Materials properties of nanostructured titanium nitride thin films synthesised by DC reactive magnetron sputtering

2008 ◽  
Vol 86 (1) ◽  
pp. 62-65 ◽  
Author(s):  
B. Subramanian ◽  
M. Jayachandran
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Nanostructured Titanium ◽  
Materials Properties ◽  
Dc Reactive Magnetron Sputtering

scholarly journals Surface morphology of titanium nitride thin films synthesized by DC reactive magnetron sputtering

2015 ◽  
Vol 33 (1) ◽  
pp. 137-143 ◽  
Author(s):  
Ştefan Ţǎlu ◽  
Sebastian Stach ◽  
Shahoo Valedbagi ◽  
S. Mohammad Elahi ◽  
Reza Bavadi
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Titanium Nitride ◽  
Fractal Analysis ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering ◽  
Tin Thin Films

AbstractIn this paper the influence of temperature on the 3-D surface morphology of titanium nitride (TiN) thin films synthesized by DC reactive magnetron sputtering has been analyzed. The 3-D morphology variation of TiN thin films grown on p-type Si (100) wafers was investigated at four different deposition temperatures (473 K, 573 K, 673 K, 773 K) in order to evaluate the relation among the 3-D micro-textured surfaces. The 3-D surface morphology of TiN thin films was characterized by means of atomic force microscopy (AFM) and fractal analysis applied to the AFM data. The 3-D surface morphology revealed the fractal geometry of TiN thin films at nanometer scale. The global scale properties of 3-D surface geometry were quantitatively estimated using the fractal dimensions D, determined by the morphological envelopes method. The fractal dimension D increased with the substrate temperature variation from 2.36 (at 473 K) to 2.66 (at 673 K) and then decreased to 2.33 (at 773 K). The fractal analysis in correlation with the averaged power spectral density (surface) yielded better quantitative results of morphological changes in the TiN thin films caused by substrate temperature variations, which were more precise, detailed, coherent and reproducible. It can be inferred that fractal analysis can be easily applied for the investigation of morphology evolution of different film/substrate interface phases obtained using different thin-film technologies.

Room temperature deposition of crystalline HfN thin films by DC reactive magnetron sputtering

2021 ◽  
Author(s):  
Wuttichai Phae-ngam ◽  
Tossaporn Lertvanithphol ◽  
Chanunthorn Chananonnawathorn ◽  
Rattanachai Kowong ◽  
Mati Horprathum ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Room Temperature ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering ◽  
Temperature Deposition

scholarly journals RETRACTED ARTICLE: Nanocharacterization of Titanium Nitride Thin Films Obtained by Reactive Magnetron Sputtering

JOM ◽  
2015 ◽  
Vol 69 (8) ◽  
pp. 1455-1455
Author(s):  
Violeta Valentina Merie ◽  
Marius Sorin Pustan ◽  
Corina Bîrleanu ◽  
Gavril Negrea
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Retracted Article

Growth and characterization of NiO thin films prepared by dc reactive magnetron sputtering

2011 ◽  
Vol 13 (2) ◽  
pp. 314-320 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
A. Sivasankar Reddy ◽  
Kee-Sun Lee ◽  
P. Sreedhara Reddy
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering
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