Significantly Improved Adhesion of Poly(3,4-ethylenedioxythiophene) Nanofilms to Amino-Silane Monolayer Pre-Patterned SiO2 Surfaces

2007 ◽  
Vol 7 (11) ◽  
pp. 3792-3794 ◽  
Author(s):  
Ilsun Pang ◽  
Sungsoo Kim ◽  
Jaegab Lee
Keyword(s):  
Wafer Surface ◽  
Amino Silane ◽  
Atomic Force ◽  
Wafer Substrate ◽  
Strong Adhesion ◽  
Tape Test ◽  
Vapor Phase Polymerization ◽  
Polymerization Method ◽  
Si Wafer ◽  
Pure Poly

This study reports a novel patterning method for highly pure poly(3,4-ethylenedioxythiophene) (PEDOT) nanofilms having a particularly strong adhesion to a SiO2 surface. An oxidized silicon wafer substrate was micro-contact printed with n-octadecyltrichlorosilane (OTS) monolayer, and subsequently its negative pattern was self-assembled with three different amino-functionalized alkylsilanes, (3-aminopropyl)trimethoxysilane (APS), N-(2-aminoethyl)-3-aminopropyltrimethoxy silane (EDAS), and (3-trimethoxysilylpropyl) diethylenetriamine (DETS). Then, PEDOT nanofilms were selectively grown on the aminosilane pre-patterned areas via the vapor phase polymerization method. To evaluate the adhesion and patterning, the PEDOT nanofilms and SAMs were investigated with a Scotch® tape test, contact angle analyzer, optical and atomic force microscopes. The evaluation revealed that the newly developed bottom-up process can successfully offer a strongly adhered and selectively patterned PEDOT nanofilm on an oxidized Si wafer surface.

Significantly Improved Adhesion of Poly(3,4-ethylenedioxythiophene) Nanofilms to Amino-Silane Monolayer Pre-Patterned SiO2 Surfaces

2007 ◽  
Vol 7 (11) ◽  
pp. 3792-3794
Author(s):  
Ilsun Pang ◽  
Sungsoo Kim ◽  
Jaegab Lee
Keyword(s):  
Wafer Surface ◽  
Amino Silane ◽  
Atomic Force ◽  
Wafer Substrate ◽  
Strong Adhesion ◽  
Tape Test ◽  
Vapor Phase Polymerization ◽  
Polymerization Method ◽  
Si Wafer ◽  
Pure Poly

This study reports a novel patterning method for highly pure poly(3,4-ethylenedioxythiophene) (PEDOT) nanofilms having a particularly strong adhesion to a SiO2 surface. An oxidized silicon wafer substrate was micro-contact printed with n-octadecyltrichlorosilane (OTS) monolayer, and subsequently its negative pattern was self-assembled with three different amino-functionalized alkylsilanes, (3-aminopropyl)trimethoxysilane (APS), N-(2-aminoethyl)-3-aminopropyltrimethoxy silane (EDAS), and (3-trimethoxysilylpropyl) diethylenetriamine (DETS). Then, PEDOT nanofilms were selectively grown on the aminosilane pre-patterned areas via the vapor phase polymerization method. To evaluate the adhesion and patterning, the PEDOT nanofilms and SAMs were investigated with a Scotch® tape test, contact angle analyzer, optical and atomic force microscopes. The evaluation revealed that the newly developed bottom-up process can successfully offer a strongly adhered and selectively patterned PEDOT nanofilm on an oxidized Si wafer surface.

Surface Initiated Polymerization (SIP) on Nanoparticle Surfaces: Demonstration of First Principles and Preparation of Nanocomposite Materials

2001 ◽  
Vol 676 ◽  
Author(s):  
Rigoberto Advincula ◽  
Qingye Zhou ◽  
Jimmy Mays
Keyword(s):  
Nanocomposite Materials ◽  
Polymer Chains ◽  
Wafer Surface ◽  
Patterned Surfaces ◽  
Grafted Polymers ◽  
Clay Nanoparticles ◽  
Model Studies ◽  
Surface Initiated Polymerization ◽  
Polymerization Method ◽  
Si Wafer

ABSTRACTTo investigate the grafting of polymer chains onto nanoparticles (metal, semi-conductor, inorganic, etc) and nanostructured (patterned) surfaces, we have investigated anionic surface initiated polymerization (SIP) on a variety of surfaces. Understanding the surface chemistry issues involved is critical for future applications and protocols. SIP of polystyrene from Silicate and clay nanoparticles surfaces have been made by the living anionic polymerization method with 1,1-diphenylethylene (DPE) initiation sites attached to nanoparticle surfaces using chlorosilane and amino functional groups. Model studies were initially done on flat Si-wafer surface and recently with Au surfaces. For the nanoparticles, the grafted polymers were cleaved and characterized by FTIR, NMR, AFM, TGA and SEC. Polymers grafted from nanoparticle surfaces show higher polydispersity and lower molecular weight than those formed in solution. We observed that diffusion of the monomer, stability of the initiator attachment to the surface, and aggregation of the particles controls the properties of the grafted polymers on particle surfaces. On the other hand, the use of the anionic polymerization method on surfaces allows the possibility of combining a variety of polymers (organic) with various nanoparticle and surfaces (inorganic) for the preparation of hybrid nanocomposite materials.

Dewetting Suppression of Polystyrene Thin Film Using Titanium Dioxide Nanoparticles

2014 ◽  
Vol 608 ◽  
pp. 218-223 ◽  
Author(s):  
Nampueng Pangpaiboon ◽  
Nisanart Traiphol
Keyword(s):  
Thin Film ◽  
Titanium Dioxide ◽  
Titanium Dioxide Nanoparticles ◽  
Force Microscopy ◽  
Spin Casting ◽  
Polymeric Thin Film ◽  
Atomic Force ◽  
Base Polymer ◽  
Wafer Substrate ◽  
Si Wafer

Effects of titanium dioxide nanoparticles on thermal stability of polymeric thin film are investigated in this study. Polystyrene with molecular weight of 52,000 g/mol is used as a base polymer. The concentrations of titanium dioxide nanoparticles in polystyrene are varied from 0-0.20 wt.%. Films are fabricated by spin casting on Si wafer substrate and annealed at 180 °C and 190 °C for various times in order to study dynamics of dewetting. Film morphologies are analysed by optical microscopy and atomic force microscopy. Dewetting areas of each film as a function of annealing time are determined. It is found that addition of titanium dioxide nanoparticles suppresses dewetting in polystyrene film with thicknesses of ~30 nm and ~100 nm. The same titanium dioxide amounts, on the other hand, accelerate dewetting process in the film with thickness of ~265 nm. Mechanisms of dewetting suppression in polymeric film by titanium dioxide nanoparticles are discussed.

scholarly journals Measurement of Intrinsic Hardness of Deposited Chromium Thin Films by Nanoindentation Method and Influencing Factors

2020 ◽  
Vol 58 (3) ◽  
pp. 207-215
Author(s):  
Young-Joon Kang ◽  
Ju-Hwan Baeg ◽  
Hyun Park ◽  
Young-Rae Cho
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Indentation Depth ◽  
Physical And Mechanical Properties ◽  
Functional Materials ◽  
Influential Factors ◽  
Force Microscopy ◽  
Atomic Force ◽  
Wafer Substrate ◽  
Si Wafer

Materials with very small dimensions exhibit different physical and mechanical properties compared to their bulk counterparts. This becomes significantly important for the thin films that are widely used as components in micro-electronics and functional materials. In this study, a chromium (Cr) thin film was deposited on a silicon (Si) wafer by DC-magnetron sputtering. The intrinsic hardness of the Cr thin film on Si-wafer was evaluated by the nanoindentation method. We especially investigated ways of measuring the intrinsic hardness of the Cr thin film, and influential factors including the substrate effect and surface roughness effect. To further characterize the intrinsic hardness of the Cr thin film on Si-wafer, we used Xray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM). Two additional methods, the Meyer-plot and a profile for hardness versus indentation depth, were also employed. As a result of these two methods, we found that the profile for hardness versus indentation depth was valuable for evaluating the intrinsic hardness of Cr thin film on a Si-wafer substrate. The measured intrinsic hardness of the Cr thin film and Si wafer were about 900 Hv and 1143 Hv, respectively. The profile for hardness versus indentation depth can be widely used to evaluate the intrinsic hardness of metallic thin films on substrates.

Anisotropic Delamination Energy of Bonded Rippled Silicon Surfaces Created by Ar+ Bombardment

2003 ◽  
Vol 768 ◽  
Author(s):  
Z.X. Liu ◽  
N.W. Cheung
Keyword(s):  
Wave Vector ◽  
Incidence Angle ◽  
Ion Beam ◽  
Crack Opening ◽  
Silicon Surfaces ◽  
Wafer Surface ◽  
Force Microscopy ◽  
Atomic Force ◽  
Opening Method ◽  
Si Wafer

AbstractThe surface topography of Si(100) modified by low energy Ar+ bombardment was characterized by Atomic Force Microscopy (AFM). AFM images show that ripples can be formed by 500eV Ar+ at incidence angle 40°. The spacing wavelength of ripples is around 70nm with wave vector parallel to the projected direction of ion beam. Direct bonding and mechanical delamination of Si wafer pairs with ripples are investigated. Delamination energy measured by crack-opening method along the direction perpendicular to the wave vector,γ⊥, is always smaller than that along the wave vector direction,γ„; Both γ⊥ and γ„ are found to decrease with sputtering time. The AFM images after delamination indicate that the bonding and delamination process do not eliminate the ripples on the wafer surface.

New Measurement Concept of Nanometer-Level Defects on Si Wafer Surface by Using Micro Contact Sensor

2012 ◽  
Vol 497 ◽  
pp. 137-141 ◽  
Author(s):  
Wen Jian Lu ◽  
Yuki Shimizu ◽  
Wei Gao
Keyword(s):  
Temperature Rise ◽  
Electric Circuit ◽  
Frictional Heat ◽  
Wafer Surface ◽  
Fem Model ◽  
Element Simulation ◽  
Type Contact ◽  
Contact Sensor ◽  
Measurement Concept ◽  
Si Wafer

A thermal-type contact sensor was proposed to detect small defects, the heights of which are less than 16 nm, on the wafer surface. The feasibility of the contact sensor, which detects frictional heat generated at the contact, was theoretically investigated focusing on the temperature rise of the sensor element. Simulation results with both the simple model of heat transfer and the FEM model showed that the expected temperature rise of the contact sensor is enough to be detected by the conventional electric circuit.

scholarly journals Flexible ZnO/PANI/nonwoven nanocomposite based high-sensitive NH3 gas sensor via vapor phase polymerization method

2020 ◽  
Vol 3 ◽  
pp. 862-867
Author(s):  
Ying Guan ◽  
Chuang Wang ◽  
Houyong Yu ◽  
Zhuanyong Zou ◽  
Ying Zhou ◽  
...  
Keyword(s):  
Gas Sensor ◽  
Vapor Phase ◽  
Vapor Phase Polymerization ◽  
Polymerization Method

A Study on Statistical Analysis of Si-Wafer Polishing Process for the Optimum Polishing Condition

2008 ◽  
Vol 389-390 ◽  
pp. 493-497 ◽  
Author(s):  
Sung Chul Hwang ◽  
Jong Koo Won ◽  
Jung Taik Lee ◽  
Eun Sang Lee
Keyword(s):  
Surface Roughness ◽  
Statistical Analysis ◽  
Process Parameters ◽  
Wafer Surface ◽  
Wafer Polishing ◽  
Ultra Precision ◽  
Important Processing ◽  
The Many ◽  
Selection Of ◽  
Si Wafer

As the level of Si-wafer surface directly affects device line-width capability, process latitude, yield, and throughput in fabrication of microchips, it needs to have ultra precision surface and flatness. Polishing is one of the important processing having influence on the surface roughness in manufacturing of Si-wafers. The surface roughness in wafer polishing is mainly affected by the many process parameters. For decreasing the surface roughness, the control of polishing parameters is very important. In this paper, the optimum condition selection of ultra precision wafer polishing and the effect of polishing parameters on the surface roughness were evaluated by the statistical analysis of the process parameters.

scholarly journals Observation of Oxide-film Step with Very Small Height on Si Wafer Surface Using a Laser Scattering Method

2006 ◽  
Vol 72 (11) ◽  
pp. 1363-1367
Author(s):  
Haruyuki INOUE ◽  
Toshihiko KATAOKA ◽  
Yoshihiro NAGAO ◽  
Yasushi OSHIKANE ◽  
Motohiro NAKANO ◽  
...  
Keyword(s):  
Oxide Film ◽  
Wafer Surface ◽  
Scattering Method ◽  
Laser Scattering ◽  
Small Height ◽  
Si Wafer

scholarly journals Covalent Protein Immobilization onto Muscovite Mica Surface with a Photocrosslinker

Minerals ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 464
Author(s):  
Anastasia A. Valueva ◽  
Ivan D. Shumov ◽  
Anna L. Kaysheva ◽  
Irina A. Ivanova ◽  
Vadim S. Ziborov ◽  
...  
Keyword(s):  
Protein Immobilization ◽  
Mass Spectrometry Analysis ◽  
Biological Macromolecules ◽  
Spectrometry Analysis ◽  
Force Microscopy ◽  
Amino Silane ◽  
Research Areas ◽  
Atomic Force ◽  
Muscovite Mica ◽  
Peroxidase Enzyme

Muscovite mica with an amino silane-modified surface is commonly used as a substrate in atomic force microscopy (AFM) studies of biological macromolecules. Herein, the efficiency of two different protein immobilization strategies employing either (N-hydroxysuccinimide ester)-based crosslinker (DSP) or benzophenone-based photoactivatable crosslinker (SuccBB) has been compared using AFM and mass spectrometry analysis. Two proteins with different physicochemical properties—human serum albumin (HSA) and horseradish peroxidase enzyme protein (HRP)—have been used as model objects in the study. In the case of HRP, both crosslinkers exhibited high immobilization efficiency—as opposed to the case with HSA, when sufficient capturing efficiency has only been observed with SuccBB photocrosslinker. The results obtained herein can find their application in commonly employed bioanalytical systems and in the development of novel highly sensitive chip-based diagnostic platforms employing immobilized proteins. The obtained data can also be of interest for other research areas in medicine and biotechnology employing immobilized biomolecules.

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