Electrochemical Production of Oxalate and Formate from CO2by Solvated Electrons Produced Using an Atmospheric-Pressure Plasma

2016 ◽  
Vol 163 (10) ◽  
pp. F1157-F1161 ◽  
Author(s):  
Paul Rumbach ◽  
Rui Xu ◽  
David B. Go
2015 ◽  
Vol 6 (1) ◽  
Author(s):  
Paul Rumbach ◽  
David M. Bartels ◽  
R. Mohan Sankaran ◽  
David B. Go

Abstract Solvated electrons are typically generated by radiolysis or photoionization of solutes. While plasmas containing free electrons have been brought into contact with liquids in studies dating back centuries, there has been little evidence that electrons are solvated by this approach. Here we report direct measurements of solvated electrons generated by an atmospheric-pressure plasma in contact with the surface of an aqueous solution. The electrons are measured by their optical absorbance using a total internal reflection geometry. The measured absorption spectrum is unexpectedly blue shifted, which is potentially due to the intense electric field in the interfacial Debye layer. We estimate an average penetration depth of 2.5±1.0 nm, indicating that the electrons fully solvate before reacting through second-order recombination. Reactions with various electron scavengers including H+, NO2 −, NO3 − and H2O2 show that the kinetics are similar, but not identical, to those for solvated electrons formed in bulk water by radiolysis.


2016 ◽  
Vol 49 (29) ◽  
pp. 295205 ◽  
Author(s):  
R Gopalakrishnan ◽  
E Kawamura ◽  
A J Lichtenberg ◽  
M A Lieberman ◽  
D B Graves

PIERS Online ◽  
2010 ◽  
Vol 6 (7) ◽  
pp. 636-639
Author(s):  
Toshiyuki Nakamiya ◽  
Fumiaki Mitsugi ◽  
Shota Suyama ◽  
Tomoaki Ikegami ◽  
Yoshito Sonoda ◽  
...  

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2931
Author(s):  
Soumya Banerjee ◽  
Ek Adhikari ◽  
Pitambar Sapkota ◽  
Amal Sebastian ◽  
Sylwia Ptasinska

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.


2018 ◽  
Vol 677 (1) ◽  
pp. 135-142
Author(s):  
Dong Ha Kim ◽  
Choon-Sang Park ◽  
Eun Young Jung ◽  
Bhum Jae Shin ◽  
Jae Young Kim ◽  
...  

Author(s):  
Thisara Sandanuwan ◽  
Nayanathara Hendeniya ◽  
D.A.S. Amarasinghe ◽  
Dinesh Attygalle ◽  
Sampath Weragoda

Author(s):  
Kenneth A. Cornell ◽  
Amanda White ◽  
Adam Croteau ◽  
Jessica Carlson ◽  
Zeke Kennedy ◽  
...  

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