Complex refractive index measurement for atomic-layer materials via surface plasmon resonance holographic microscopy

2019 ◽  
Vol 44 (12) ◽  
pp. 2982 ◽  
Author(s):  
Siqing Dai ◽  
Hua Lu ◽  
Jiwei Zhang ◽  
Yuping Shi ◽  
Jiazhen Dou ◽  
...  
2015 ◽  
Vol 35 (5) ◽  
pp. 0512002
Author(s):  
陈强华 Chen Qianghua ◽  
刘景海 Liu Jinghai ◽  
罗会甫 Luo Huifu ◽  
何永熹 He Yongxi ◽  
罗军 Luo Jun ◽  
...  

Photonics ◽  
2021 ◽  
Vol 8 (2) ◽  
pp. 41
Author(s):  
Najat Andam ◽  
Siham Refki ◽  
Hidekazu Ishitobi ◽  
Yasushi Inouye ◽  
Zouheir Sekkat

The determination of optical constants (i.e., real and imaginary parts of the complex refractive index (nc) and thickness (d)) of ultrathin films is often required in photonics. It may be done by using, for example, surface plasmon resonance (SPR) spectroscopy combined with either profilometry or atomic force microscopy (AFM). SPR yields the optical thickness (i.e., the product of nc and d) of the film, while profilometry and AFM yield its thickness, thereby allowing for the separate determination of nc and d. In this paper, we use SPR and profilometry to determine the complex refractive index of very thin (i.e., 58 nm) films of dye-doped polymers at different dye/polymer concentrations (a feature which constitutes the originality of this work), and we compare the SPR results with those obtained by using spectroscopic ellipsometry measurements performed on the same samples. To determine the optical properties of our film samples by ellipsometry, we used, for the theoretical fits to experimental data, Bruggeman’s effective medium model for the dye/polymer, assumed as a composite material, and the Lorentz model for dye absorption. We found an excellent agreement between the results obtained by SPR and ellipsometry, confirming that SPR is appropriate for measuring the optical properties of very thin coatings at a single light frequency, given that it is simpler in operation and data analysis than spectroscopic ellipsometry.


2016 ◽  
Vol 8 (47) ◽  
pp. 8299-8305
Author(s):  
Xin Hong ◽  
Marta C. Lapsley ◽  
Yunjing Shang ◽  
Elizabeth A. H. Hall

A holistic approach was taken to consider the dielectric properties of absorbing labels and their effect on the minimum reflection is mapped for the Kretschmann SPR configuration.


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