A Wavefront Correction Algorithm based on AComplete Second-Order DM-SHWS Model for FSOCommunications

2021 ◽  
Author(s):  
Wenhao Yu ◽  
Jie Zhong ◽  
Gaojie Chen ◽  
Hongliang Mao ◽  
Haifeng Yang ◽  
...  
Keyword(s):  
Second Order ◽  
Correction Algorithm ◽  
Wavefront Correction

scholarly journals Closed loop, DM diversity-based, wavefront correction algorithm for high contrast imaging systems

2007 ◽  
Vol 15 (19) ◽  
pp. 12338 ◽  
Author(s):  
Amir Give'on ◽  
Ruslan Belikov ◽  
Stuart Shaklan ◽  
Jeremy Kasdin
Keyword(s):  
Closed Loop ◽  
Imaging Systems ◽  
High Contrast ◽  
Correction Algorithm ◽  
Contrast Imaging ◽  
Wavefront Correction ◽  
High Contrast Imaging

Large Field-of-View and Deep Tissue Optical Micro-Imaging Based on Parallel Wavefront Correction Algorithm

2018 ◽  
Vol 45 (12) ◽  
pp. 1207001
Author(s):  
赵琪 Zhao Qi ◽  
石鑫 Shi Xin ◽  
龚薇 Gong Wei ◽  
胡乐佳 Hu Lejia ◽  
郑瑶 Zheng Yao ◽  
...  
Keyword(s):  
Field Of View ◽  
Large Field ◽  
Correction Algorithm ◽  
Deep Tissue ◽  
Wavefront Correction

An optimized amplitude-weighting-wavefront correction algorithm in lasers system

2013 ◽  
Author(s):  
Qiao Xue ◽  
Lei Huang ◽  
Ping Yan ◽  
Mali Gong ◽  
Zexin Feng ◽  
...  
Keyword(s):  
Correction Algorithm ◽  
Wavefront Correction

An optimized amplitude-weighting wavefront correction algorithm in laser systems

Laser Physics ◽  
2013 ◽  
Vol 23 (9) ◽  
pp. 095302
Author(s):  
Q Xue ◽  
L Huang ◽  
P Yan ◽  
M L Gong ◽  
Y T Qiu ◽  
...  
Keyword(s):  
Correction Algorithm ◽  
Wavefront Correction ◽  
Laser Systems

Broadband wavefront correction algorithm for high-contrast imaging systems

2007 ◽  
Author(s):  
Amir Give'on ◽  
Brian Kern ◽  
Stuart Shaklan ◽  
Dwight C. Moody ◽  
Laurent Pueyo
Keyword(s):  
Imaging Systems ◽  
High Contrast ◽  
Correction Algorithm ◽  
Contrast Imaging ◽  
Wavefront Correction ◽  
High Contrast Imaging

Disappearance Voltage Determinations Using a Convergent Beam

1971 ◽  
Vol 29 ◽  
pp. 184-185
Author(s):  
W. L. Bell
Keyword(s):  
Second Order ◽  
Objective Method ◽  
Uniform Thickness ◽  
Rocking Curve ◽  
Crystal Perfection ◽  
Kikuchi Line ◽  
Central Maximum ◽  
Diffraction Patterns ◽  
Convergent Beam ◽  
Beam Technique

Disappearance voltages for second order reflections can be determined experimentally in a variety of ways. The more subjective methods, such as Kikuchi line disappearance and bend contour imaging, involve comparing a series of diffraction patterns or micrographs taken at intervals throughout the disappearance range and selecting that voltage which gives the strongest disappearance effect. The estimated accuracies of these methods are both to within 10 kV, or about 2-4%, of the true disappearance voltage, which is quite sufficient for using these voltages in further calculations. However, it is the necessity of determining this information by comparisons of exposed plates rather than while operating the microscope that detracts from the immediate usefulness of these methods if there is reason to perform experiments at an unknown disappearance voltage.The convergent beam technique for determining the disappearance voltage has been found to be a highly objective method when it is applicable, i.e. when reasonable crystal perfection exists and an area of uniform thickness can be found. The criterion for determining this voltage is that the central maximum disappear from the rocking curve for the second order spot.

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