scholarly journals Investigation of the tool influence function neighborhood effect in atmospheric pressure plasma processing based on an innovative reverse analysis method

2021 ◽  
Author(s):  
Peng Ji ◽  
DUO LI ◽  
Xing Su ◽  
Yuan Jin ◽  
Zheng Qiao ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Influence Function ◽  
Plasma Processing ◽  
Atmospheric Pressure Plasma ◽  
Neighborhood Effect ◽  
Analysis Method ◽  
Pressure Plasma ◽  
Tool Influence Function ◽  
Reverse Analysis

Research on atmospheric pressure plasma processing sewage

2013 ◽  
Author(s):  
Gui-cai Song ◽  
Yan-xiang Na ◽  
Xiao-long Dong ◽  
Xiao-liang Sun
Keyword(s):  
Atmospheric Pressure ◽  
Plasma Processing ◽  
Atmospheric Pressure Plasma ◽  
Pressure Plasma

scholarly journals Surface Texture Evolution of Fused Silica in a Combined Process of Atmospheric Pressure Plasma Processing and Bonnet Polishing

Coatings ◽  
2019 ◽  
Vol 9 (10) ◽  
pp. 676
Author(s):  
Xing Su ◽  
Chenglong Ji ◽  
Yang Xu ◽  
Duo Li ◽  
David Walker ◽  
...  
Keyword(s):  
Surface Texture ◽  
Atmospheric Pressure ◽  
Influence Function ◽  
Chemical Etching ◽  
Material Removal ◽  
Texture Evolution ◽  
Plasma Processing ◽  
Atmospheric Pressure Plasma ◽  
Combined Process ◽  
Bonnet Polishing

The increasing demand for precision optical components invokes the requirement of advanced fabrication techniques with high efficiency. Atmospheric pressure plasma processing (APPP), based on chemical etching, has a high material removal rate and a Gaussian-shaped influence function, which is suitable to generate complex structures and correct form errors. Because of the pure chemical etching, an optically smooth surface cannot be achieved using only APPP. Thus, bonnet polishing (BP) with a flexible membrane tool, also delivering a Gaussian influence-function, is introduced to smooth the surface after APPP. In this paper, the surface texture evolution in the combined process of APPP and BP is studied. The etched texture with increased removal depth of APPP is presented and analyzed. Subsequently, the processed substrates are smoothed by BP. The texture smoothing and the roughness improvement is investigated in detail. The experimental results show that the APPP etched pits coalesce with each other and transform into irregular convex-concave structures, with roughness degraded to about 25 nm arithmetical mean deviation (Ra). The APPP etched texture can be successfully smoothed to 1.5 nm Ra, with 0.2–1 μm material removal of BP.

scholarly journals Atmospheric Pressure Plasma Processing of an Optical Sinusoidal Grid

Micromachines ◽  
2019 ◽  
Vol 10 (12) ◽  
pp. 828 ◽  
Author(s):  
Duo Li ◽  
Na Li ◽  
Xing Su ◽  
Peng Ji ◽  
Bo Wang
Keyword(s):  
Surface Roughness ◽  
Atmospheric Pressure ◽  
Plasma Processing ◽  
Atmospheric Pressure Plasma ◽  
Degree Of Freedom ◽  
Generation Mechanism ◽  
Surface Generation ◽  
Pressure Plasma ◽  
Simulation And Experiment ◽  
Grid Surface

Sinusoidal grid with nanometric precision is adopted as a surface encoder to measure multiple degree-of-freedom motions. This paper proposes the atmospheric pressure plasma processing (APPP) technique to fabricate an optical sinusoidal grid surface. The characteristics of removal function and surface generation mechanism are firstly presented. Both simulation and experiment validate the effectiveness of APPP to fabricate a sinusoidal grid surface with nanometric precision. Post mechanical polishing experiments show that APPP features can be well maintained while the surface roughness is greatly reduced to meet the optical requirement.

Sign in / Sign up

Export Citation Format

Share Document