Atomic Layer Deposition of Aluminum Oxide for Surface Passivation of InGaAs∕InP Heterojunction Bipolar Transistors
2011 ◽
Vol 158
(12)
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pp. H1279
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2008 ◽
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2015 ◽
Vol 357
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pp. 635-642
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2010 ◽
Vol 20
(18)
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pp. 3099-3105
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2015 ◽
Vol 7
(24)
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pp. 13154-13163
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2012 ◽
Vol 30
(1)
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pp. 01A127
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