Particle Beam Scanning *

2018 ◽  
pp. 169-203
Author(s):  
Jacob Flanz
Keyword(s):  
Particle Beam ◽  
Beam Scanning

Analysis and Interpretation of Test Beam Data

2018 ◽  
Author(s):  
Richard Wigmans
Keyword(s):  
Energy Resolution ◽  
Particle Physics ◽  
Particle Beam ◽  
Test Beam ◽  
Term Energy ◽  
The Many ◽  
Physics Experiment ◽  
The Way

This chapter describes some of the many pitfalls that may be encountered when developing the calorimeter system for a particle physics experiment. Several of the examples chosen for this chapter are based on the author’s own experience. Typically, the performance of a new calorimeter is tested in a particle beam provided by an accelerator. The potential pitfalls encountered in correctly assessing this performance both concern the analysis and the interpretation of the data collected in such tests. The analysis should be carried out with unbiased event samples. Several consequences of violating this principle are illustrated with practical examples. For the interpretation of the results, it is very important to realize that the conditions in a testbeam are fundamentally different than in practice. This has consequences for the meaning of the term “energy resolution”. It is shown that the way in which the results of beam tests are quoted may create a misleading impression of the quality of the tested instrument.

scholarly journals High frame-rate multichannel beam-scanning microscopy based on Lissajous trajectories

2014 ◽  
Vol 22 (20) ◽  
pp. 24224 ◽  
Author(s):  
Shane Z. Sullivan ◽  
Ryan D. Muir ◽  
Justin A. Newman ◽  
Mark S. Carlsen ◽  
Suhas Sreehari ◽  
...  
Keyword(s):  
Frame Rate ◽  
Scanning Microscopy ◽  
Beam Scanning ◽  
High Frame Rate ◽  
Lissajous Trajectories

scholarly journals Charged particle single nanometre manufacturing

2018 ◽  
Vol 9 ◽  
pp. 2855-2882 ◽  
Author(s):  
Philip D Prewett ◽  
Cornelis W Hagen ◽  
Claudia Lenk ◽  
Steve Lenk ◽  
Marcus Kaestner ◽  
...  
Keyword(s):  
Charged Particle ◽  
High Throughput ◽  
Nanoimprint Lithography ◽  
Ion Beam ◽  
Ambient Air ◽  
Particle Beam ◽  
Vacuum System ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Charged Particle Beam

Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled “Single Nanometre Manufacturing: Beyond CMOS”. Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C60 molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The second technology, focused electron induced processing (FEBIP), uses a nozzle-dispensed precursor gas either to etch or to deposit patterns on the nanometre scale without the need for resist. The process has potential for high throughput enhancement using multiple electron beams and a system employing up to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe lithography, FE-eSPL. This has been developed out of scanning tunneling microscopy using lower-energy electrons (tens of electronvolts rather than the tens of kiloelectronvolts of the other techniques). It has the considerable advantage of being employed without the need for a vacuum system, in ambient air and is capable of sub-10 nm patterning using either developable resists or a self-developing mode applicable for many polymeric resists, which is preferred. Like FEBIP it is potentially capable of massive parallelization for applications requiring high throughput.

scholarly journals High-Q MEMS Resonators for Laser Beam Scanning Displays

Micromachines ◽  
2012 ◽  
Vol 3 (2) ◽  
pp. 509-528 ◽  
Author(s):  
Ulrich Hofmann ◽  
Joachim Janes ◽  
Hans-Joachim Quenzer
Keyword(s):  
Laser Beam ◽  
Beam Scanning ◽  
High Q ◽  
Mems Resonators ◽  
Laser Beam Scanning
Sign in / Sign up

Export Citation Format

Share Document