Plasma Assisted Pulsed DC Magnetron Sputtering System for Optical Thin Film Coatings

2013 ◽  
Author(s):  
Keqi Zhang ◽  
Ralph Faber
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Optical Thin Film ◽  
Film Coatings ◽  
Thin Film Coatings ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering ◽  
Sputtering System

Deposition and Characterization of Aluminium Thin film Coatings using DC Magnetron Sputtering Process

2018 ◽  
Vol 5 (1) ◽  
pp. 2696-2704 ◽  
Author(s):  
M. Muralidhar Singh ◽  
G. Vijaya ◽  
M.S. Krupashankara ◽  
B.K. Sridhara ◽  
T.N. Shridhar
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Film Coatings ◽  
Thin Film Coatings

Effects of sputtering power toward the Al-doped ZnO thin Film prepared by pulsed DC magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6466-6471 ◽  
Author(s):  
Kittikhun Seawsakul ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Viyapol Pattantsetakul ◽  
Saksorn Limwichean ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Zno Thin Film ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Sputtering Power ◽  
Doped Zno ◽  
Pulsed Dc Magnetron Sputtering

scholarly journals Studies on Nanostructure Aluminium Thin Film Coatings Deposited using DC magnetron Sputtering Process

2016 ◽  
Vol 149 ◽  
pp. 012071 ◽  
Author(s):  
Muralidhar Singh M ◽  
Vijaya G ◽  
Krupashankara MS ◽  
B K Sridhara ◽  
T N Shridhar
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Film Coatings ◽  
Thin Film Coatings

scholarly journals High rate deposition of thin film CdTe solar cells by pulsed dc magnetron sputtering

MRS Advances ◽  
2016 ◽  
Vol 1 (14) ◽  
pp. 917-922 ◽  
Author(s):  
P.M. Kaminski ◽  
A. Abbas ◽  
S. Yilmaz ◽  
J. W. Bowers ◽  
J.M. Walls
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Process Condition ◽  
Cadmium Sulphide ◽  
High Rate ◽  
Soda Lime Glass ◽  
Transparent Conductor ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

ABSTRACTA new high rate deposition method has been used to fabricate thin film CdTe photovoltaic devices using pulsed dc magnetron sputtering. The devices have been deposited in superstrate configuration on to a commercial fluorine doped tin oxide transparent conductor on soda lime glass. The cadmium sulphide and cadmium telluride thin films were deposited from compound targets. The magnetrons were mounted vertically around a cylindrical chamber and the substrate carrier rotates so that the layers can be deposited sequentially. The substrates were held at 200°C during deposition, a process condition previously found to minimize the stress in the coatings. Optimization of the process involved a number of parameters including control of pulse frequency, power and working gas pressure. The devices deposited using the process are exceptionally uniform enabling the CdTe absorber thickness to be reduced to ∼1um. The as-deposited material is dense and columnar. The cadmium chloride treatment increases the grain size and removes planar defects. The microstructure of the films before and after activation has been characterized using a number of techniques including transmission electron microscopy, Energy Dispersive mapping and these measurements have been correlated to device performance. The deposition rate is much higher than can be obtained with radio-frequency sputtering and is comparable with methods currently used in thin film CdTe module manufacturing such as Vapour Transport Deposition and Close Space Sublimation.

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