scholarly journals Reactive Pulsed Laser Deposition of Titanium Nitride Thin Films: Effect of Reactive Gas Pressure on the Structure, Composition, and Properties

2013 ◽  
Vol 2013 ◽  
pp. 1-5 ◽  
Author(s):  
R. Krishnan ◽  
C. David ◽  
P. K. Ajikumar ◽  
R. Nithya ◽  
S. Tripura Sundari ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Grazing Incidence ◽  
Laser Deposition ◽  
Tin Thin Films ◽  
Quantitative Manner ◽  
Elastic Backscattering ◽  
First Time

Titanium nitride (TiN) thin films were deposited by reactive pulsed laser deposition (RPLD) technique. For the first time, the composition evaluated from proton elastic backscattering spectrometry, in a quantitative manner, revealed a dependence on the partial pressure of nitrogen from 1 to 10 Pa. Grazing incidence-XRD (GI-XRD) confirmed the formation of predominantly nanocrystalline TiN phase with a crystallite size of around 30 nm. The hardness showed maximum value of ~30 GPa when the composition is near stoichiometric and the friction coefficient was found to be as low as 0.3. In addition, a systematic optical response was observed as a function of deposition pressure from the surface of the TiN films using spectroscopic ellipsometry.

Pulsed-laser deposition of high-purity TiN thin films

1998 ◽  
Author(s):  
Huidong Gu ◽  
Kang M. Leung ◽  
Jonathan C. Y. Chung ◽  
X. D. Han
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
High Purity ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Tin Thin Films

Growth of Textured Nanocrystalline Cobalt Ferrite Thin Films by Pulsed Laser Deposition

2008 ◽  
Vol 8 (8) ◽  
pp. 4135-4140 ◽  
Author(s):  
Lakshmikanta Aditya ◽  
A. Srivastava ◽  
S. K. Sahoo ◽  
P. Das ◽  
C. Mukherjee ◽  
...  
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Pulsed Laser Deposition ◽  
Cobalt Ferrite ◽  
Pulsed Laser ◽  
Grazing Incidence ◽  
Orientation Distribution ◽  
Laser Deposition ◽  
X Ray ◽  
Ferrite Thin Films

Cobalt ferrite thin films have been deposited on fused quartz substrates by pulsed laser deposition at various substrate temperatures, TS (25 °C, 300 °C, 550 °C and 750 °C). Single phase, nanocrystalline, spinel cobalt ferrite formation is confirmed by X-ray diffraction (XRD) for TS ≥ 300 °C. Conventional XRD studies reveal strong (111) texturing in the as deposited films with TS ≥ 550 °C. Bulk texture measurements using X-ray orientation distribution function confirmed (111) preferred orientation in the films with TS ≥ 550 °C. Grain size (13–16 nm for TS ≥ 300 °C) estimation using grazing incidence X-ray line broadening analysis shows insignificant grain growth with increasing TS, which is in good agreement with grain size data obtained from transmission electron microscopy.

Very hard TiN thin films grown by pulsed laser deposition

2012 ◽  
Vol 260 ◽  
pp. 2-6 ◽  
Author(s):  
D. Craciun ◽  
N. Stefan ◽  
G. Socol ◽  
G. Dorcioman ◽  
E. McCumiskey ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Tin Thin Films

scholarly journals Thickness Influence on In Vitro Biocompatibility of Titanium Nitride Thin Films Synthesized by Pulsed Laser Deposition

Materials ◽  
2016 ◽  
Vol 9 (1) ◽  
pp. 38 ◽  
Author(s):  
Liviu Duta ◽  
George Stan ◽  
Adrian Popa ◽  
Marius Husanu ◽  
Sorin Moga ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
In Vitro Biocompatibility

Pulsed Laser Deposition and Biocompatibility of Titanium Nitride Coatings

2012 ◽  
Author(s):  
Talisha M. Haywood ◽  
Kwadwo M. Darkwa ◽  
Ram K. Gupta ◽  
Dhananjay Kumar
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Bone Cells ◽  
Cell Attachment ◽  
Pure Titanium ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Biological Behavior ◽  
Stainless Steel 316L ◽  
Tin Thin Films

TiN thin films were deposited on pure titanium (99.9 %) and stainless steel (316L) substrates using the pulsed laser deposition (PLD) technique. PLD is a very versatile technique to deposit high quality films and it allows the stoichiometry transfer of a multi-component system from target to deposited film. The crystallographic orientation of the films was studied using the X-ray diffraction technique and the results showed that the films were polycrystalline with the (111) preferred orientation. The hydrophilic/hydrophobicity nature of the films was investigated using contact angle measurements and the results indicated that the TiN coated surfaces were hydrophilic (< 90°). Biocompatibility of the TiN thin films was characterized in terms of cell attachment of bone cells on the surfaces of the coatings. Human bone marrow stromal cells were cultured, seeded, stained and imaged using a fluorescent microscope. Results on the biological behavior of the TiN thin films suggest that TiN is a good biocompatible material and has great promises in biological applications.

Ferroelectric Behavior of Li-Doped ZnO Thin Films on Si(100) by Pulsed Laser Deposition

1998 ◽  
Vol 541 ◽  
Author(s):  
M. Joseph ◽  
H. Tabata ◽  
T. Tkawai
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Thin Films ◽  
Voltage Measurement ◽  
Capacitance Voltage ◽  
Structural Surface ◽  
Doped Zno ◽  
First Time

AbstractThin films of Li-doped ZnO of different compositions (Zn1−xLix)O, x=0.1, 0.17 and 0.3 have been prepared on Si(100) substrate for the first time by pulsed laser deposition. These films are characterized for their structural, surface morphology and ferroelectric nature. A memory window of 1.2V has been observed in capacitance-voltage measurement.

Pulsed laser deposition of PbMg1/3Nb2/3O3 thin films and PbMg1/3Nb2/3O3/PbTiO3 multilayers

2001 ◽  
Vol 11 (PR11) ◽  
pp. Pr11-65-Pr11-69
Author(s):  
N. Lemée ◽  
H. Bouyanfif ◽  
J. L. Dellis ◽  
M. El Marssi ◽  
M. G. Karkut ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

SrBi2Nb2O9 ferroelectric thin films deposited by pulsed laser deposition on textured and epitaxied platinum electrodes

2001 ◽  
Vol 11 (PR11) ◽  
pp. Pr11-133-Pr11-137
Author(s):  
J. R. Duclère ◽  
M. Guilloux-Viry ◽  
A. Perrin ◽  
A. Dauscher ◽  
S. Weber ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Ferroelectric Thin Films ◽  
Laser Deposition ◽  
Platinum Electrodes

Microstructural and Electrical Characterization of Barium Strontium Titanatebased Solid Solution Thin Films Deposited on Ceramic Substrates by Pulsed Laser Deposition

2002 ◽  
Vol 720 ◽  
Author(s):  
Costas G. Fountzoulas ◽  
Daniel M. Potrepka ◽  
Steven C. Tidrow
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Electrical Characterization ◽  
Field Variable ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
Ceramic Substrates ◽  
Nominal Thickness

AbstractFerroelectrics are multicomponent materials with a wealth of interesting and useful properties, such as piezoelectricity. The dielectric constant of the BSTO ferroelectrics can be changed by applying an electric field. Variable dielectric constant results in a change in phase velocity in the device allowing it to be tuned in real time for a particular application. The microstructure of the film influences the electronic properties which in turn influences the performance of the film. Ba0.6Sr0.4Ti1-y(A 3+, B5+)yO3 thin films, of nominal thickness of 0.65 μm, were synthesized initially at substrate temperatures of 400°C, and subsequently annealed to 750°C, on LaAlO3 (100) substrates, previously coated with LaSrCoO conductive buffer layer, using the pulsed laser deposition technique. The microstructural and physical characteristics of the postannealed thin films have been studied using x-ray diffraction, scanning electron microscopy, and nano indentation and are reported. Results of capacitance measurements are used to obtain dielectric constant and tunability in the paraelectric (T>Tc) regime.

Sign in / Sign up

Export Citation Format

Share Document