Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon

2002 ◽  
Author(s):  
Krishna Seshan
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Deposition Techniques

Spray Pyrolysis Thin Film Deposition Technique for Micro-Sensors and Devices

2020 ◽  
pp. 178-202
Author(s):  
Monoj Kumar Singha ◽  
Vineet Rojwal
Keyword(s):  
Thin Film ◽  
Spray Pyrolysis ◽  
Thin Film Deposition ◽  
Deposition Process ◽  
Film Deposition ◽  
Deposition Technique ◽  
Uv Photodetector ◽  
Spray Process ◽  
Spray Pyrolysis Deposition ◽  
Deposition Techniques

Thin film is used for sensing and electronic devices applications. Various techniques are used for thin film deposition. This chapter presents the Spray pyrolysis deposition technique used for the growth of thin films sensing and device material. Spray pyrolysis is an inexpensive method to grow good crystalline thin film compared to other thin film deposition techniques. The chapter gives an overview of the spray process used for thin film deposition. Basic setup for this process is explained. Parameters affecting the deposition process is explained, as are the various spray methods. Finally, some examples of spray pyrolysis in different applications like a gas sensor, UV photodetector, solar cell, photocatalysis, and supercapacitor are discussed.

Thin Film Deposition Techniques in Microelectronics

JOM ◽  
1986 ◽  
Vol 38 (2) ◽  
pp. 55-65 ◽  
Author(s):  
F. O. Sequeda
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Deposition Techniques

Physical vapour thin film deposition techniques

2004 ◽  
Author(s):  
H C Freyhardt ◽  
R W�rdenweber ◽  
B Utz ◽  
A Usoskin ◽  
Y Yamada
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Deposition Techniques

Ion-Beam-Assisted Deposition and Synthesis

MRS Bulletin ◽  
1987 ◽  
Vol 12 (2) ◽  
pp. 40-51 ◽  
Author(s):  
S.M. Rossnagel ◽  
J.J. Cuomo
Keyword(s):  
Thin Film ◽  
Particle Bombardment ◽  
Energetic Particle ◽  
Ion Beam ◽  
Chemical Properties ◽  
Film Surface ◽  
Arrival Rate ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Deposition Techniques

Concurrent energetic particle bombardment during film deposition can strongly modify the structural and chemical properties of the resulting thin film. The interest in this technique, ion-assisted deposition, comes about because it can be used to produce thin films with properties not achievable by conventional deposition. Bombardment by low energy ions occurs during almost all plasma-based thin film deposition techniques. Bombardment of a growing film, particularly by accelerated ions, can also be combined with non-plasma-based deposition techniques, such as evaporation, to simulate some of the effects observed with sputtering. The bombarding particle flux is usually controllable so that the arrival rate, energy, and species can be independently varied from the depositing flux. Thus, a basic aspect of ion-beam-based deposition techniques is the “control” often absent in plasma-based techniques. In plasmas, the voltage, current, and pressure are all interdependent. The energetic bombardment at the substrate-film interface depends on the various properties of the plasma, as does the deposition rate. It is often difficult, or even impossible, to decouple these processes. With ion-beam-based deposition techniques, the ion bombardment is essentially independent of the deposition process, and both can be more easily controlled.The incident energetic particle contributes some of its energy or momentum to irreversibly change the dynamics of the film surface. The incident particle may also be incorporated into the growing film, changing the film's chemical nature. The changes induced by particle bombardment during deposition are often not characteristic of equilibrium thermodynamics because the incident particle's energy is often many times the local adsorption or binding energy.

Comparison of Mixing Approaches in the Synthesis and Deposition of Ceria Nanoparticles

2007 ◽  
Author(s):  
Chih Heng T. Tseng ◽  
Brian K. Paul
Keyword(s):  
Thin Film ◽  
Spin Coating ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Film Morphology ◽  
Ceria Nanoparticles ◽  
Microchannel Reactor ◽  
Nanoparticle Deposition ◽  
Nanoparticle Shape ◽  
Deposition Techniques

Nanoparticle deposition techniques hold the promise of simplifying thin film deposition while enabling enhanced performance through the control of film density, porosity and composition. In this paper, ceria nanoparticles are deposited from solution to a film via spin coating. A comparison is made between the nanoparticle shape and film morphology produced by depositing from different mixing approaches. In this paper, different mixing approaches were carried out by using traditional batch precipitation reactor and continuous microchannel reactor (T-mixer). Preliminary results show different particle shape and film morphology as a function of precursor concentration. Advantages of the microchannel approach include better control of nanoparticle shape and more uniform film with less agglomeration.

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