scholarly journals Growth structure and electronic properties of ternary transition metal nitrides thin films

2010 ◽  
Author(s):  
Λουκάς Κουτσοκέρας
Keyword(s):  
Thin Films ◽  
Transition Metal ◽  
Electronic Properties ◽  
Metal Nitrides ◽  
Transition Metal Nitrides ◽  
Growth Structure

Electronic properties of transition-metal nitrides: The group-V and group-VI nitrides VN, NbN, TaN, CrN, MoN, and WN

1985 ◽  
Vol 31 (2) ◽  
pp. 752-761 ◽  
Author(s):  
D. A. Papaconstantopoulos ◽  
W. E. Pickett ◽  
B. M. Klein ◽  
L. L. Boyer
Keyword(s):  
Transition Metal ◽  
Electronic Properties ◽  
Metal Nitrides ◽  
Transition Metal Nitrides ◽  
Group Vi ◽  
Group V

Electronic properties of binary and ternary, hard and refractory transition metal nitrides

2010 ◽  
Vol 204 (12-13) ◽  
pp. 2038-2041 ◽  
Author(s):  
L.E. Koutsokeras ◽  
N. Hastas ◽  
S. Kassavetis ◽  
O. Valassiades ◽  
C. Charitidis ◽  
...  
Keyword(s):  
Transition Metal ◽  
Electronic Properties ◽  
Metal Nitrides ◽  
Transition Metal Nitrides

Material Design of Transition Metal Nitrides for Hard Coatings by Metal and Nonmetal Atom Substitution

2008 ◽  
Vol 373-374 ◽  
pp. 122-125 ◽  
Author(s):  
Tsuneo Suzuki ◽  
Jun Inoue ◽  
Hiroki Asami ◽  
Tomoya Ibi ◽  
Tadachika Nakayama ◽  
...  
Keyword(s):  
Thin Films ◽  
Transition Metal ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Material Design ◽  
Hard Coatings ◽  
Laser Deposition ◽  
Metal Nitrides ◽  
Transition Metal Nitrides ◽  
Nonmetal Atom

Cr-Me-N-O (Me; Ni, Cu and Mg) thin films have been designed and successfully prepared by the pulsed laser deposition (PLD) method. It was found that Me, which form the monoxide MeO, are effective for hardening the Cr(N,O) thin films.

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