Control of Periodicity in Mesoporous Silica Films with Aligned Mesochannels Prepared by a Sol–Gel Process

2012 ◽  
Vol 41 (7) ◽  
pp. 741-743 ◽  
Author(s):  
Atsushi Komoto ◽  
Wataru Kubo ◽  
Hirokatsu Miyata
Keyword(s):  
Mesoporous Silica ◽  
Sol Gel ◽  
Silica Films ◽  
Sol Gel Process

Preparation of mesoporous silica films using sol–gel process and argon plasma treatment

2004 ◽  
Vol 395 (1-3) ◽  
pp. 70-74 ◽  
Author(s):  
Alagappan Palaniappan ◽  
Jian Zhang ◽  
Xiaodi Su ◽  
Francis E.H. Tay
Keyword(s):  
Mesoporous Silica ◽  
Plasma Treatment ◽  
Sol Gel ◽  
Argon Plasma ◽  
Silica Films ◽  
Sol Gel Process

Nanostructured Doped Silica Films Application as Sensitive Layers for Chemical Sensors

2013 ◽  
Vol 684 ◽  
pp. 7-11
Author(s):  
Sergey Krutovertsev ◽  
Alla Tarasova ◽  
Olga Ivanova ◽  
Larisa Krutovertseva
Keyword(s):  
Initial Conditions ◽  
Sol Gel ◽  
Silica Films ◽  
Adsorption Activity ◽  
Developed Surface ◽  
Sol Gel Process ◽  
Sensitive Characteristics ◽  
The Right ◽  
Kinetics Of ◽  
Matrix Factors

The sensor behavior of nanostructured doped silica films produced by sol-gel way were examined. Hygroscopic substances and polyoxometalates were used as additives to make more significant sensitive characteristics of initial matrix. Factors that have effect on sol preparation and films forming were investigated. Adsorption activity of the sensitive films was studied and it was shown that the films had a highly developed surface with nano-size pores. Change of initial conditions of sol-gel process gives opportunity to influence on kinetics of gel formation and consequently, on structure and properties of final materials. The study showed that the conditions of the environment affected the sensors characteristics markedly, which can be improved by choosing of the right procedure of forming and treatment. Influence of type and additive substances quantity into doped films was discussed in the paper

Sol-gel process of non-linear optical silica films with organic chromophore as side chain

1996 ◽  
Vol 31 (9) ◽  
pp. 2443-2446 ◽  
Author(s):  
Po-Hou Sung ◽  
Shao-Ling Wu ◽  
Chien-Yang Lin
Keyword(s):  
Sol Gel ◽  
Side Chain ◽  
Silica Films ◽  
Sol Gel Process ◽  
Non Linear ◽  
Linear Optical ◽  
Organic Chromophore

Sol–gel derived mesoporous silica films using amphiphilic triblock copolymers

2003 ◽  
Vol 332 (1-3) ◽  
pp. 199-206 ◽  
Author(s):  
Nobuaki Kitazawa ◽  
Hideyoshi Namba ◽  
Masami Aono ◽  
Yoshihisa Watanabe
Keyword(s):  
Mesoporous Silica ◽  
Triblock Copolymers ◽  
Sol Gel ◽  
Silica Films

ChemInform Abstract: Sol-Gel-Derived Mesoporous Silica Films with Low Dielectric Constants.

ChemInform ◽  
2001 ◽  
Vol 32 (10) ◽  
pp. no-no
Author(s):  
Seana Seraji ◽  
Yun Wu ◽  
Michael Forbess ◽  
Steven J. Limmer ◽  
Tammy Chou ◽  
...  
Keyword(s):  
Mesoporous Silica ◽  
Sol Gel ◽  
Dielectric Constants ◽  
Silica Films ◽  
Low Dielectric

Textural characterization of porous silica films prepared by the sol–gel process

2004 ◽  
pp. 227-231
Author(s):  
G. L. T. Nascimento ◽  
L. M. Seara ◽  
B. R. A. Neves ◽  
N. D. S. Mohallem
Keyword(s):  
Sol Gel ◽  
Porous Silica ◽  
Silica Films ◽  
Textural Characterization ◽  
Sol Gel Process

Study on the Dielectric Properties of Hybrid and Porous Polyimide-Silica Films

2008 ◽  
Vol 47-50 ◽  
pp. 973-976 ◽  
Author(s):  
Yi He Zhang ◽  
Qing Song Su ◽  
Li Yu ◽  
Hong Zheng ◽  
Hai Tao Huang ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Sol Gel ◽  
Silica Particles ◽  
Low Dielectric Constant ◽  
Hybrid Films ◽  
Porous Films ◽  
Silica Films ◽  
Low Dielectric ◽  
Dimethyl Acetamide ◽  
Sol Gel Process

A sol-gel process was used to prepare polyimide-silica hybrid films from the polyimide precursors and TEOS in N,N- dimethyl acetamide, then the hybrid film was treated with hydrofluoric acid to remove the dispersed silica particles, leaving pores with diameters between 80nm to 1µm, depending on the size of silica particles. The structure and dielectric constant of the hybrid and porous films were characterized by FTIR,SEM. The porous films displayed relatively low dielectric constant compared to the hybrid polyimide-silica films.

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