scholarly journals FACILE AND HIGHLY SELECTIVE SYNTHESIS OF 2,2-DIALKYL-1,5-LACTONES BY THE CALBOXYLATION OF PRIMARY, TERTIARY-1,4-DIOLS WITH FORMIC ACID OR COPPER(I)CARBONYLS IN THE PRESENCE OF CONCENTRATED SULFURIC ACID

1982 ◽  
Vol 11 (8) ◽  
pp. 1187-1188 ◽  
Author(s):  
Yukio Takahashi ◽  
Norihiko Yoneda ◽  
Hiroshi Nagai
Keyword(s):  
Sulfuric Acid ◽  
Formic Acid ◽  
Selective Synthesis ◽  
Concentrated Sulfuric Acid

A Headspace Gas Chromatographic Method for Determination of Formic acid Content in Isosulfan Blue and in Various Drugs

2021 ◽  
Vol 37 (2) ◽  
pp. 321-329
Author(s):  
Nilesh Takale ◽  
Neelakandan Kaliyaperumal ◽  
Gopalakrishnan Mannathusamy ◽  
Rajarajan Govindasamy
Keyword(s):  
Sulfuric Acid ◽  
Formic Acid ◽  
Chromatographic Method ◽  
Isopropyl Alcohol ◽  
Class Iii ◽  
Drug Substances ◽  
Headspace Gas ◽  
Concentrated Sulfuric Acid ◽  
Gas Chromatographic Method

The Pharmaceutical industry uses formic acid in the manufacturing of various drug substances or API. At the time of manufacturing of API formic acid is use as an oxidizing agent. Formic acid is the simplest carboxylic acid. It also called methanoic acid.Formic acid present in API at high concentrations is very hazardous but in low concentrations is very beneficial. The developed and validated method was short, precise, cost effective and reproducible with FID detector and easy to use. The method is a selective and superficial analytical method for determination of formic acid in different drug substances. We report here the development and validation study of headspace gas chromatographic method to determine formic acid in different drug substances we are reported here. As per this method, the drug sample was dissolved in 0.1% (v/v) of concentrated sulfuric acid in isopropyl alcohol (IPA) in a GC headspace vial and 0.1% (v/v) of concentrated sulfuric acid in isopropyl alcohol used as a diluent. A AB-Inowax capillary column (30 m x 0.32 mm I.D. and 0.5 µm film thickness) was used under gradient conditions with FID. The formic acid peak was well separated from all other solvents that are used in synthesis of particular drug substance. The LOD and LOQof the method for formic acid are 82 ppm and 249 ppm respectively. Formic acid are low toxic class-III solvent as per ICH guideline.

scholarly journals A Headspace Gas Chromatographic Method for Determination of Formic Acid Content in Isosulfan Blue and Various Drug Substances

2021 ◽  
Vol 37 (02) ◽  
pp. 321-329
Author(s):  
Nilesh Takale ◽  
Neelakandan Kaliyaperumal ◽  
Gopalakrishnan Mannathusamy ◽  
Rajarajan Govindasamy
Keyword(s):  
Sulfuric Acid ◽  
Formic Acid ◽  
Chromatographic Method ◽  
Isopropyl Alcohol ◽  
Class Iii ◽  
Drug Substances ◽  
Headspace Gas ◽  
Concentrated Sulfuric Acid ◽  
Gas Chromatographic Method

The Pharmaceutical industry uses formic acid in the manufacturing of various drug substances or API. At the time of manufacturing of API formic acid is use as an oxidizing agent. Formic acid is the simplest carboxylic acid. It also called methanoic acid.Formic acid present in API at high concentrations is very hazardous but in low concentrations is very beneficial. The developed and validated method was short, precise, cost effective and reproducible with FID detector and easy to use. The method is a selective and superficial analytical method for determination of formic acid in different drug substances. We report here the development and validation study of headspace gas chromatographic method to determine formic acid in different drug substances we are reported here. As per this method, the drug sample was dissolved in 0.1% (v/v) of concentrated sulfuric acid in isopropyl alcohol (IPA) in a GC headspace vial and 0.1% (v/v) of concentrated sulfuric acid in isopropyl alcohol used as a diluent. A AB-Inowax capillary column (30 m x 0.32 mm I.D. and 0.5 µm film thickness) was used under gradient conditions with FID. The formic acid peak was well separated from all other solvents that are used in synthesis of particular drug substance. The LOD and LOQof the method for formic acid are 82 ppm and 249 ppm respectively. Formic acid are low toxic class-III solvent as per ICH guideline.

Gallium Arsenide Integrated Circuits Decapsulation Technique Using Mixed Acid Chemistry For Die-Level Failure Analysis

2018 ◽  
Author(s):  
Harold Jeffrey M. Consigo ◽  
Ricardo S. Calanog ◽  
Melissa O. Caseria
Keyword(s):  
Gallium Arsenide ◽  
Sulfuric Acid ◽  
Nitric Acid ◽  
Integrated Circuits ◽  
Failure Analysis ◽  
Mixed Acid ◽  
Optimum Parameters ◽  
Plastic Package ◽  
Fuming Nitric Acid ◽  
Concentrated Sulfuric Acid

Abstract Gallium Arsenide (GaAs) integrated circuits have become popular these days with superior speed/power products that permit the development of systems that otherwise would have made it impossible or impractical to construct using silicon semiconductors. However, failure analysis remains to be very challenging as GaAs material is easily dissolved when it is reacted with fuming nitric acid used during standard decapsulation process. By utilizing enhanced chemical decapsulation technique with mixture of fuming nitric acid and concentrated sulfuric acid at a low temperature backed with statistical analysis, successful plastic package decapsulation happens to be reproducible mainly for die level failure analysis purposes. The paper aims to develop a chemical decapsulation process with optimum parameters needed to successfully decapsulate plastic molded GaAs integrated circuits for die level failure analysis.

PRODUCTION OF SULFOCATIONITE BY MODIFICATION OF NATURAL COAL WITH CONCENTRATED SULFURIC ACID

2020 ◽  
Vol 3 (441) ◽  
pp. 104-109
Author(s):  
N.A. Bektenov ◽  
◽  
N.C. Murzakassymova ◽  
M.A. Gavrilenko ◽  
А.N. Nurlybayeva ◽  
...  
Keyword(s):  
Sulfuric Acid ◽  
Concentrated Sulfuric Acid ◽  
Natural Coal

Addition of primary alcohols to 3-chlorononafluoro-1,5-hexadiene and perfluoro-1,3,5-hexatriene

1985 ◽  
Vol 50 (8) ◽  
pp. 1714-1726 ◽  
Author(s):  
Václav Dědek ◽  
Igor Linhart ◽  
Milan Kováč
Keyword(s):  
Sulfuric Acid ◽  
Primary Alcohols ◽  
Principal Product ◽  
Allyl Rearrangement ◽  
Concentrated Sulfuric Acid ◽  
Sodium Alkoxide

Sodium alkoxide-catalyzed addition of methanol, ethanol and propanol to 3-chlorononafluoro-1,5-hexadiene (I) proceeds at temperatures -35 °C to 8 °C with allyl rearrangement, affording 1,6-dialkoxy-1,1,2,3,4,4,5,6,6-octafluoro-2,4-hexadiene (V) as the principal product, along with 1,6-dialkoxy-1,2,3,3,4,5,6,6-octafluoro-1,5-diene (VI) and trans-1,6-dialkoxy-1,1,2,3,4,4,5,6,6-nonafluoro-2-hexene (VII). The ethers Va-Vc consist of the cis,trans- and trans,trans-isomers in about 3 : 1 ratio, whereas the ethers VIa-VIc have trans,trans-configuration. Ethers Vc and VIc react with concentrated sulfuric acid to give dipropyl 2,3,4,5-tetrafluoro-2,4-hexadienedioate (IX) and dipropyl 2,3,4,4,5-pentafluoro-2-hexenedioate (X), respectively, whereas the ether VIIc affords a mixture of propyl 6-propyloxy-2,3,4,4,5,6-heptafluoro-2-hexenoate (XI) and ester X. Addition of methanol to perfluoro-1,3,5-hexatriene (II) affords 1,1,2,3,4,5,6,6-octafluoro-1,6-dimethoxy-3-hexene (XIII) as the principal product.

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