Morphology Evolution in a Diblock Copolymer Film

2006 ◽  
Vol 6 (12) ◽  
pp. 3904-3909 ◽  
Author(s):  
Lixin Song ◽  
Yeng Ming Lam
Keyword(s):  
Diblock Copolymer ◽  
Copolymer Film ◽  
Morphology Evolution

Comments concerning "Fluorescent probe studies on the microstructure of polystyrene-poly(vinylpyridine) diblock copolymer film"

1993 ◽  
Vol 26 (26) ◽  
pp. 7366-7366 ◽  
Author(s):  
William E. Acree ◽  
Sheryl A. Tucker ◽  
Denise C. Wilkins
Keyword(s):  
Fluorescent Probe ◽  
Diblock Copolymer ◽  
Copolymer Film

Fluorescent probe studies on the microstructure of polystyrene-poly(vinylpyridine) diblock copolymer film

1992 ◽  
Vol 25 (25) ◽  
pp. 6866-6870 ◽  
Author(s):  
Kenichi Nakashima ◽  
Mitchell A. Winnik ◽  
Kevin H. Dai ◽  
Edward J. Kramer ◽  
Junichiro Washiyama
Keyword(s):  
Fluorescent Probe ◽  
Diblock Copolymer ◽  
Copolymer Film

Transfer of a chemical substrate pattern into an island-forming diblock copolymer film

1999 ◽  
Vol 111 (24) ◽  
pp. 11101-11110 ◽  
Author(s):  
Jakob Heier ◽  
Jan Genzer ◽  
Edward J. Kramer ◽  
Frank S. Bates ◽  
Stefan Walheim ◽  
...  
Keyword(s):  
Diblock Copolymer ◽  
Copolymer Film

Kinetic Model of Structural Relaxation in Diblock Copolymer Film

2020 ◽  
Vol 62 (2) ◽  
pp. 140-148
Author(s):  
D. A. Filatov ◽  
E. N. Govorun ◽  
Y. V. Kudryavtsev
Keyword(s):  
Kinetic Model ◽  
Diblock Copolymer ◽  
Structural Relaxation ◽  
Copolymer Film

MORPHOLOGY EVOLUTION OF AN ASYMMETRIC DIBLOCK COPOLYMER P(S-b-MMA) AS A FUNCTION OF FILM THICKNESS AND ANNEALING TIME

2005 ◽  
Vol 04 (04) ◽  
pp. 737-743
Author(s):  
H. WANG ◽  
A. B. DJURIŠIĆ ◽  
M. H. XIE ◽  
W. K. CHAN ◽  
O. KUTSAY
Keyword(s):  
Film Thickness ◽  
Diblock Copolymer ◽  
Annealing Time ◽  
Native Oxide ◽  
Morphology Evolution ◽  
Factors Affecting ◽  
Theoretical Predictions ◽  
Oxide Substrate ◽  
Cleaning Procedures ◽  
Copolymer Poly

We studied the morphology evolution of asymmetric diblock copolymer poly (styrene-b-methyl methacrylate) P(S-b-MMA) films as a function of film thickness and annealing time on Si /native oxide substrate. We also investigated other factors affecting the morphology in addition to film thickness and annealing time, such as substrate cleaning procedures. Ion etching was employed to probe the structure inside the films. The obtained results confirm that there is a range of thicknesses where perpendicular cylinder orientation is obtained on a preferential surface, in agreement with theoretical predictions.

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