Intensity distribution in passive and amplifying random media near localization threshold

2004 ◽  
Author(s):  
Alexey Yamilov ◽  
Hui Cao
Keyword(s):  
Intensity Distribution ◽  
Random Media ◽  
Localization Threshold

Structure images of Si, Ge and Mos2 crystals and some application to radiation damage studies

1978 ◽  
Vol 36 (1) ◽  
pp. 292-293 ◽  
Author(s):  
K. Izui ◽  
T. Nishida ◽  
S. Furuno ◽  
H. Otsu ◽  
S. Kuwabara
Keyword(s):  
Radiation Damage ◽  
Exposure Time ◽  
Gaussian Distribution ◽  
Intensity Distribution ◽  
Chromatic Aberration ◽  
Magnetic Lens

Recently we have observed the structure images of silicon in the (110), (111) and (100) projection respectively, and then examined the optimum defocus and thickness ranges for the formation of such images on the basis of calculations of image contrasts using the n-slice theory. The present paper reports the effects of a chromatic aberration and a slight misorientation on the images, and also presents some applications of structure images of Si, Ge and MoS2 to the radiation damage studies.(1) Effect of a chromatic aberration and slight misorientation: There is an inevitable fluctuation in the amount of defocus due to a chromatic aberration originating from the fluctuations both in the energies of electrons and in the magnetic lens current. The actual image is a results of superposition of those fluctuated images during the exposure time. Assuming the Gaussian distribution for defocus, Δf around the optimum defocus value Δf0, the intensity distribution, I(x,y) in the image formed by this fluctuation is given by

Random media with temperature controlled connectivity

1992 ◽  
Vol 2 (5) ◽  
pp. 503-510 ◽  
Author(s):  
F. Carmona ◽  
E. Valot ◽  
L. Servant ◽  
M. Ricci
Keyword(s):  
Random Media ◽  
Temperature Controlled

Investigation of particulate systems using optical pathlength spectroscopy

2000 ◽  
Vol 627 ◽  
Author(s):  
Gabriel Popescu ◽  
Aristide Dogariu
Keyword(s):  
Path Length ◽  
Random Media ◽  
Michelson Interferometer ◽  
Industrial Process ◽  
Optical Path Length ◽  
Industrial Applications ◽  
Optical Path ◽  
Interference Signal ◽  
Optical Length ◽  
Reference Mirror

ABSTRACTIn many industrial applications involving granular media, knowledge about the structural transformations suffered during the industrial process is desirable. Optical techniques are noninvasive, fast, and versatile tools for monitoring such transformations. We have recently introduced optical path-length spectroscopy as a new technique for random media investigation. The principle of the method is to use a partially coherent source in a Michelson interferometer, where the fields from a reference mirror and the sample are combined to obtain an interference signal. When the system under investigation is a multiple-scattering medium, by tuning the optical length of the reference arm, the optical path-length probability density of light backscattered from the sample is obtained. This distribution carries information about the structural details of the medium. In the present paper, we apply the technique of optical path-length spectroscopy to investigate inhomogeneous distributions of particulate dielectrics such as ceramics and powders. The experiments are performed on suspensions of systems with different solid loads, as well as on powders and suspensions of particles with different sizes. We show that the methodology is highly sensitive to changes in volume concentration and particle size and, therefore, it can be successfully used for real-time monitoring. In addition, the technique is fiber optic-based and has all the advantages associated with the inherent versatility.

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