a precision growth technique that is able to deposit either amorphous or epitaxial layer on a wide range of substrates. Multilayer thin films have been widely studied because their properties are different from those of bulk materials constituents owing to the two-dimensional films and high density of interfaces. Multilayer nanostructured thin films were fabricated on silicon and glass substrates by ALD. The optical and electrical of multilayer ZnO/TiO2/ZnO films were investigated. The microstructure compositions and surface morphology of these multilayer films were analyzed by X-ray diffraction (XRD), Atomic force microscope (AFM) and Scanning electron microscope (SEM). The optical properties were characterized using photoluminescence (PL) and UV-VIS spectroscopy. XRD patterns confirmed that ZnO with wutrtize crystal structure and TiO2 with anatase structure were presented. The degree of crystallinity of multilayer thin films has been improved through the deposition of ZnO. The intensity of UV luminescence of the multilayer has increased as compared to the single layer TiO2 and bilayer ZnO/TiO2. The multilayer ZnO/TiO2/ZnO has high transmittance (above 80%) in visible region. All the result suggested that the use of multilayer thin films effectively enhanced the quality of films crystallinity and optical properties as compared to single layer ZnO and bilayer ZnO/TiO2.

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