Prediction of particle removal using surfactants

2006 ◽  
pp. 325-336
Keyword(s):  
Particle Removal

The E-ring: interactions with plasma and implications for its evolution

1984 ◽  
Vol 75 ◽  
pp. 599-602
Author(s):  
T.V. Johnson ◽  
G.E. Morfill ◽  
E. Grun
Keyword(s):  
Time Scale ◽  
Particle Density ◽  
High Energy ◽  
Particle Removal ◽  
Density Region ◽  
Drag Forces ◽  
Orbit Evolution ◽  
History Of ◽  
Ring Particle ◽  
Ring Material

A number of lines of evidence suggest that the particles making up the E-ring are small, on the order of a few microns or less in size (Terrile and Tokunaga, 1980, BAAS; Pang et al., 1982 Saturn meeting; Tucson, AZ). This suggests that a variety of electromagnetic and plasma affects may be important in considering the history of such particles. We have shown (Morfill et al., 1982, J. Geophys. Res., in press) that plasma drags forces from the corotating plasma will rapidly evolve E-ring particle orbits to increasing distance from Saturn until a point is reached where radiation drag forces acting to decrease orbital radius balance this outward acceleration. This occurs at approximately Rhea's orbit, although the exact value is subject to many uncertainties. The time scale for plasma drag to move particles from Enceladus' orbit to the outer E-ring is ~104yr. A variety of effects also act to remove particles, primarily sputtering by both high energy charged particles (Cheng et al., 1982, J. Geophys. Res., in press) and corotating plasma (Morfill et al., 1982). The time scale for sputtering away one micron particles is also short, 102 - 10 yrs. Thus the detailed particle density profile in the E-ring is set by a competition between orbit evolution and particle removal. The high density region near Enceladus' orbit may result from the sputtering yeild of corotating ions being less than unity at this radius (e.g. Eviatar et al., 1982, Saturn meeting). In any case, an active source of E-ring material is required if the feature is not very ephemeral - Enceladus itself, with its geologically recent surface, appears still to be the best candidate for the ultimate source of E-ring material.

scholarly journals Influence of Ozone Treatment on Ultrafiltration Performance and Nutrient Flow in a Membrane Based Nutrient Recovery Process from Anaerobic Digestate

Membranes ◽  
2020 ◽  
Vol 10 (4) ◽  
pp. 64 ◽  
Author(s):  
Tobias Gienau ◽  
Artjom Ehrmanntraut ◽  
Matthias Kraume ◽  
Sandra Rosenberger
Keyword(s):  
Membrane Filtration ◽  
Recovery Process ◽  
Ozone Treatment ◽  
Organic N ◽  
Nutrient Concentrations ◽  
Particle Removal ◽  
Process Chain ◽  
K Fertilizer ◽  
P Fertilizer ◽  
Biogas Plants

Membrane filtration of biological suspensions is frequently limited by fouling. This mechanism is well understood for ultrafiltration of activated sludge in membrane bioreactors. A rather young application of ultrafiltration is the recovery of nutrients from anaerobic digestates, e.g., from agricultural biogas plants. A process chain of solid/liquid separation, ultrafiltration, and reverse osmoses separates the digestate into different products: an organic N-P-fertilizer (solid digestate), a recirculate (UF retentate), a liquid N-K-fertilizer (RO retentate) and water. Despite the preceding particle removal, high crossflow velocities are required in the ultrafiltration step to overcome fouling. This leads to high operation costs of the ultrafiltration step and often limits the economical application of the complete process chain. In this study, under-stoichiometric ozone treatment of the ultrafiltration feed stream is investigated. Ozone treatment reduced the biopolymer concentration and apparent viscosity of different digestate centrates. Permeabilities of centrate treated with ozone were higher than without ozone treatment. In a laboratory test rig and in a pilot plant operated at the site of two full scale biogas plants, ultrafiltration flux could be improved by 50–80% by ozonation. Nutrient concentrations in the fertilizer products were not affected by ozone treatment.

Particle removal properties of stormwater runoff with a lab-scale vortex separator

2012 ◽  
Vol 38 (1-3) ◽  
pp. 301-305 ◽  
Author(s):  
Koo-Ho Kwon ◽  
Si-Won Kim ◽  
Lee-Hyung Kim ◽  
Joon Ha Kim ◽  
Seungyoon Lee ◽  
...  
Keyword(s):  
Stormwater Runoff ◽  
Particle Removal ◽  
Vortex Separator

Particle removal from semiconductor wafers by megasonic cleaning

1996 ◽  
Vol 27 ◽  
pp. S427-S428 ◽  
Author(s):  
T.H. Kuehn ◽  
D.B. Kittelson ◽  
Y. Wu ◽  
R. Gouk
Keyword(s):  
Particle Removal ◽  
Megasonic Cleaning

Effect of Laser Shock Wave Cleaning Direction on Particle Removal Behavior at Trenchs

2019 ◽  
Vol 25 (5) ◽  
pp. 257-262 ◽  
Author(s):  
Jin-Su Kim ◽  
Ahmed A. Busnaina ◽  
Jin-Goo Park
Keyword(s):  
Shock Wave ◽  
Particle Removal ◽  
Laser Shock ◽  
Laser Shock Wave

scholarly journals Dynamic particle removal by nanosecond dry laser cleaning: theory

2002 ◽  
Author(s):  
Nikita Arnold ◽  
G. Schrems ◽  
T. Muehlberger ◽  
M. Bertsch ◽  
Mario Mosbacher ◽  
...  
Keyword(s):  
Laser Cleaning ◽  
Particle Removal

Mechanism of PVA Brush Loading with Ceria Particles during Post-CMP Cleaning Process

2021 ◽  
Vol 314 ◽  
pp. 259-263
Author(s):  
Samrina Sahir ◽  
Hwi Won Cho ◽  
Nagendra Prasad Yerriboina ◽  
Tae Gon Kim ◽  
Satomi Hamada ◽  
...  
Keyword(s):  
Electrostatic Attraction ◽  
Particle Removal ◽  
Cross Contamination ◽  
Cleaning Process ◽  
Particle Loading ◽  
Cleaning Efficiency ◽  
Solution Ph ◽  
Cleaning Solution ◽  
Oppositely Charged ◽  
Process Interaction

Brush scrubbing is a well-known post CMP cleaning process. Interaction between PVA brush and the particles removed during the process must be considered while designing a cleaning process. In this work, the effect of cleaning solution pH was investigated in terms of particle removal from the wafer and subsequent loading to the PVA brush nodule. Higher cleaning of particles from wafer was observed for pH 2 and 12 cleaning solutions and poor cleaning for pH 7 cleaning solution. In contrast, the brushes were loaded heavily for pH 7 compared to pH 2 and 12. Higher electrostatic attraction between oppositely charged PVA and ceria surfaces provided higher ceria particles loading to PVA brush in acidic and neutral cleaning solutions. This particle loading to PVA brush can further effect cleaning efficiency as well as cross-contamination.

Influence of particle size and operating parameters on virus ultrafiltration efficiency

2011 ◽  
Vol 11 (1) ◽  
pp. 31-38
Author(s):  
Angayar K. Pavanasam ◽  
Ali Abbas ◽  
Vicki Chen
Keyword(s):  
Particle Size ◽  
Filtration Efficiency ◽  
Transmembrane Pressure ◽  
Operating Parameters ◽  
Particle Removal ◽  
Major Step ◽  
Virus Removal ◽  
Virus Particles ◽  
Key Factor ◽  
Effect Of Particle Size

In water treatment, virus removal using ultrafiltration is a major step towards better water quality. In this paper, we study virus filtration efficiency using surrogate virus particles and via statistical surface-response approach. We focus on the effect of particle size (20–100 nm range) as a key factor along with the effects of transmembrane pressure (20–60 kPa range) and feed flowrate (0.3–1.0 L/F;min range) on the filtration virus removal efficiency (LRV). The particle size is shown to impart a great deal of influence on surrogate particle removal. The effect of particle-to-pore-size ratio is reported for comparison of membrane molecular weight cut off (MWCO) performance. It was shown experimentally and through the developed empirical regression model that transmembrane pressure plays a major role in controlling the filtration efficiency along with flowrate. In the studied experimental range, higher LRV values are obtained at lower transmembrane pressure (20 kPa) and at higher feed flowrate (1 L/F;min). Further the effect on LRV of the interaction between transmembrane pressure and particle size seems to be more significant than that of the interaction of flowrate with particle size.

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