scholarly journals Effect of Substrate Sodium Content on Crystallization and Photocatalytic Activity of TiO2Films Prepared by DC Magnetron Sputtering

2007 ◽  
Vol 2007 ◽  
pp. 1-5 ◽  
Author(s):  
Henryk Tomaszewski ◽  
Karin Eufinger ◽  
Hilde Poelman ◽  
Dirk Poelman ◽  
Roger De Gryse ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Chemical Composition ◽  
Magnetron Sputtering ◽  
Soda Lime ◽  
Sodium Concentration ◽  
Sodium Content ◽  
Soda Lime Glass ◽  
Dc Magnetron Sputtering ◽  
Amorphous Films ◽  
Glass Support

The effect of sodium content of the glass support on the crystallinity of sputteredTiO2films and photocatalytic breakdown of ethanol has been studied. It was found that the activity of the as-deposited (amorphous) films does not depend on the type of support used. The chemical composition of the glass support does influence the activity of annealed films. When using soda-lime glass support sodium diffuses into the film upon annealing, suppressing anatase crystallization and decreasing its photocatalytic activity. To decrease the influence of sodium, soda-lime glass coated with an e-beam evaporatedSiO2barrier layer was used with good result. A reduced sodium concentration in the film leads to well crystallized anatase after annealing. An increased photocatalytic activity was observed for these films.

Effects of Substrate Temperature on the Microstructure and Properties of Al-Doped ZnO Thin Films by DC Magnetron Sputtering from AZOY® Target

2013 ◽  
Vol 284-287 ◽  
pp. 108-112
Author(s):  
Pin Chuan Yao ◽  
Shih Tse Hang ◽  
Menq Jiun Wu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Sputtering ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Dc Magnetron Sputtering ◽  
Sintered Ceramic ◽  
Substrate Heating ◽  
Glass Substrates ◽  
Doped Zno

Transparent conducting Al-doped ZnO (AZO) thin films were deposited on soda-lime glass substrates by DC magnetron sputtering with a sintered ceramic target, AZOY® that contains a small amount of Y2O3 in addition to Al2O3 and ZnO. The effect of substrate temperatures (Ts) on the structural, electrical and optical properties of the prepared AZO films was evaluated extensively. By elevating Ts, the electrical conductivity of the films could be effectively improved from 1.68 ×10-3 cm (no substrates heating) to a minimum resistivity of 4.6210-4 cm at Ts = 400oC with an average visible transmittance (400~800nm) of ~80%. It revealed that substrate heating is closely related to the crystallinity and the surface roughness of the deposited films. It is noteworthy that the transmittance in the NIR region was also improved considerably as compared to those using alloy targets by reactive magnetron sputtering and even slightly higher than those using Al-doped ZnO (1 wt.%) ceramic targets by RF sputtering.

GROWTH CHARACTERISTICS AND PROPERTIES OF AL-DOPED ZnO THIN FILMS BY DC MAGNETRON SPUTTERING FROM AZOY® TARGET

2013 ◽  
Vol 37 (3) ◽  
pp. 303-312 ◽  
Author(s):  
Pin-Chuan Yao ◽  
Shih-Tse Hang ◽  
Menq-Jiun Wu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Target Material ◽  
Cost Effective ◽  
Soda Lime ◽  
Optical Transmittance ◽  
Soda Lime Glass ◽  
Dc Magnetron Sputtering ◽  
Sintered Ceramic ◽  
Doped Zno

Transparent conducting Al-doped ZnO (AZO) thin films were deposited on soda-lime glass substrates by DC magnetron sputtering with a novel sintered ceramic target, AZOY® that contains a small amount of Y2O3 in addition to Al2O3 and ZnO. The effect of substrate temperature (Ts) on the structural, electrical and optical properties of the prepared AZO films was evaluated extensively. By elevating Ts, both the electrical conductivity and optical transmittance in the Vis/NIR region of the film could be effectively improved. The substrate heating is closely related to the crystallinity and the surface morphology of the deposited films. It is noteworthy that by employing this target material, high quality AZO thin films could be deposited with a simple and cost effective DC magnetron sputtering system.

scholarly journals Black TiOx Films with Photothermal-Assisted Photocatalytic Activity Prepared by Reactive Sputtering

Materials ◽  
2021 ◽  
Vol 14 (10) ◽  
pp. 2508
Author(s):  
Quan Mao ◽  
Meng Liu ◽  
Yajie Li ◽  
Yuquan Wei ◽  
Yong Yang ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Magnetron Sputtering ◽  
High Light ◽  
Chemical Compositions ◽  
Practical Application ◽  
Dc Magnetron Sputtering ◽  
Optical Absorbance ◽  
Low Efficiency ◽  
Tio2 Phase ◽  
Photocatalytic Tio2

Titanium oxide is widely applied as a photocatalyst. However, its low efficiency and narrow light absorption range are two main disadvantages that severely impede its practical application. In this work, black TiOx films with different chemical compositions were fabricated by tuning target voltage and controlling O2 flow during reactive DC magnetron sputtering. The optimized TiOx films with mixed phases (TiO, Ti2O3, Ti3O5, and TiO2) exhibited fantastic photothermal and photocatalytic activity by combining high light-absorptive Ti2O3 and Ti3O5 phases with the photocatalytic TiO2 phase. The sample prepared with oxygen flow at 5.6 ± 0.2 sccm and target voltage near 400 V exhibited excellent optical absorbance of 89.29% under visible light, which could improve surface temperature to 114 °C under sunlight. This film could degrade Rhodamine-B up to 74% after 150 min of UV irradiation. In a word, this work provides a guideline for fabricating black TiOx films with photothermal-assisted photocatalytic activity by reactive DC magnetron sputtering, which could avoid the usage of hydrogen and is convenient for quantity preparation.

The structure and photocatalytic activity of TiO2 thin films deposited by dc magnetron sputtering

2012 ◽  
Vol 52 (6) ◽  
pp. 1131-1142 ◽  
Author(s):  
W.J. Yang ◽  
C.Y. Hsu ◽  
Y.W. Liu ◽  
R.Q. Hsu ◽  
T.W. Lu ◽  
...  
Keyword(s):  
Thin Films ◽  
Photocatalytic Activity ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Tio2 Thin Films

GROWTH OF AZO FILMS ON BUFFER LAYERS BY RF MAGNETRON SPUTTERING

2010 ◽  
Vol 24 (31) ◽  
pp. 3033-3040 ◽  
Author(s):  
C. W. CHEN ◽  
C. H. TSENG ◽  
C. Y. HSU ◽  
C. P. CHOU ◽  
K. H. HOU
Keyword(s):  
Magnetron Sputtering ◽  
Buffer Layer ◽  
Sheet Resistance ◽  
Soda Lime ◽  
Rf Magnetron Sputtering ◽  
Buffer Layers ◽  
Visible Range ◽  
Soda Lime Glass ◽  
Soda Lime Glass Substrate ◽  
Al Thin Film

Al 2 O 3-doped zinc oxide (in AZO, the Al 2 O 3 contents are approximately 2 wt.%) films have been grown by radio frequency (RF) magnetron sputtering at room temperature under varied sputtering pressures ranging from 3.5–15 mTorr. The electrical resistivity of AZO films is about 2.22×10-3 Ωcm (sheet resistance ~ 89 Ω/square for a thickness ~ 250 nm), and the visible range transmittance is about 80% at the argon sputtering pressure of 15 mTorr and a RF power of 100 W. This study analyzes the structural, morphological, electrical and optical properties of AZO thin films grown on soda-lime glass substrate with 2, 5, and 10 nm thick Al buffer layers (and SiO 2 buffer). For the films deposited on the 2 nm thick Al buffer layer, we obtained a c-axis-oriented AZO/ Al thin film on glass with the XRD full-width at half maximum (FWHM) of 0.31 and root mean square (RMS) surface roughness of about 3.22 nm. The lowest resistivity of 9.46×10-4 Ωcm (sheet resistance ~ 37.87 Ω/square for a thickness ~ 250 nm) and a high transmittance (80%) were obtained by applying a 2 nm thick Al buffer layer. In contrast, the resistivity was slightly increased by applying the SiO 2 buffer layer.

scholarly journals Adhesion Improvement and Characterization of Magnetron Sputter Deposited Bilayer Molybdenum Thin Films for Rear Contact Application in CIGS Solar Cells

2016 ◽  
Vol 2016 ◽  
pp. 1-10 ◽  
Author(s):  
Weimin Li ◽  
Xia Yan ◽  
Armin G. Aberle ◽  
Selvaraj Venkataraj
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Magnetron Sputtering ◽  
Surface Oxidation ◽  
Bottom Layer ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Individual Layer ◽  
Glass Substrates ◽  
Cigs Solar Cells

Molybdenum (Mo) thin films are widely used as rear electrodes in copper indium gallium diselenide (CIGS) solar cells. The challenge in Mo deposition by magnetron sputtering lies in simultaneously achieving good adhesion to the substrates while retaining the electrical and optical properties. Bilayer Mo films, comprising five different thickness ratios of a high pressure (HP) deposited bottom layer and a low pressure (LP) deposited top layer, were deposited on 40 cm × 30 cm soda-lime glass substrates by DC magnetron sputtering. We focus on understanding the effects of the individual layer properties on the resulting bilayer Mo films, such as microstructure, surface morphology, and surface oxidation. We show that the thickness of the bottom HP Mo layer plays a major role in determining the micromechanical and physical properties of the bilayer Mo stack. Our studies reveal that a thicker HP Mo bottom layer not only improves the adhesion of the bilayer Mo, but also helps to improve the film crystallinity along the preferred [110] direction. However, the surface roughness and the porosity of the bilayer Mo films are found to increase with increasing bottom layer thickness, which leads to lower optical reflectance and a higher probability for oxidation at the Mo surface.

Effects of Growth Parameters on Surface-morphological, Structural and Electrical Properties of Mo Films by RF Magnetron Sputtering

2008 ◽  
Vol 1123 ◽  
Author(s):  
Shou-Yi Kuo ◽  
Liann-Be Chang ◽  
Ming-Jer Jeng ◽  
Wei-Ting Lin ◽  
Yong-Tian Lu ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Growth Parameters ◽  
Soda Lime ◽  
Rf Magnetron Sputtering ◽  
Soda Lime Glass ◽  
Working Pressure ◽  
Soda Lime Glass Substrate ◽  
X Ray

AbstractThis work reports on the fabrication and characterization of Mo thin films on soda-lime glass substrate grown by reactive RF magnetron sputtering. Film thickness was measured by x-ray step surface profiler. The structural properties and surface morphology were analyzed by x-ray diffraction (XRD), atomic force microscope (AFM) and scanning electron microscopy (SEM). Electrical properties were measured by four-point probe. It was found that the growth parameters, such as argon flow rate, RF power, film thickness, have significant influences on properties of Mo films. The strain on films revealed the complicated relationship with the working pressure, which might be associated with micro structures and impurities. In order to improve the adhesion and electricity, we adopted a two-pressure deposition scheme. The optimal thickness and sheet resistance are νm and 0.12 ω The mechanisms therein will be discussed in detail. Furthermore, we also investigated the diffusion property of Na ion of double Mo films sputtered on soda-lime glass. Our experimental results could lead to better understanding for improving further CIGS-based photovoltaic devices.

scholarly journals Preparation and Photocatalytic Activity of \(\text{ZnO/TiO}_2\) Hierarchical Heterogeneous Nanostructures via DC Magnetron Sputtering

2013 ◽  
Vol 23 (1) ◽  
pp. 89
Author(s):  
Le Phuc Quy ◽  
Vu Thi Hanh Thu
Keyword(s):  
Thin Films ◽  
Photocatalytic Activity ◽  
Water Treatment ◽  
Skin Cancer ◽  
Magnetron Sputtering ◽  
Absorption Edge ◽  
Organic Radicals ◽  
Dc Magnetron Sputtering ◽  
Halogen Compounds ◽  
Surface Contaminants

TiO\(_2\) thin films are used for oxidation of organic radicals, reducing CO\(_2\), skin cancer treatment, decomposing halogen compounds in the air, breaking down surface contaminants, water treatment, biodegradable oil on the surface of the water, disinfect, anti-bacteria, self-cleaning and anti-fog coating,… To increase the photocatalytic and anti-Ecoli bacteria abilities of TiO\(_2\) thin films, this study synthesized the ZnO/TiO\(_2\) hierarchical heterogeneous nanostructures (HNs) by DC magnetron sputtering. The results showed that ZnO/TiO\(_2\) (HNs) has been the photocatalytic and anti - Ecoli bacteria abilities higher than TiO\(_2\) film. This result is explained by reducing the recombination of electrons - holes and slightly shifted absorption edge of them to the visible light band.

Joining of TiAl Using a Thin Multilayer

2006 ◽  
Vol 514-516 ◽  
pp. 1323-1327 ◽  
Author(s):  
Liliana I. Duarte ◽  
Ana Sofia Ramos ◽  
Manuel F. Vieira ◽  
Filomena Viana ◽  
M. Teresa Vieira
Keyword(s):  
Chemical Composition ◽  
Magnetron Sputtering ◽  
Automotive Industry ◽  
Joint Strength ◽  
Small Deformation ◽  
Cost Effective ◽  
Bonded Joints ◽  
Bilayer Thickness ◽  
Dc Magnetron Sputtering ◽  
Deposition Conditions

As TiAl based alloys begin to approach maturity, the development of successful and cost effective joining methods will be required. The growing industrial interest in these materials, particularly in aerospace and automotive industry, led to an interesting challenge - how to joint parts and components in order to produce integrated and resistant structures. Diffusion bonding of materials produces components with thinner interfaces than other joining techniques do. The absence of abrupt microstructure discontinuity and the small deformation induced maximize joint strength. This work focuses on the joining of TiAl using a thin multilayer obtained by alternating nanometric layers of titanium and aluminium. The Ti/Al layers were deposited onto the γ-TiAl samples by DC magnetron sputtering. The interfaces of these diffusion bonded joints depend on processing and deposition conditions. In this work we describe the influence of bilayer thickness (period) and on microstructure and chemical composition of the joining interfaces.

The Effect of Sputtering Power on the Properties of One-step Deposited Cu2ZnSnSe4 Thin Films

2014 ◽  
Vol 1603 ◽  
Author(s):  
Yong Yan ◽  
Shasha Li ◽  
Zhou Yu ◽  
Yong Zhang ◽  
Yong Zhao
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Room Temperature ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Radio Frequency Magnetron Sputtering ◽  
Glass Substrates ◽  
Sputtering Power ◽  
One Step ◽  
Deposited Films

ABSTRACTCu2ZnSnSe4 films were deposited on soda lime glass substrates at room temperature by one-step radio frequency magnetron-sputtering process. The effect of sputtering power on the properties of one-step deposited Cu2ZnSnSe4 thin films has been investigated. The deposited films might be suitable for the absorber layers in the solar cells. The chemical composition and the preferred orientation of the films can be optimized by the sputtering power.

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