scholarly journals Fabrication of nano/micro dual-periodic structures by multi-beam evanescent wave interference lithography using spatial beats

2019 ◽  
Vol 27 (22) ◽  
pp. 31522
Author(s):  
Shuzo Masui ◽  
Yuki Torii ◽  
Masaki Michihata ◽  
Kiyoshi Takamasu ◽  
Satoru Takahashi
Keyword(s):  
Evanescent Wave ◽  
Periodic Structures ◽  
Interference Lithography ◽  
Wave Interference

Approach of enhancing exposure depth for evanescent wave interference lithography

2010 ◽  
Vol 87 (5-8) ◽  
pp. 1168-1171 ◽  
Author(s):  
Xiaoyun Niu ◽  
Yuming Qi ◽  
Jingquan Wang ◽  
Zhiyou Zhang ◽  
Jinglei Du ◽  
...  
Keyword(s):  
Evanescent Wave ◽  
Interference Lithography ◽  
Wave Interference

Evanescent wave interference lithography for surface nano-structuring

2007 ◽  
Vol T129 ◽  
pp. 35-37 ◽  
Author(s):  
Y Zhou ◽  
M H Hong ◽  
J Y H Fuh ◽  
L Lu ◽  
B S Lukiyanchuk
Keyword(s):  
Evanescent Wave ◽  
Interference Lithography ◽  
Wave Interference

2D periodic structures patterned on 3D surfaces by interference lithography for SERS

2018 ◽  
Vol 461 ◽  
pp. 171-174 ◽  
Author(s):  
Ivana Lettrichova ◽  
Agata Laurencikova ◽  
Dusan Pudis ◽  
Jozef Novak ◽  
Matej Goraus ◽  
...  
Keyword(s):  
Periodic Structures ◽  
Interference Lithography ◽  
3D Surfaces

Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography

2017 ◽  
Vol 170 ◽  
pp. 49-53 ◽  
Author(s):  
Jun Zhao ◽  
Yanqing Wu ◽  
Chaofan Xue ◽  
Shumin Yang ◽  
Liansheng Wang ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Periodic Structures ◽  
Interference Lithography ◽  
X Ray

Measuring Optical Properties of Advanced Nano/Micro-Periodic Structures Fabricated by Multi-Exposure Interference Lithography

2020 ◽  
Author(s):  
Shuzo Masui ◽  
Masaki Michihata ◽  
Kiyoshi Takamasu ◽  
Satoru Takahashi
Keyword(s):  
Periodic Structures ◽  
Low Cost ◽  
Industrial Applications ◽  
Interference Lithography ◽  
High Dispersion ◽  
Optical Elements ◽  
Precise Control ◽  
Periodic Grating ◽  
Interference Fringes ◽  
Multiple Interference

Abstract Functional optical elements based on nano/micro-periodic structures have attracted much attention. Since the fabrication of these dual-periodic structures requires precise control of periodicity, the semiconductor process such as an electron beam lithography has been mainly employed. However, these techniques have problems with expensive and low throughput for industrial applications. Therefore, there remains a need for low cost and high throughput fabrication methods of dual-periodic structures. Then we developed a multi-exposure interference lithography (MEIL) system using rotational Lloyd’s mirror interferometer to overcome these problems. The advantages of interference lithography are a large processing area and low cost. Our developed rotational Lloyd’s mirror setup enables us to a highly precise superposition of multiple interference fringes by multi-exposure. Furthermore, we developed a measurement setup for reflective diffractive elements using a two axial rotating stage and measured the diffraction properties of the fabricated dual-periodic diffraction gratings. In this paper, as a demonstration, we succeeded in the fabrication of high-dispersion diffraction grating with an enhanced diffraction efficiency of the −3rd order light. The fabricated shapes have a periodicity of 1997 nm and 665 nm. Furthermore, it was confirmed that the intensity of the −3rd order light was enhanced by about 10 times compared to the single periodic grating.

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