scholarly journals Qualitative Simulation of the Growth of Electrolessly Deposited Cu Thin Films

2011 ◽  
Vol 2011 ◽  
pp. 1-13
Author(s):  
Hsiu-Chuan Wei

Electroless deposition for fabricating copper (Cu) interconnects of integrated circuits has drawn attention due to its low processing temperature, high deposition selectivity, and high coverage. In this paper, three-dimensional computer simulations of the qualitative growth properties of Cu particles and two-dimensional simulations of the trench-filling properties are conducted. The mathematical model employed in the study is a reaction-diffusion equation. An implicit finite difference discretization with a red-black Gauss-Seidel method as a solver is proposed for solving the reaction-diffusion equation. The simulated deposition properties agree with those observed in experimentation. Alternatives to improve the deposition properties are also discussed.

Author(s):  
Mohammad Ramezani

AbstractThe main propose of this paper is presenting an efficient numerical scheme to solve WSGD scheme for one- and two-dimensional distributed order fractional reaction–diffusion equation. The proposed method is based on fractional B-spline basics in collocation method which involve Caputo-type fractional derivatives for $$0 < \alpha < 1$$ 0 < α < 1 . The most significant privilege of proposed method is efficient and quite accurate and it requires relatively less computational work. The solution of consideration problem is transmute to the solution of the linear system of algebraic equations which can be solved by a suitable numerical method. The finally, several numerical WSGD Scheme for one- and two-dimensional distributed order fractional reaction–diffusion equation.


Author(s):  
Oluwaseun Adeyeye ◽  
Ali Aldalbahi ◽  
Jawad Raza ◽  
Zurni Omar ◽  
Mostafizur Rahaman ◽  
...  

AbstractThe processes of diffusion and reaction play essential roles in numerous system dynamics. Consequently, the solutions of reaction–diffusion equations have gained much attention because of not only their occurrence in many fields of science but also the existence of important properties and information in the solutions. However, despite the wide range of numerical methods explored for approximating solutions, the adoption of block methods is yet to be investigated. Hence, this article introduces a new two-step third–fourth-derivative block method as a numerical approach to solve the reaction–diffusion equation. In order to ensure improved accuracy, the method introduces the concept of nonlinearity in the solution of the linear model through the presence of higher derivatives. The method obtained accurate solutions for the model at varying values of the dimensionless diffusion parameter and saturation parameter. Furthermore, the solutions are also in good agreement with previous solutions by existing authors.


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