Cleaning and Passivation of Copper Surface Using N2H4, and Self-Assembled Monolayers for Area-Selective Atomic Layer Deposition (AS-ALD) Applications

2020 ◽  
Vol MA2020-02 (23) ◽  
pp. 1663-1663
Author(s):  
Su Min Hwang ◽  
Jin-Hyun Kim ◽  
Sang Woo Kim ◽  
Yong Chan Jung ◽  
Jean-Francois Veyan ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Layer Deposition ◽  
Assembled Monolayers ◽  
Self Assembled

scholarly journals Modifying hydrophilic properties of polyurethane acryl paint substrates by atomic layer deposition and self-assembled monolayers

RSC Advances ◽  
2020 ◽  
Vol 10 (57) ◽  
pp. 34333-34343
Author(s):  
D. Beitner ◽  
I. Polishchuk ◽  
E. Asulin ◽  
B. Pokroy
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Self Assembled Monolayers ◽  
Surface Wetting ◽  
Wetting Properties ◽  
Layer Deposition ◽  
Assembled Monolayers ◽  
Self Assembled

A process of atomic layer deposition (ALD) combined with self-assembled monolayers (SAMs) was used to investigate the possible modification of polyurethane (PUR) paint surface wetting properties without altering their original hue.

Controlling Area-Selective Atomic Layer Deposition of HfO2 Dielectric by Self-assembled Monolayers

2004 ◽  
Vol 811 ◽  
Author(s):  
Rong Chen ◽  
Hyoungsub Kim ◽  
Paul C. McIntyre ◽  
Stacey F. Bent
Keyword(s):  
Atomic Layer Deposition ◽  
Chain Length ◽  
Steric Effect ◽  
Atomic Layer ◽  
High Reactivity ◽  
Self Assembled Monolayers ◽  
Organic Monolayers ◽  
Layer Deposition ◽  
Assembled Monolayers ◽  
Self Assembled

ABSTRACTA series of self-assembled molecules have been investigated as deactivating agents for the HfO2 atomic layer deposition (ALD). Three important factors of self-assembled monolayers (SAMs) deactivating efficiency towards ALD--chain length, reactivity and steric effect--have been investigated and discussed as well as the initial blocking mechanism of this process. This investigation shows that in order to achieve satisfactory deactivation, it is crucial to choose high reactivity, low steric effect molecules with certain chain length to form condensed, high hydrophobic organic monolayers.

Seeding Atomic Layer Deposition of High-k Dielectrics on Epitaxial Graphene with Organic Self-Assembled Monolayers

ACS Nano ◽  
2011 ◽  
Vol 5 (6) ◽  
pp. 5223-5232 ◽  
Author(s):  
Justice M. P. Alaboson ◽  
Qing Hua Wang ◽  
Jonathan D. Emery ◽  
Albert L. Lipson ◽  
Michael J. Bedzyk ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Epitaxial Graphene ◽  
Self Assembled Monolayers ◽  
Layer Deposition ◽  
High K ◽  
Assembled Monolayers ◽  
Self Assembled
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