Characterization of ultra-short low-loss waveguide bends for compact Photonic Integrated Circuits

1999 ◽  
Author(s):  
M. Rajarajan ◽  
S.SA. Obayya ◽  
B.M.A. Rahman ◽  
K.T.V. Grattan ◽  
H.A. El-Mikati
Keyword(s):  
Integrated Circuits ◽  
Photonic Integrated Circuits ◽  
Low Loss ◽  
Waveguide Bends

Low-Loss Waveguide Bends by Advanced Shape for Photonic Integrated Circuits

2020 ◽  
Vol 38 (12) ◽  
pp. 3273-3279
Author(s):  
Jeong Hwan Song ◽  
Tangla D. Kongnyuy ◽  
Peter De Heyn ◽  
Sebastien Lardenois ◽  
Roelof Jansen ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Photonic Integrated Circuits ◽  
Low Loss ◽  
Waveguide Bends

Characterisation of low-loss waveguide bends with offset-optimisation for compact photonic integrated circuits

2000 ◽  
Vol 147 (6) ◽  
pp. 382 ◽  
Author(s):  
M. Rajarajan ◽  
S.S.A. Obayya ◽  
B.M.A. Rahman ◽  
K.T.V. Grattan ◽  
H.A. El-Mikati
Keyword(s):  
Integrated Circuits ◽  
Photonic Integrated Circuits ◽  
Low Loss ◽  
Waveguide Bends

scholarly journals Wafer-scale low-loss lithium niobate photonic integrated circuits

2020 ◽  
Author(s):  
Kevin Luke ◽  
Prashanta Kharel ◽  
Christian Reimer ◽  
Lingyan He ◽  
Marko Loncar ◽  
...  
Keyword(s):  
Lithium Niobate ◽  
Integrated Circuits ◽  
Photonic Integrated Circuits ◽  
Low Loss ◽  
Wafer Scale

Advanced waveguide bends for photonic integrated circuits

2019 ◽  
Author(s):  
Jeong Hwan Song ◽  
T.D. Kongnyuy ◽  
N. Hosseini ◽  
A. Stassen ◽  
R. Jansen ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Photonic Integrated Circuits ◽  
Waveguide Bends

scholarly journals Long Low-Loss-Litium Niobate on Insulator Waveguides with Sub-Nanometer Surface Roughness

Nanomaterials ◽  
2018 ◽  
Vol 8 (11) ◽  
pp. 910 ◽  
Author(s):  
Rongbo Wu ◽  
Min Wang ◽  
Jian Xu ◽  
Jia Qi ◽  
Wei Chu ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Integrated Circuits ◽  
Large Scale ◽  
Photonic Integrated Circuits ◽  
Surface Patterning ◽  
Propagation Loss ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Low Loss ◽  
Atomic Force

In this paper, we develop a technique for realizing multi-centimeter-long lithium niobate on insulator (LNOI) waveguides with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides was determined with an atomic force microscope to be 0.452 nm. The approach is compatible with other surface patterning technologies, such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits.

scholarly journals Photonic welding points for arbitrary on-chip optical interconnects

Nanophotonics ◽  
2018 ◽  
Vol 7 (10) ◽  
pp. 1679-1686 ◽  
Author(s):  
Zejie Yu ◽  
Yang Ma ◽  
Xiankai Sun
Keyword(s):  
Integrated Circuits ◽  
Low Loss ◽  
Photonic Networks ◽  
New Approach ◽  
Waveguide Bends ◽  
Arbitrary Configuration ◽  
Integration Density ◽  
On Chip ◽  
Insertion Losses ◽  
Further Development

AbstractPhotonic integrated circuits (PICs) are an ideal platform for chip-scale computation and communication. To date, the integration density remains an outstanding problem that limits the further development of PIC-based photonic networks. Achieving low-loss waveguide routing with arbitrary configuration is crucial for both classical and quantum photonic applications. To manipulate light flows on a chip, the conventional wisdom relies on waveguide bends of large bending radii and adiabatic mode converters to avoid insertion losses from radiation leakage and modal mismatch, respectively. However, those structures usually occupy large footprints and thus reduce the integration density. To overcome this difficulty, this work presents a fundamentally new approach to turn light flows arbitrarily within an ultracompact footprint. A type of “photonic welding points” joining two waveguides of an arbitrary intersecting angle has been proposed and experimentally demonstrated. These devices with a footprint of less than 4 μm2can operate in the telecommunication band over a bandwidth of at least 140 nm with an insertion loss of less than 0.5 dB. Their fabrication is compatible with photonic foundry processes and does not introduce additional steps beyond those needed for the waveguides. Therefore, they are suitable for the mass production of PICs and will enhance the integration density to the next level.

scholarly journals Polarimetry for Photonic Integrated Circuits

2019 ◽  
Vol 9 (15) ◽  
pp. 2987
Author(s):  
Moritz Baier ◽  
Axel Schoenau ◽  
Francisco M. Soares ◽  
Martin Schell
Keyword(s):  
Integrated Circuits ◽  
Photonic Integrated Circuits ◽  
The State ◽  
Polarization Dependence ◽  
Complete Picture ◽  
Wide Range ◽  
State Of Polarization ◽  
Matrix Yielding ◽  
Polarization Of Light

Photonic integrated circuits (PICs) play a key role in a wide range of applications. Very often, the performance of PICs depends strongly on the state of polarization of light. Classically, this is regarded as undesirable, but more and more applications emerge that make explicit use of polarization dependence. In either case, the characterization of the polarization properties of a PIC can be a nontrivial task. We present a way of characterizing PICs in terms of their full Müller matrix, yielding a complete picture of their polarization properties. The approach is demonstrated by carrying out measurements of fabricated PICs.

scholarly journals Low-loss, compact, spot-size-converter based vertical couplers for photonic integrated circuits

2019 ◽  
Vol 52 (21) ◽  
pp. 214001 ◽  
Author(s):  
P K J Singaravelu ◽  
G C R Devarapu ◽  
Sebastian A Schulz ◽  
Quentin Wilmart ◽  
Stéphane Malhouitre ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Photonic Integrated Circuits ◽  
Spot Size ◽  
Low Loss
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