scholarly journals Two-step method for lens system design

2010 ◽  
Vol 18 (12) ◽  
pp. 13285 ◽  
Author(s):  
Lei Li ◽  
Qiong-Hua Wang ◽  
Xiao-Qing Xu ◽  
Da-Hai Li
Keyword(s):  
System Design ◽  
Lens System ◽  
Step Method ◽  
Lens System Design

Fly-eyes Lens System Design Based on the Multiplex Conjugate Imaging Principle for the CF-LCoS Projection with LED Illumination

2017 ◽  
Vol 46 (4) ◽  
pp. 422001
Author(s):  
刘鹏 LIU Peng ◽  
刘钦晓 LIU Qin-xiao ◽  
周海洋 ZHOU Hai-yang ◽  
江城 JIANG Cheng ◽  
余飞鸿 YU Fei-hong
Keyword(s):  
System Design ◽  
Lens System ◽  
Lens System Design

Compressed infrared mirror-lens system design

2007 ◽  
Author(s):  
Tao Ren ◽  
Jun Chang ◽  
Zhi-cheng Weng ◽  
Huilin Jiang ◽  
Xiaojie Cong
Keyword(s):  
System Design ◽  
Lens System ◽  
Lens System Design

Front view and panoramic side view videoscope lens system design

2014 ◽  
Vol 53 (29) ◽  
pp. H146
Author(s):  
Chen-Hung Lin ◽  
Li-Jen Hsiao ◽  
Jing-Ting Hsaio ◽  
Hoang Yan Lin
Keyword(s):  
System Design ◽  
Side View ◽  
Lens System ◽  
Front View ◽  
Lens System Design

scholarly journals Human-competitive lens system design with evolution strategies

2008 ◽  
Vol 8 (4) ◽  
pp. 1439-1452 ◽  
Author(s):  
Christian Gagné ◽  
Julie Beaulieu ◽  
Marc Parizeau ◽  
Simon Thibault
Keyword(s):  
System Design ◽  
Evolution Strategies ◽  
Lens System ◽  
Lens System Design

scholarly journals Local versus Global Optimization of Electron Lens System Design

2020 ◽  
Author(s):  
Neda Hesam Mahmoudi Nezhad ◽  
Mohamad Ghaffarian Niasar ◽  
Cornelis Wouter Hagen ◽  
Pieter Kruit
Keyword(s):  
Global Optimization ◽  
System Design ◽  
Lens System ◽  
Electron Lens ◽  
Lens System Design

scholarly journals Lens System Design by A Two Stage GA ``Solid EMO''

2008 ◽  
Vol 23 (3) ◽  
pp. 193-204 ◽  
Author(s):  
Masaharu Tanaka ◽  
Yohei Akimoto ◽  
Jun Sakuma ◽  
Isao Ono ◽  
Shigenobu Kobayashi
Keyword(s):  
System Design ◽  
Lens System ◽  
Two Stage ◽  
Lens System Design

Interpretation of irradiation-induced changes in electron diffractograms and images of extinction contours at low temperatures

1984 ◽  
Vol 42 ◽  
pp. 268-269
Author(s):  
E. Knapek ◽  
H. Formanek ◽  
G. Lefranc ◽  
I. Dietrich
Keyword(s):  
Low Temperatures ◽  
Carbon Films ◽  
Organic Crystals ◽  
Wide Spread ◽  
Lens System ◽  
Preparation Conditions ◽  
Thin Carbon ◽  
Electron Diffractograms ◽  
Diffraction Patterns ◽  
Induced Changes

A few years ago results on cryoprotection of L-valine were reported, where the values of the critical fluence De i.e, the electron exposure which decreases the intensity of the diffraction reflections by a factor e, amounted to the order of 2000 + 1000 e/nm2. In the meantime a discrepancy arose, since several groups published De values between 100 e/nm2 and 1200 e/nm2 /1 - 4/. This disagreement and particularly the wide spread of the results induced us to investigate more thoroughly the behaviour of organic crystals at very low temperatures during electron irradiation.For this purpose large L-valine crystals with homogenuous thickness were deposited on holey carbon films, thin carbon films or Au-coated holey carbon films. These specimens were cooled down to nearly liquid helium temperature in an electron microscope with a superconducting lens system and irradiated with 200 keU-electrons. The progress of radiation damage under different preparation conditions has been observed with series of electron diffraction patterns and direct images of extinction contours.

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