Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength

2012 ◽  
Vol 37 (24) ◽  
pp. 5100 ◽  
Author(s):  
Johannes Overbuschmann ◽  
Julia Hengster ◽  
Stephan Irsen ◽  
Thomas Wilhein
Keyword(s):  
Extreme Ultraviolet ◽  
Fresnel Zone ◽  
Ion Beam ◽  
Fresnel Zone Plates ◽  
Ion Beam Lithography ◽  
Zone Plates ◽  
Ultraviolet Microscopy

scholarly journals Ion beam lithography for Fresnel zone plates in X-ray microscopy

2013 ◽  
Vol 21 (10) ◽  
pp. 11747 ◽  
Author(s):  
Kahraman Keskinbora ◽  
Corinne Grévent ◽  
Michael Bechtel ◽  
Markus Weigand ◽  
Eberhard Goering ◽  
...  
Keyword(s):  
Fresnel Zone ◽  
Ion Beam ◽  
Fresnel Zone Plates ◽  
X Ray ◽  
Ion Beam Lithography ◽  
Zone Plates

Focused ion beam fabrication procedures of x-ray micro fresnel zone plates

2007 ◽  
Vol 17 (3) ◽  
pp. 617-622 ◽  
Author(s):  
A Surpi ◽  
S Valizadeh ◽  
K Leifer ◽  
S Lagomarsino
Keyword(s):  
Focused Ion Beam ◽  
Fresnel Zone ◽  
Ion Beam ◽  
Fresnel Zone Plates ◽  
X Ray ◽  
Zone Plates

Fabrication of Fresnel zone plates with 25nm zone width using extreme ultraviolet holography

2010 ◽  
Vol 87 (5-8) ◽  
pp. 854-858 ◽  
Author(s):  
Sankha S. Sarkar ◽  
Harun H. Solak ◽  
Jörg Raabe ◽  
Christian David ◽  
J. Friso van der Veen
Keyword(s):  
Extreme Ultraviolet ◽  
Fresnel Zone ◽  
Fresnel Zone Plates ◽  
Zone Width ◽  
Zone Plates

Fast and easy fabrication methodology of Fresnel zone plates for the extreme ultraviolet and soft x-ray regions

2019 ◽  
Vol 58 (4) ◽  
pp. 1057 ◽  
Author(s):  
A. Schümmer ◽  
H.-Ch. Mertins ◽  
Claus Michael Schneider ◽  
Roman Adam ◽  
Stefan Trellenkamp ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Fresnel Zone ◽  
Fresnel Zone Plates ◽  
X Ray ◽  
Zone Plates

scholarly journals Fresnel zone plates made by holography in the extreme ultraviolet region

2009 ◽  
Vol 186 ◽  
pp. 012071 ◽  
Author(s):  
Sankha S Sarkar ◽  
Pratap K Sahoo ◽  
Harun H Solak ◽  
Christian David ◽  
J Friso van der Veen
Keyword(s):  
Extreme Ultraviolet ◽  
Fresnel Zone ◽  
Ultraviolet Region ◽  
Fresnel Zone Plates ◽  
Zone Plates

scholarly journals Efficient focusing of 8 keV X-rays with multilayer Fresnel zone plates fabricated by atomic layer deposition and focused ion beam milling. Erratum

2014 ◽  
Vol 21 (3) ◽  
pp. 640-640 ◽  
Author(s):  
Marcel Mayer ◽  
Kahraman Keskinbora ◽  
Corinne Grévent ◽  
Adriana Szeghalmi ◽  
Mato Knez ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Focused Ion Beam ◽  
Fresnel Zone ◽  
Ion Beam ◽  
Atomic Layer ◽  
X Rays ◽  
Fresnel Zone Plates ◽  
Zone Plates ◽  
Layer Deposition ◽  
Focused Ion Beam Milling

Corrections to the article by Mayeret al.[J. Synchrotron Rad.(2013),20, 433–440] are given.

Fabricating high-quality Fresnel zone plates by efficiently eliminating redeposition based on focused ion beam

2019 ◽  
Vol 58 (08) ◽  
pp. 1
Author(s):  
Jie Chen ◽  
Junhua Wang ◽  
Bangjun Ma ◽  
Xiaolong Wang ◽  
Dengpeng Yuan ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Fresnel Zone ◽  
Ion Beam ◽  
High Quality ◽  
Fresnel Zone Plates ◽  
Zone Plates

scholarly journals High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

2018 ◽  
Vol 9 ◽  
pp. 2049-2056 ◽  
Author(s):  
Kahraman Keskinbora ◽  
Umut Tunca Sanli ◽  
Margarita Baluktsian ◽  
Corinne Grévent ◽  
Markus Weigand ◽  
...  
Keyword(s):  
High Resolution ◽  
Fresnel Zone ◽  
Ion Beam ◽  
Process Conditions ◽  
High Resolution Imaging ◽  
Direct Writing ◽  
X Ray ◽  
Ion Beam Lithography ◽  
Zone Plates ◽  
Resolution Imaging

Fresnel zone plates (FZP) are diffractive photonic devices used for high-resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those enabled by modern lithography methods. In particular, ion beam lithography (IBL) is a noteworthy method thanks to its robust direct writing/milling capability. IBL allows for rapid prototyping of high-resolution FZPs that can be used for high-resolution imaging at soft X-ray energies. Here, we discuss improvements in the process enabling us to write zones down to 15 nm in width, achieving an effective outermost zone width of 30 nm. With a 35% reduction in process time and an increase in resolution by 26% compared to our previous results, we were able to resolve 21 nm features of a test sample using the FZP. The new process conditions are then applied for fabrication of large arrays of high-resolution zone plates. Results show that relatively large areas can be decorated with nanostructured devices via IBL by using multipurpose SEM/FIB instruments with potential applications in FEL focusing, extreme UV and soft X-ray lithography and as wavefront sensing devices for beam diagnostics.

scholarly journals Fabrication of Fresnel zone plates by holography in the extreme ultraviolet region

2008 ◽  
Vol 26 (6) ◽  
pp. 2160-2163 ◽  
Author(s):  
Sankha S. Sarkar ◽  
Pratap K. Sahoo ◽  
Harun H. Solak ◽  
Christian David ◽  
J. Friso Van der Veen
Keyword(s):  
Extreme Ultraviolet ◽  
Fresnel Zone ◽  
Ultraviolet Region ◽  
Fresnel Zone Plates ◽  
Zone Plates
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