Performance Enhancement for Charge Trapping Memory by Using Al2O3/HfO2/Al2O3Tri-Layer High-κ Dielectrics and High Work Function Metal Gate

2018 ◽  
Vol 7 (6) ◽  
pp. N91-N95 ◽  
Author(s):  
Zhaozhao Hou ◽  
Zhenhua Wu ◽  
Huaxiang Yin
Keyword(s):  
Work Function ◽  
Performance Enhancement ◽  
Charge Trapping ◽  
Metal Gate ◽  
High Work Function ◽  
Charge Trapping Memory ◽  
High Work

Crucial integration of high work-function metal gate and high-k blocking oxide on charge-trapping type flash memory device

2008 ◽  
Vol 93 (25) ◽  
pp. 252902 ◽  
Author(s):  
Ping-Hung Tsai ◽  
Kuei-Shu Chang-Liao ◽  
Dong-Wei Yang ◽  
Yuan-Bin Chung ◽  
Tien-Ko Wang ◽  
...  
Keyword(s):  
Work Function ◽  
Flash Memory ◽  
Charge Trapping ◽  
Memory Device ◽  
Metal Gate ◽  
High Work Function ◽  
High K ◽  
High Work

High work function metal gate and reliability improvement for MOS device by integration of TiN/MoN and HfAlO dielectric

2010 ◽  
Vol 54 (10) ◽  
pp. 1160-1165 ◽  
Author(s):  
Chung-Hao Fu ◽  
Kuei-Shu Chang-Liao ◽  
Hsueh-Yueh Lu ◽  
Chen-Chien Li ◽  
Tien-Ko Wang
Keyword(s):  
Work Function ◽  
Metal Gate ◽  
High Work Function ◽  
Reliability Improvement ◽  
High Work ◽  
Mos Device

Performance enhancement of polymer solar cells with high work function CuS modified ITO as anodes

2015 ◽  
Vol 22 ◽  
pp. 173-179 ◽  
Author(s):  
Hongwei Lei ◽  
Pingli Qin ◽  
Weijun Ke ◽  
Yaxiong Guo ◽  
Xin Dai ◽  
...  
Keyword(s):  
Solar Cells ◽  
Work Function ◽  
Performance Enhancement ◽  
Polymer Solar Cells ◽  
High Work Function ◽  
High Work
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