Sub-second infrared broadband-laser single-shot phase–amplitude polarimetry of thin films

2019 ◽  
Vol 44 (17) ◽  
pp. 4387 ◽  
Author(s):  
Andreas Furchner ◽  
Christoph Kratz ◽  
Karsten Hinrichs
Keyword(s):  
Thin Films ◽  
Single Shot ◽  
Broadband Laser ◽  
Phase Amplitude

Hyperspectral infrared laser polarimetry for single-shot phase–amplitude imaging of thin films

2019 ◽  
Vol 44 (19) ◽  
pp. 4893 ◽  
Author(s):  
Andreas Furchner ◽  
Christoph Kratz ◽  
Jörg Rappich ◽  
Karsten Hinrichs
Keyword(s):  
Thin Films ◽  
Infrared Laser ◽  
Single Shot ◽  
Laser Polarimetry ◽  
Phase Amplitude

scholarly journals Radiation damage to amorphous carbon thin films irradiated by multiple 46.9 nm laser shots below the single-shot damage threshold

2009 ◽  
Vol 105 (9) ◽  
pp. 093117 ◽  
Author(s):  
L. Juha ◽  
V. Hájková ◽  
J. Chalupský ◽  
V. Vorlíček ◽  
A. Ritucci ◽  
...  
Keyword(s):  
Thin Films ◽  
Radiation Damage ◽  
Amorphous Carbon ◽  
Damage Threshold ◽  
Single Shot ◽  
Carbon Thin Films

Observation of ultrafast amorphization dynamics in GeCu2Te3 thin films using echelon-based single-shot transient absorbance spectroscopy

2021 ◽  
Vol 119 (6) ◽  
pp. 061102
Author(s):  
Yusuke Arashida ◽  
Takayuki Suzuki ◽  
Shuhei Nara ◽  
Ikufumi Katayama ◽  
Yasuo Minami ◽  
...  
Keyword(s):  
Thin Films ◽  
Single Shot ◽  
Absorbance Spectroscopy ◽  
Transient Absorbance

scholarly journals Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser

2018 ◽  
Vol 26 (15) ◽  
pp. 19665 ◽  
Author(s):  
Igor Milov ◽  
Igor A. Makhotkin ◽  
Ryszard Sobierajski ◽  
Nikita Medvedev ◽  
Vladimir Lipp ◽  
...  
Keyword(s):  
Thin Films ◽  
Free Electron ◽  
Free Electron Laser ◽  
Single Shot ◽  
Extreme Uv

Single-Shot Few-Cycle Pulse Laser-induced Damage and Ablation of HfO2/SiO2-based Optical Thin Films

2019 ◽  
Author(s):  
Noah Talisa ◽  
Michael Tripepi ◽  
Brandon Harris ◽  
Abdallah AlShafey ◽  
Aaron Davenport ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulse Laser ◽  
Single Shot ◽  
Laser Induced Damage ◽  
Cycle Pulse

Combined Experimental and Theoretical Study of Femtosecond Laser Based Micro/Nano Machining of Ultra Thin Metallic Films

2003 ◽  
Author(s):  
Anant Chimmalgi ◽  
Costas P. Grigoropoulos
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
High Resolution ◽  
Femtosecond Laser ◽  
Atomic Force Microscope ◽  
Field Enhancement ◽  
Objective Lens ◽  
Single Shot ◽  
Metallic Films ◽  
Atomic Force

The effectiveness of ultra-short pulsed laser radiation for high-precision material processing and surface micro-modification, owing to the minimal thermal and mechanical damage, has been shown. Micro/Nano structuring of thin films is gaining widespread importance owing to ever-increasing applications in a variety of fields. The present study details femtosecond laser interaction with ultra thin metallic films at the micro and nano scales. Results of Microablation studies, carried out with an 800nm wavelength, 80fs pulse duration, femtosecond laser focused tightly using a long working distance objective lens, are discussed. A parametric study of single shot ablation and subsequent atomic force microscope characterization of the ablation craters is presented. The formation of elevated convex hillock structures at low laser pulse energies and considerable delamination at higher energies evinces a stress driven modification mechanism. Further, nanostructuring results on thin films carried out with femtosecond laser in conjunction with an atomic force microscope are presented. Various nanofeatures were machined with high spatial resolution (∼10–12nm), flexibility and repeatability by utilizing the local field enhancement in the near-field of the scanning probe tip irradiated with the laser beam. Attempting to understand the modification mechanism and the physics involved, numerical simulation studies were performed to evaluate the field enhancement underneath the tip and the ‘femtosecond laser–thin film’ interaction dynamics in general. Possible applications of thin film structuring may be in the areas of high-resolution nanolithography, controlled nanodeposition, ultra high-density data storage, high-resolution mask production and repair, nanoelectronics, nanophotonics and various nanobiotechnology related applications.

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