scholarly journals Wafer-scale low-loss lithium niobate photonic integrated circuits

2020 ◽  
Vol 28 (17) ◽  
pp. 24452 ◽  
Author(s):  
Kevin Luke ◽  
Prashanta Kharel ◽  
Christian Reimer ◽  
Lingyan He ◽  
Marko Loncar ◽  
...  
Author(s):  
Kevin Luke ◽  
Prashanta Kharel ◽  
Christian Reimer ◽  
Lingyan He ◽  
Marko Loncar ◽  
...  

2017 ◽  
Vol 42 (4) ◽  
pp. 803 ◽  
Author(s):  
Lin Chang ◽  
Martin H. P. Pfeiffer ◽  
Nicolas Volet ◽  
Michael Zervas ◽  
Jon D. Peters ◽  
...  

Author(s):  
Rongbo Wu ◽  
Min Wang ◽  
Jian Xu ◽  
Jia Qi ◽  
Wei Chu ◽  
...  

We develop a technique for realizing lithium niobate on insulator (LNOI) waveguides of a multi-centimeter-length with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium (Cr) thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by the chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides is determined to be 0.452 nm with an atomic force microscope (AFM). The approach is compatible with other surface patterning technologies such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits.


2019 ◽  
Vol 44 (9) ◽  
pp. 2314 ◽  
Author(s):  
Lingyan He ◽  
Mian Zhang ◽  
Amirhassan Shams-Ansari ◽  
Rongrong Zhu ◽  
Cheng Wang ◽  
...  

Nanomaterials ◽  
2018 ◽  
Vol 8 (11) ◽  
pp. 910 ◽  
Author(s):  
Rongbo Wu ◽  
Min Wang ◽  
Jian Xu ◽  
Jia Qi ◽  
Wei Chu ◽  
...  

In this paper, we develop a technique for realizing multi-centimeter-long lithium niobate on insulator (LNOI) waveguides with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides was determined with an atomic force microscope to be 0.452 nm. The approach is compatible with other surface patterning technologies, such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits.


2019 ◽  
Vol 52 (21) ◽  
pp. 214001 ◽  
Author(s):  
P K J Singaravelu ◽  
G C R Devarapu ◽  
Sebastian A Schulz ◽  
Quentin Wilmart ◽  
Stéphane Malhouitre ◽  
...  

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