Low-Temperature Process for Atomic Layer Chemical Vapor Deposition of an Al2O3 Passivation Layer for Organic Photovoltaic Cells

2016 ◽  
Vol 16 (5) ◽  
pp. 5285-5290 ◽  
Author(s):  
Hoonbae Kim ◽  
Jihye Lee ◽  
Sunyoung Sohn ◽  
Donggeun Jung
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Photovoltaic Cells ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Passivation Layer ◽  
Organic Photovoltaic ◽  
Organic Photovoltaic Cells ◽  
Low Temperature Process

Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

2015 ◽  
Vol 51 (86) ◽  
pp. 15692-15695 ◽  
Author(s):  
A. Delabie ◽  
M. Caymax ◽  
B. Groven ◽  
M. Heyne ◽  
K. Haesevoets ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Reducing Agents ◽  
Layer Deposition ◽  
Temperature Deposition ◽  
The Impact

We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors.

Atomic Layer Chemical Vapor Deposition of TiO[sub 2] Low Temperature Epitaxy of Rutile and Anatase

2000 ◽  
Vol 147 (9) ◽  
pp. 3319 ◽  
Author(s):  
Mikael Schuisky ◽  
Anders Hårsta ◽  
Aleks Aidla ◽  
Kaupo Kukli ◽  
Alma-Asta Kiisler ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Low Temperature Epitaxy
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