Aluminum-Doped Zinc Oxide Anode for Organic Light Emitting Diodes Grown by Pulsed Laser Deposition Using Plasma-Enhanced Oxygen Radicals

2014 ◽  
Vol 9 (2) ◽  
pp. 162-166 ◽  
Author(s):  
Jeong-Woo Park ◽  
Min-Suk Oh ◽  
Seong-Ju Park ◽  
Youngzo Yoo ◽  
Dong-Yu Kim
Keyword(s):  
Zinc Oxide ◽  
Pulsed Laser Deposition ◽  
Oxygen Radicals ◽  
Pulsed Laser ◽  
Organic Light Emitting Diodes ◽  
Laser Deposition ◽  
Light Emitting ◽  
Organic Light ◽  
Aluminum Doped Zinc Oxide ◽  
Oxide Anode

The effects of sodium in ITO by pulsed laser deposition on organic light-emitting diodes

2010 ◽  
Vol 101 (4) ◽  
pp. 621-626 ◽  
Author(s):  
Thian-Khok Yong ◽  
Yeh-Yee Kee ◽  
Sek-Sean Tan ◽  
Seong-Shan Yap ◽  
Wee-Ong Siew ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Light Emitting Diodes ◽  
Pulsed Laser ◽  
Organic Light Emitting Diodes ◽  
Laser Deposition ◽  
Light Emitting ◽  
Organic Light

High Quality Sn-Doped In2O3 Films Grown by Pulsed Laser Deposition for Organic Light-Emitting Diodes

2003 ◽  
Vol 780 ◽  
Author(s):  
Heungsoo Kim ◽  
James S. Horwitz ◽  
Woo Hong Kim ◽  
Zakya H. Kafafi ◽  
Douglas B. Chrisey
Keyword(s):  
Surface Roughness ◽  
Single Crystal ◽  
Pulsed Laser ◽  
Organic Light Emitting Diodes ◽  
Laser Deposition ◽  
High Quality ◽  
Light Emitting ◽  
Ito Film ◽  
Organic Light ◽  
Ito Films

AbstractHigh quality Sn-doped In2O3 (ITO) thin films have been grown by pulsed laser deposition (PLD) on glass, flexible polyethylene terephthalate (PET) and single crystal yttria stabilized zirconia (YSZ) substrates for use in organic light emitting diodes (OLEDs). Critical electrode issues for the OLED are related to the optical transparency, electrical resistivity, work function and surface roughness of the ITO film. Our research has focused on improving the properties of the ITO film to increase the efficiency of the OLED. Films were deposited using a KrF excimer laser (248nm, 30 ns FWHM) at fluences of 2 J/cm2 at substrate temperatures ranging from 1 to 100 mTorr. For ITO films (∼ 100 nm thick) deposited at the optimized conditions, a resistivity of 4.1 × 10-4 Ω-cm, 2.2 × 10-4 Ω-cm, 1.8 × 10-4 Ω-cm was observed on PET, glass and YSZ, respectively. The average film transmission in the visible range (400 - 700 nm) was about 90 % and the film surface roughness was about 0.5 nm for the film grown on glass. The Hall mobility and carrier density for ITO films (300 nm thickness) were observed to be in the range of 28 - 34 cm2/V-s and 1.0 - 1.2 × 1021 cm-3, respectively. We have used the ITO films, deposited by PLD on glass, plastic and single crystal YSZ substrates, as an anode contact in OLEDs. The OLED device performance based on PLD ITO anodes is compared with that of the device fabricated on the commercial ITO anode.

Highly conductive and transparent aluminum-doped zinc oxide thin films prepared by pulsed laser deposition in oxygen ambient

2001 ◽  
Vol 90 (11) ◽  
pp. 5661-5665 ◽  
Author(s):  
A. V. Singh ◽  
R. M. Mehra ◽  
Nuttawuth Buthrath ◽  
Akihiro Wakahara ◽  
Akira Yoshida
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films ◽  
Aluminum Doped Zinc Oxide

scholarly journals Preparation of Organic Light-Emitting Thin Films by Pulsed Laser Deposition

2005 ◽  
Vol 125 (4) ◽  
pp. 373-378
Author(s):  
Tamiko Ohshima ◽  
Hiroharu Kawasaki ◽  
Yoshiaki Suda ◽  
Yoshihisa Yamaguchi ◽  
Tomoaki Ikegami ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Light Emitting ◽  
Organic Light
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