Optimization study of the femtosecond laser-induced forward-transfer process with thin aluminum films

2007 ◽  
Vol 46 (21) ◽  
pp. 4650 ◽  
Author(s):  
Sudipta Bera ◽  
A. J. Sabbah ◽  
J. M. Yarbrough ◽  
C. G. Allen ◽  
Beau Winters ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Transfer Process ◽  
Aluminum Films ◽  
Optimization Study ◽  
Thin Aluminum ◽  
Forward Transfer

Time-Resolved, Laser-Induced Phase Transformation in Aluminum

1984 ◽  
Vol 35 ◽  
Author(s):  
S. Williamson ◽  
G. Mourou ◽  
J.C.M. Li
Keyword(s):  
Point Defect ◽  
Long Range ◽  
Rapid Heating ◽  
Range Order ◽  
Nucleation Theory ◽  
Long Range Order ◽  
Time Resolved ◽  
Aluminum Films ◽  
Thin Aluminum ◽  
Initial Nucleus

ABSTRACTThe technique of picosecond electron diffraction is used to time resolve the laser-induced melting of thin aluminum films. It is observed that under rapid heating conditions, the long range order of the lattice subsists for lattice temperatures well above the equilibrium point, indicative of superheating. This superheating can be verified by directly measuring the lattice temperature. The collapse time of the long range order is measured and found to vary from 20 ps to several nanoseconds according to the degree of superheating. Two interpretations of the delayed melting are offered, based on the conventional nucleation and point defect theories. While the nucleation theory provides an initial nucleus size and concentration for melting to occur, the point defect theory offers a possible explanation for how the nuclei are originally formed.

Experimental investigation of laser induced forward transfer process of metal thin films

2002 ◽  
Vol 186 (1-4) ◽  
pp. 221-226 ◽  
Author(s):  
T. Sano ◽  
H. Yamada ◽  
T. Nakayama ◽  
I. Miyamoto
Keyword(s):  
Thin Films ◽  
Experimental Investigation ◽  
Transfer Process ◽  
Metal Thin Films ◽  
Forward Transfer

scholarly journals Superlayer Residual Stress Effect on the Indentation Adhesion Measurements

1999 ◽  
Vol 594 ◽  
Author(s):  
Alex A. Volinsky ◽  
Neville R. Moody ◽  
William W. Gerberich
Keyword(s):  
Residual Stress ◽  
Sputter Deposition ◽  
Work Of Adhesion ◽  
Stress Effect ◽  
Aluminum Films ◽  
Nanoindentation Testing ◽  
Deposition Parameters ◽  
Thin Aluminum ◽  
Residual Stress Effect ◽  
Sputter Deposited

AbstractThe practical work of adhesion has been measured in thin aluminum films as a function of film thickness and residual stress. These films were sputter deposited onto thermally oxidized silicon wafers followed by sputter deposition of a one micron thick W superlayer. The superlayer deposition parameters were controlled to produce either a compressive residual stress of 1 GPa or a tensile residual stress of 100 MPa. Nanoindentation testing was then used to induce delamination and a mechanics based model for circular blister formation was used to determine practical works of adhesion. The resulting measured works of adhesion for all films between 100 nm and 1 μm thick was 30 J/m2 regardless of superlayer stress. However, films with the compressively stressed superlayers produced larger blisters than films with tensile stressed superlayers. In addition, these films were susceptible to radial cracking producing a high variability in average adhesion values.

Femtosecond laser induced nanostructuring of aluminum films of variable thickness

2017 ◽  
Vol 15 (1) ◽  
pp. 015901 ◽  
Author(s):  
S G Bezhanov ◽  
P A Danilov ◽  
A A Ionin ◽  
I V Kiseleva ◽  
S I Kudryashov ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Variable Thickness ◽  
Aluminum Films
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