scholarly journals Bearing-Foreign Material Deposition on Retrieved Co-Cr Femoral Heads: Composition and Morphology

2015 ◽  
Vol 2015 ◽  
pp. 1-9
Author(s):  
Nishant M. Tikekar ◽  
Anneliese D. Heiner ◽  
Thomas E. Baer ◽  
Karen M. Kruger ◽  
John J. Callaghan ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Optical Profilometry ◽  
Foreign Material ◽  
X Ray ◽  
Material Deposition ◽  
Dislocation Reduction ◽  
Femoral Heads ◽  
Acetabular Shell ◽  
Hip Arthroplasties ◽  
Cobalt Chrome

Bearing-foreign material deposition onto a femoral head can occur from contact with an acetabular shell due to dislocation, reduction, or subluxation. The purpose of this study was to comprehensively characterize deposit regions on retrieved cobalt-chrome femoral heads from metal-on-polyethylene total hip arthroplasties that had experienced such adverse events. The morphology, topography, and composition of deposition regions were characterized using macrophotography, optical profilometry, scanning electron microscopy, energy dispersive spectroscopy, and X-ray photoelectron spectroscopy. The deposit areas were relatively large, they were much rougher than the surrounding undamaged clean areas, and they displayed several distinct morphologies. Titanium alloy elements were the predominant constituents. Calcium and phosphorous were also detected within the deposit areas, in a composition that could nucleate abrasive hydroxyapatite. In addition, tungsten-rich particles, likely present as tungsten carbide, were observed on top of the titanium deposits. The increased roughness associated with these deposition features would be expected to accelerate damage and wear of the opposing liner and hence accelerate the development of osteolysis.

scholarly journals Hydrophobic and Icephobic Behaviour of Polyurethane-Based Nanocomposite Coatings

Coatings ◽  
2019 ◽  
Vol 9 (12) ◽  
pp. 811
Author(s):  
Bartlomiej Przybyszewski ◽  
Anna Boczkowska ◽  
Rafal Kozera ◽  
Julio Mora ◽  
Paloma Garcia ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Scratch Test ◽  
Polymer Coatings ◽  
Nanocomposite Coatings ◽  
Optical Profilometry ◽  
Nano Silica ◽  
Complete Coverage ◽  
X Ray ◽  
Wetting Properties ◽  
Main Challenge

In this paper, hydrophobic nanocomposite coatings based on polyurethane (PUR) modified by nano-silica and silane-based compounds were manufactured by spraying. The main challenge was to assess and improve the hydrophobic as well as anti-icing properties of initially hydrophilic polymer coatings. The prepared nanocomposite coatings were characterized by means of scanning electron microscopy (SEM), optical profilometry and X-ray photoelectron spectroscopy (XPS). The results obtained showed that in order to achieve hydrophobicity, appropriate amounts of nano-silica must be incorporated in the coating, and complete coverage by nano-silica particles is necessary for achieving hydrophobicity. Coating adhesion and the durability of the hydrophobic behaviour were also studied by scratch test and frosting/defrosting cycles, respectively. The results show that use of both nano-silica and silane-based compounds improve the hydrophobic and anti-icing properties of the coating as compared to a non-modified PUR topcoat. A synergistic effect of both additives was observed. It was also found that the anti-icing behaviour does not necessarily correlate with surface roughness and the materials’ wetting properties.

Two dimensional Sr silicate grown on Si(001) studied using X-ray Photoelectron Spectroscopy

2006 ◽  
Vol 132 ◽  
pp. 87-90
Author(s):  
M. El Kazzi ◽  
G. Delhaye ◽  
S. Gaillard ◽  
E. Bergignat ◽  
G. Hollinger
Keyword(s):  
Photoelectron Spectroscopy ◽  
Two Dimensional ◽  
X Ray

BONDS IN AMORPHOUS Nb1-xSixSTUDIED BY X-RAY EMISSION AND X-RAY PHOTOELECTRON SPECTROSCOPY

1987 ◽  
Vol 48 (C9) ◽  
pp. C9-1025-C9-1028 ◽  
Author(s):  
W. ZAHOROWSKI ◽  
A. SIMUNEK ◽  
G. WIECH ◽  
K. SÖLDNER ◽  
R. KNAUF ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
X Ray

Investigation of the Effect of Uv-Assisted Oxidation and Nitridation of Hafnium Metal Films

2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh
Keyword(s):  
Uv Radiation ◽  
Photoelectron Spectroscopy ◽  
Grazing Angle ◽  
X Ray Diffraction ◽  
Metal Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Silicon Interface

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.

Interactions of Ge Atoms with High- ê Oxide Dielectric Surfaces

2005 ◽  
Vol 879 ◽  
Author(s):  
Scott K. Stanley ◽  
John G. Ekerdt
Keyword(s):  
Oxide Layer ◽  
Photoelectron Spectroscopy ◽  
Chemical Vapor ◽  
Temperature Programmed Desorption ◽  
Tungsten Filament ◽  
X Ray ◽  
Dielectric Surfaces ◽  
Temperature Programmed ◽  
The Stability ◽  
Ge Nanocrystals

AbstractGe is deposited on HfO2 surfaces by chemical vapor deposition (CVD) with GeH4. 0.7-1.0 ML GeHx (x = 0-3) is deposited by thermally cracking GeH4 on a hot tungsten filament. Ge oxidation and bonding are studied at 300-1000 K with X-ray photoelectron spectroscopy (XPS). Ge, GeH, GeO, and GeO2 desorption are measured with temperature programmed desorption (TPD) at 400-1000 K. Ge initially reacts with the dielectric forming an oxide layer followed by Ge deposition and formation of nanocrystals in CVD at 870 K. 0.7-1.0 ML GeHx deposited by cracking rapidly forms a contacting oxide layer on HfO2 that is stable from 300-800 K. Ge is fully removed from the HfO2 surface after annealing to 1000 K. These results help explain the stability of Ge nanocrystals in contact with HfO2.

CO2 Reduction to Propanol by Copper Foams: A Pre- and Post-Catalysis Study

2020 ◽  
Author(s):  
Jennifer A. Rudd ◽  
Ewa Kazimierska ◽  
Louise B. Hamdy ◽  
Odin Bain ◽  
Sunyhik Ahn ◽  
...  
Keyword(s):  
Carbon Dioxide ◽  
Photoelectron Spectroscopy ◽  
Carbon Capture ◽  
Surface Composition ◽  
Co2 Reduction ◽  
Structural Rearrangement ◽  
Copper Electrode ◽  
Ex Situ ◽  
X Ray ◽  
Copper Electrodes

The utilization of carbon dioxide is a major incentive for the growing field of carbon capture. Carbon dioxide could be an abundant building block to generate higher value products. Herein, we describe the use of porous copper electrodes to catalyze the reduction of carbon dioxide into higher value products such as ethylene, ethanol and, notably, propanol. For <i>n</i>-propanol production, faradaic efficiencies reach 4.93% at -0.83 V <i>vs</i> RHE, with a geometric partial current density of -1.85 mA/cm<sup>2</sup>. We have documented the performance of the catalyst in both pristine and urea-modified foams pre- and post-electrolysis. Before electrolysis, the copper electrode consisted of a mixture of cuboctahedra and dendrites. After 35-minute electrolysis, the cuboctahedra and dendrites have undergone structural rearrangement. Changes in the interaction of urea with the catalyst surface have also been observed. These transformations were characterized <i>ex-situ</i> using scanning electron microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy. We found that alterations in the morphology, crystallinity, and surface composition of the catalyst led to the deactivation of the copper foams.

Validity-Study of Commercial Semiconductor with TO-18 Package for Space Application by PIND Test

2013 ◽  
Author(s):  
Yusuke Nakatake ◽  
Makoto Okabe ◽  
Shota Sato
Keyword(s):  
Industrial Applications ◽  
Validity Study ◽  
Space Application ◽  
Noise Detection ◽  
Foreign Material ◽  
Contamination Control ◽  
X Ray ◽  
Impact Noise ◽  
Report Analysis ◽  
Foreign Materials

Abstract In this paper, we carried out PIND (Particle Impact Noise Detection) test and X-ray inspection of a transistor in a TO-18 package for commercial and industrial applications. From our evaluation results, we explain the validity of the PIND test by comparing PIND test and X-ray inspection results. We make clear that PIND test is able to detect internal foreign material that may be transparent to X-ray inspection. In addition, we report analysis results of internal foreign materials from defective devices. This matter suggests that a problem is contamination control in the manufacturing process, most likely the sealing process.

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