scholarly journals Generation and evolution of different terahertz singular beams from long gas-plasma filaments

2021 ◽  
Vol 29 (2) ◽  
pp. 996
Author(s):  
Honggeng Wang ◽  
Huangcheng Shangguan ◽  
Qiying Song ◽  
Yi Cai ◽  
Qinggang Lin ◽  
...  
Keyword(s):  
Gas Plasma ◽  
Plasma Filaments

Improving the Organic Semiconductor- Metal Contact Interface in Printed High Performance Organic TFTs

2012 ◽  
Vol 1402 ◽  
Author(s):  
Kanan Puntambekar ◽  
Lisa Stecker ◽  
Kurt Ulmer ◽  
Themistokles Afentakis ◽  
Steven Droes
Keyword(s):  
Organic Semiconductor ◽  
High Performance ◽  
Thin Film Transistor ◽  
Device Performance ◽  
Organic Thin Film ◽  
Contact Interface ◽  
Organic Thin Film Transistor ◽  
Metal Electrodes ◽  
Free Surfaces ◽  
Gas Plasma

ABSTRACTOptimization of the interface between the organic semiconductor (OSC) & the source-drain (S/D) electrode is critical in order to improve organic thin film transistor (OTFT) device performance. This process typically involves coating the metal S/D electrodes with an optimal self-assembled thiol layer; a process that requires pristine metal surfaces for successful treatment. Obtaining contamination free surfaces can be challenging in the case of printed metal electrodes. Here we demonstrate an effective strategy to address this issue by introducing a brief low power forming gas plasma treatment prior to the surface coating step. We show a two orders of magnitude decrease in the contact resistance as a result of this treatment.

scholarly journals Graphene-Based Electrodes in a Vanadium Redox Flow Battery Produced by Rapid Low-Pressure Combined Gas Plasma Treatments

2021 ◽  
Author(s):  
Sebastiano Bellani ◽  
Leyla Najafi ◽  
Mirko Prato ◽  
Reinier Oropesa-Nuñez ◽  
Beatriz Martín-García ◽  
...  
Keyword(s):  
Low Pressure ◽  
Vanadium Redox Flow Battery ◽  
Redox Flow Battery ◽  
Flow Battery ◽  
Plasma Treatments ◽  
Gas Plasma ◽  
Vanadium Redox

scholarly journals Application of a roller conveyor type plasma disinfection device with fungus-contaminated citrus fruits

AMB Express ◽  
2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Akikazu Sakudo ◽  
Yoshihito Yagyu
Keyword(s):  
Treatment Time ◽  
Citrus Fruit ◽  
Viable Cell ◽  
Cell Number ◽  
Viable Cell Number ◽  
Citrus Fruits ◽  
Decimal Reduction Time ◽  
Gas Plasma ◽  
Plasma Device ◽  
Time Required

AbstractEfficient methods to achieve the safe decontamination of agricultural products are needed. Here, we investigated the decontamination of citrus fruits to test the antifungal potential of a novel non-thermal gas plasma apparatus, termed a roller conveyer plasma instrument. This instrument generates an atmospheric pressure dielectric barrier discharge (APDBP) plasma on a set of rollers. Penicillium venetum was spotted onto the surface of the fruit or pericarps, as well as an aluminium plate to act as a control, before performing the plasma treatment. The results showed that viable cell number of P. venetum decreased with a decimal reduction time (D value or estimated treatment time required to reduce viable cell number by 90%) of 0.967 min on the aluminium plate, 2.90 min and 1.88 min on the pericarps of ‘Kiyomi’ (Citrus unshiu × C. sinensis) and ‘Kawano-natsudaidai’ (C. natsudaidai) respectively, and 2.42 min on the surface of ‘Unshu-mikan’ (C. unshiu). These findings confirmed a fungicidal effect of the plasma not only on an abiotic surface (aluminium plate) but also on a biotic surface (citrus fruit). Further development of the instrument by combining sorting systems with the plasma device promises an efficient means of disinfecting citrus fruits during food processing.

Tumor cell metabolism correlates with resistance to gas plasma treatment: The evaluation of three dogmas

2021 ◽  
Vol 167 ◽  
pp. 12-28
Author(s):  
Sander Bekeschus ◽  
Grit Liebelt ◽  
Jonas Menz ◽  
Julia Berner ◽  
Sanjeev Kumar Sagwal ◽  
...  
Keyword(s):  
Tumor Cell ◽  
Plasma Treatment ◽  
Cell Metabolism ◽  
Gas Plasma ◽  
Tumor Cell Metabolism

scholarly journals Mixed H2O/H2 Plasma-Induced Redox Reactions of Thin Uranium Oxide Films under UHV Conditions

2021 ◽  
Author(s):  
Ghada El Jamal ◽  
Thomas Gouder ◽  
Rachel Eloirdi ◽  
Evgenia Tereshina-Chitrova ◽  
Lukáš Horák ◽  
...  
Keyword(s):  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
Redox Reactions ◽  
Uranium Oxide ◽  
Oxide Films ◽  
X Ray ◽  
Gas Plasma

X-Ray Photoelectron Spectroscopy (XPS) has been used to study the effect of mixed H2O/H2 gas plasma on the surface of UO2, U2O5 and UO3 thin films at 400 °C. The...

scholarly journals Generation and confinement of microwave gas-plasma in photonic dielectric microstructure

2013 ◽  
Vol 21 (21) ◽  
pp. 25509 ◽  
Author(s):  
B. Debord ◽  
R. Jamier ◽  
F. Gérôme ◽  
O. Leroy ◽  
C. Boisse-Laporte ◽  
...  
Keyword(s):  
Gas Plasma

The Role of a Photoresist Film on Reverse Gas Plasma Etching of Chromium Films

1980 ◽  
Vol 19 (7) ◽  
pp. 1371-1376 ◽  
Author(s):  
Teruhiko Yamazaki ◽  
Yoshiki Suzuki ◽  
Jun Uno ◽  
Hidefumi Nakata
Keyword(s):  
Plasma Etching ◽  
Gas Plasma ◽  
Photoresist Film ◽  
Chromium Films
Sign in / Sign up

Export Citation Format

Share Document