Estimation of the Surface-Diffusion Coefficient in Gas-Phase Adsorption Using Octadecylsilyl-Silica Gel

1998 ◽  
Vol 71 (8) ◽  
pp. 1755-1761
Author(s):  
Kanji Miyabe ◽  
Shigeya Takeuchi ◽  
Yoshisato Tezuka
Keyword(s):  
Diffusion Coefficient ◽  
Gas Phase ◽  
Surface Diffusion ◽  
Silica Gel ◽  
Surface Diffusion Coefficient ◽  
Gas Phase Adsorption

scholarly journals FLATTENING OF A SCRATCH ON SINGLE CRYSTAL ICE SURFACE

Anales AFA ◽  
2020 ◽  
Vol 31 (3) ◽  
pp. 86-92
Author(s):  
G. Aguirre Varela ◽  
◽  
D. Stoler Flores ◽  
P.I. Achával ◽  
C.L. Di Prinzio
Keyword(s):  
Diffusion Coefficient ◽  
Single Crystal ◽  
Surface Diffusion ◽  
Silica Gel ◽  
Three Dimensional ◽  
Confocal Microscope ◽  
Surface Diffusion Coefficient ◽  
Diffusion Transport ◽  
Ice Surface ◽  
Activated Silica Gel

The surface of a monocrystalline ice sample was observed at −5 ◦C (268 K). For which it was superficially polished and allowed to evolve in the presence of activated silica gel for three hours. The evolution of a depression was studied using three-dimensional micrographs obtained with an Olympus OLS4000 LEXT confocal microscope. A predominance of surface diffusion transport was found in the evolution of the depression. This is based both on the value obtained for the surface diffusion coefficient, as well as on the values found for the exponents corresponding to the evolution of the depth of the well and its width.

Reduction of the Defect Density in a-Si:H Deposited at ≤250°C

1993 ◽  
Vol 297 ◽  
Author(s):  
Hitoshi Nishio ◽  
Gautam Ganguly ◽  
Akihisa Matsuda
Keyword(s):  
Diffusion Coefficient ◽  
Amorphous Silicon ◽  
Surface Diffusion ◽  
Film Growth ◽  
Defect Density ◽  
Hydrogenated Amorphous Silicon ◽  
Device Fabrication ◽  
Surface Diffusion Coefficient ◽  
Hydrogenated Amorphous ◽  
Substrate Temperatures

We present a method to reduce the defect density in hydrogenated amorphous silicon (a-Si:H) deposited at low substrate temperatures similar to those used for device fabrication . Film-growth precursors are energized by a heated mesh to enhance their surface diffusion coefficient and this enables them to saturate more surface dangling bonds.

Temperature dependence of the surface diffusion coefficient of K atoms on Pd{111} measured with PEEM

1996 ◽  
Vol 352-354 ◽  
pp. 546-551 ◽  
Author(s):  
M. Šnábl ◽  
M. Ondřejček ◽  
V. Cháb ◽  
W. Stenzel ◽  
H. Conrad ◽  
...  
Keyword(s):  
Diffusion Coefficient ◽  
Temperature Dependence ◽  
Surface Diffusion ◽  
Surface Diffusion Coefficient

scholarly journals The surface diffusion coefficient of Al2O3 obtained by free sintering.

1977 ◽  
Vol 85 (980) ◽  
pp. 185-189 ◽  
Author(s):  
Wazo KOMATSU ◽  
Yusuke MORIYOSHI ◽  
S. K. MOON ◽  
Hideaki KAMATA ◽  
Shigeyuki KURASHIMA
Keyword(s):  
Diffusion Coefficient ◽  
Surface Diffusion ◽  
Surface Diffusion Coefficient

Coverage dependence of the surface diffusion coefficient for hydrogen on Ru(001)

1987 ◽  
Vol 191 (1-2) ◽  
pp. 108-120 ◽  
Author(s):  
C.H. Mak ◽  
J.L. Brand ◽  
B.G. Koehler ◽  
S.M. George
Keyword(s):  
Diffusion Coefficient ◽  
Surface Diffusion ◽  
Surface Diffusion Coefficient ◽  
Coverage Dependence

Grain boundary grooving by surface diffusion in SrTiO3 bicrystal

1999 ◽  
Vol 14 (6) ◽  
pp. 2548-2553 ◽  
Author(s):  
Minxian Jin ◽  
Eriko Shimada ◽  
Yasuro Ikuma
Keyword(s):  
Diffusion Coefficient ◽  
Grain Boundary ◽  
Surface Diffusion ◽  
Diffusion Coefficients ◽  
Present Experiment ◽  
Titanium Atom ◽  
Boundary Groove ◽  
Surface Diffusion Coefficient ◽  
Atomic Force ◽  
Different Temperatures

High-purity SrTiO3 bicrystal sample (the angle between two [001] directions is 24°) was used in the present experiment to develop a thermal grain boundary groove along the bicrystal grain boundary at different temperatures (1150–1400 °C) and times (15–6720 min) in air. An atomic force microscope (AFM) was used to observe the surface morphological change in the annealed bicrystal sample in order to measure the width W and depth h of the developed grain boundary groove. It was found that the log W–log t (at 1150–1400 °C) and the log h°log t (at 1400 °C) relationships are approximately linear, having slopes of approximately 1/4. Using Mullins' formulas, the surface diffusion coefficients of SrTiO3 at different temperatures were calculated. Finally, the surface diffusion coefficient determined in the present experiment appears to correspond to the titanium atom, which has the lowest diffusivity in SrTiO3.

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