scholarly journals Matrix-Assisted Pulsed Laser Thin Film Deposition by Using Nd:YAG Laser

2012 ◽  
Vol 2012 ◽  
pp. 1-9 ◽  
Author(s):  
Francesco Bloisi ◽  
Mario Barra ◽  
Antonio Cassinese ◽  
Luciano Rosario Maria Vicari
Keyword(s):  
Nd:Yag Laser ◽  
Laser Energy ◽  
Pulsed Laser ◽  
Thin Film Deposition ◽  
Laser Wavelength ◽  
Film Deposition ◽  
Laser Evaporation ◽  
Polymeric Thin Films ◽  
Transparent Liquid ◽  
Desorption Mechanism

Matrix-Assisted Pulsed Laser Evaporation (MAPLE) is a deposition technique, developed from Pulsed Laser Deposition (PLD) especially well suited for producing organic/polymeric thin films, which can take advantage from using Nd:YAG laser. Depending on the relative values of light absorption coefficients of the solvent and of the molecules to be deposited, laser energy is directly absorbed by the solvent or is transferred to it, providing a softer desorption mechanism with respect to PLD. In PLD ultraviolet laser radiation is commonly used, but in MAPLE, since easily damaged molecules are usually involved, the use of Nd:YAG laser offers the advantage to allow selecting laser wavelength from ultraviolet (266 nm or 355 nm, corresponding to 4.66 eV or 3.49 eV photon energies, resp.) to visible (532 nm, 2.33 eV) to infrared (1064 nm, 1.17 eV). In this paper, the MAPLE technique is described in details, together with a survey of current and possible future applications for both organic and biomaterial deposition taking into account the advantages of using an Nd:YAG laser. Beside other results, we have experimental confirmation that MAPLE applications are not limited to transparent molecules highly soluble in light absorbing solvent, thus allowing deposition of poorly soluble light absorbing molecules suspended in a light transparent liquid.

scholarly journals Tunable internal quantum well alignment in rationally designed oligomer-based perovskite films deposited by resonant infrared matrix-assisted pulsed laser evaporation

2019 ◽  
Vol 6 (8) ◽  
pp. 1707-1716 ◽  
Author(s):  
Wiley A. Dunlap-Shohl ◽  
E. Tomas Barraza ◽  
Andrew Barrette ◽  
Seyitliyev Dovletgeldi ◽  
Gamze Findik ◽  
...  
Keyword(s):  
Thin Film ◽  
Quantum Well ◽  
Pulsed Laser ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Inorganic Materials ◽  
Laser Evaporation

RIR-MAPLE enables thin-film deposition of organic–inorganic materials with tunable synergistic photophysics.

scholarly journals Thin Films of Nanocrystalline Fe(pz)[Pt(CN)4] Deposited by Resonant Matrix-Assisted Pulsed Laser Evaporation

Materials ◽  
2021 ◽  
Vol 14 (23) ◽  
pp. 7135
Author(s):  
Dominik Maskowicz ◽  
Rafał Jendrzejewski ◽  
Wioletta Kopeć ◽  
Maria Gazda ◽  
Jakub Karczewski ◽  
...  
Keyword(s):  
Thin Films ◽  
Absorption Band ◽  
Spin Transition ◽  
Pulsed Laser ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Evaporation ◽  
Band Shift ◽  
X Ray ◽  
Vis Spectroscopy

Prior studies of the thin film deposition of the metal-organic compound of Fe(pz)Pt[CN]4 (pz = pyrazine) using the matrix-assisted pulsed laser evaporation (MAPLE) method, provided evidence for laser-induced decomposition of the molecular structure resulting in a significant downshift of the spin transition temperature. In this work we report new results obtained with a tunable pulsed laser, adjusted to water resonance absorption band with a maximum at 3080 nm, instead of 1064 nm laser, to overcome limitations related to laser–target interactions. Using this approach, we obtain uniform and functional thin films of Fe(pz)Pt[CN]4 nanoparticles with an average thickness of 135 nm on Si and/or glass substrates. X-ray diffraction measurements show the crystalline structure of the film identical to that of the reference material. The temperature-dependent Raman spectroscopy indicates the spin transition in the temperature range of 275 to 290 K with 15 ± 3 K hysteresis. This result is confirmed by UV-Vis spectroscopy revealing an absorption band shift from 492 to 550 nm related to metal-to-ligand-charge-transfer (MLCT) for high and low spin states, respectively. Spin crossover is also observed with X-ray absorption spectroscopy, but due to soft X-ray-induced excited spin state trapping (SOXIESST) the transition is not complete and shifted towards lower temperatures.

TiO2 nanoparticle thin film deposition by matrix assisted pulsed laser evaporation for sensing applications

2007 ◽  
Vol 253 (19) ◽  
pp. 7937-7941 ◽  
Author(s):  
A.P. Caricato ◽  
S. Capone ◽  
G. Ciccarella ◽  
M. Martino ◽  
R. Rella ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulsed Laser ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Tio2 Nanoparticle ◽  
Laser Evaporation ◽  
Sensing Applications

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

Pulsed Laser Deposition History and Laser-Target Interactions

MRS Bulletin ◽  
1992 ◽  
Vol 17 (2) ◽  
pp. 30-36 ◽  
Author(s):  
Jeff Cheung ◽  
Jim Horwitz
Keyword(s):  
Thin Film ◽  
Laser Beam ◽  
Pulsed Laser Deposition ◽  
Mechanical Energy ◽  
Pulsed Laser ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Deposition ◽  
Small Branch ◽  
The Impact

The laser, as a source of “pure” energy in the form of monochromatic and coherent photons, is enjoying ever increasing popularity in diverse and broad applications from drilling micron-sized holes on semiconductor devices to guidance systems used in drilling a mammoth tunnel under the English Channel. In many areas such as metallurgy, medical technology, and the electronics industry, it has become an irreplaceable tool.Like many other discoveries, the various applications of the laser were not initially defined but were consequences of natural evolution led by theoretical studies. Shortly after the demonstration of the first laser, the most intensely studied theoretical topics dealt with laser beam-solid interactions. Experiments were undertaken to verify different theoretical models for this process. Later, these experiments became the pillars of many applications. Figure 1 illustrates the history of laser development from its initial discovery to practical applications. In this tree of evolution, Pulsed Laser Deposition (PLD) is only a small branch. It remained relatively obscure for a long time. Only in the last few years has his branch started to blossom and bear fruits in thin film deposition.Conceptually and experimentally, PLD is extremely simple, probably the simplest among all thin film growth techniques. Figure 2 shows a schematic diagram of this technique. It uses pulsed laser radiation to vaporize materials and to deposit thin films in a vacuum chamber. However, the beam-solid interaction that leads to evaporation/ablation is a very complex physical phenomenon. The theoretical description of the mechanism is multidisciplinary and combines equilibrium and nonequilibrium processes. The impact of a laser beam on the surface of a solid material, electromagnetic energy is converted first into electronic excitation and then into thermal, chemical, and even mechanical energy to cause evaporation, ablation, excitation, and plasma formation.

scholarly journals Polymer assisted deposition of epitaxial oxide thin films

2018 ◽  
Vol 6 (15) ◽  
pp. 3834-3844 ◽  
Author(s):  
José Manuel Vila-Fungueiriño ◽  
Beatriz Rivas-Murias ◽  
Juan Rubio-Zuazo ◽  
Adrian Carretero-Genevrier ◽  
Massimo Lazzari ◽  
...  
Keyword(s):  
Thin Film ◽  
Molecular Beam ◽  
High Vacuum ◽  
Pulsed Laser ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Deposition ◽  
Chemical Solution ◽  
Solution Methods ◽  
Epitaxial Oxide

Chemical solution methods for thin-film deposition constitute an affordable alternative to high-vacuum physical technologies, like Sputtering, Pulsed Laser Deposition (PLD) or Molecular Beam Epitaxy (MBE).

AIN thin film deposition by pulsed laser ablation of Al in NH3

1997 ◽  
Vol 295 (1-2) ◽  
pp. 77-82 ◽  
Author(s):  
A. Giardini Guidoni ◽  
A. Mele ◽  
T.M. Di Palma ◽  
C. Flamini ◽  
S. Orlando ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition

Titanium Oxynitride Thin Film Deposition by Pulsed Laser Ablation of Titanium Targets in Nitrogen

1992 ◽  
Vol 285 ◽  
Author(s):  
V. Craciun ◽  
D. Craciun ◽  
S. Amirhaghi ◽  
M. Vickers ◽  
S. Tarling ◽  
...  
Keyword(s):  
Chemical Resistance ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Nitrogen Atmosphere ◽  
Film Deposition ◽  
Laser Deposition ◽  
High Oxygen Content ◽  
Si Substrates ◽  
High Electrical Resistivity

ABSTRACTReactive pulsed laser deposition of titanium targets in a nitrogen atmosphere has been used to deposit thin titanium oxynitride films on Si substrates. The gold coloured layers exhibited a smooth, featureless surface and good chemical resistance in HF-HNO3 mixtures. The films had a high oxygen content which was responsible for relatively high electrical resistivity, measured to be 200–600 μΩ cm. This new method can easily be applied to the growth of other important nitrides such as ZrN, WN, HfN or the deposition of multilayer structures such as TiN/Ti on a variety of substrates.

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