Waveguides in three-dimensional photonic-bandgap materials by direct laser writing and silicon double inversion

2010 ◽  
Vol 36 (1) ◽  
pp. 67 ◽  
Author(s):  
I. Staude ◽  
G. von Freymann ◽  
S. Essig ◽  
K. Busch ◽  
M. Wegener
Keyword(s):  
Photonic Bandgap ◽  
Three Dimensional ◽  
Direct Laser Writing ◽  
Laser Writing ◽  
Photonic Bandgap Materials ◽  
Direct Laser ◽  
Bandgap Materials

scholarly journals Direct Laser Writing of Three- Dimensional Photonic Crystals with a Complete Photonic Bandgap in Chalcogenide Glasses

2006 ◽  
Vol 18 (3) ◽  
pp. 265-269 ◽  
Author(s):  
S. Wong ◽  
M. Deubel ◽  
F. Pérez-Willard ◽  
S. John ◽  
G. A. Ozin ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Chalcogenide Glasses ◽  
Photonic Bandgap ◽  
Three Dimensional ◽  
Direct Laser Writing ◽  
Laser Writing ◽  
Direct Laser

scholarly journals In-Situ Local Temperature Measurement During Three-Dimensional Direct Laser Writing

CLEO: 2013 ◽  
2013 ◽  
Author(s):  
Jonathan Mueller ◽  
Joachim Fischer ◽  
Yatin Jadavji Mange ◽  
Thomas Nann ◽  
Martin Wegener
Keyword(s):  
Temperature Measurement ◽  
Three Dimensional ◽  
Local Temperature ◽  
Direct Laser Writing ◽  
Laser Writing ◽  
Direct Laser

scholarly journals Challenges in a Hybrid Fabrication Process to Generate Metallic Polarization Elements with Sub-Wavelength Dimensions

Materials ◽  
2020 ◽  
Vol 13 (22) ◽  
pp. 5279
Author(s):  
Stefan Belle ◽  
Babette Goetzendorfer ◽  
Ralf Hellmann
Keyword(s):  
Final Height ◽  
Three Dimensional ◽  
Fabrication Process ◽  
Degree Of Polarization ◽  
Direct Laser Writing ◽  
Free Standing ◽  
Laser Writing ◽  
Additive Fabrication ◽  
Direct Laser ◽  
Sub Wavelength

We report on the challenges in a hybrid sub-micrometer fabrication process while using three dimensional femtosecond direct laser writing and electroplating. With this hybrid subtractive and additive fabrication process, it is possible to generate metallic polarization elements with sub-wavelength dimensions of less than 400 nm in the cladding area. We show approaches for improving the adhesion of freestanding photoresist pillars as well as of the metallic cladding area, and we also demonstrate the avoidance of an inhibition layer and sticking of the freestanding pillars. Three-dimensional direct laser writing in a positive tone photoresist is used as a subtractive process to fabricate free-standing non-metallic photoresist pillars with an area of about 850 nm × 1400 nm, a height of 3000 nm, and a distance between the pillars of less than 400 nm. In a subsequent additive fabrication process, these channels are filled with gold by electrochemical deposition up to a final height of 2200 nm. Finally, the polarization elements are characterized by measuring the degree of polarization in order to show their behavior as quarter- and half-wave plates.

Direct laser writing of three-dimensional photonic-crystal templates for telecommunications

2004 ◽  
Vol 3 (7) ◽  
pp. 444-447 ◽  
Author(s):  
Markus Deubel ◽  
Georg von Freymann ◽  
Martin Wegener ◽  
Suresh Pereira ◽  
Kurt Busch ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
Three Dimensional ◽  
Direct Laser Writing ◽  
Laser Writing ◽  
Dimensional Photonic Crystal ◽  
Direct Laser
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