Growth, Thermal Stability and Cu Diffusivity of Reactively Sputtered NbN Thin Films as Diffusion Barriers between Cu and Si

2013 ◽  
Vol 2 (7) ◽  
pp. N152-N158 ◽  
Author(s):  
Cheng-Lin Huang ◽  
Chih-Huang Lai ◽  
Po-Hao Tsai ◽  
Hsing-An Huang ◽  
Jing-Cheng Lin ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Diffusion Barriers ◽  
Cu Diffusivity

The effect of sputtered W-based carbide diffusion barriers on the thermal stability and void formation in copper thin films

2010 ◽  
Vol 87 (12) ◽  
pp. 2535-2539 ◽  
Author(s):  
Qi Xie ◽  
Yu-Long Jiang ◽  
Keon De Keyser ◽  
Christophe Detavernier ◽  
Davy Deduytsche ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Void Formation ◽  
Diffusion Barriers

Evaluation of the thermal stability of reactively sputtered (Ti, Zr)Nx nano-thin films as diffusion barriers between Cu and Silicon

2005 ◽  
Vol 484 (1-2) ◽  
pp. 265-271 ◽  
Author(s):  
Yu-Lin Kuo ◽  
Chiapyng Lee ◽  
Jing-Cheng Lin ◽  
Yee-Wen Yen ◽  
Wen-Horng Lee
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Diffusion Barriers ◽  
Thermal Stability Of

Thermal stability, adhesion and electrical studies on (Ti,Zr)N x thin films as low resistive diffusion barriers between Cu and Si

2014 ◽  
Vol 10 (3) ◽  
pp. 551-556 ◽  
Author(s):  
Cheng-Lin Huang ◽  
Chih-Huang Lai ◽  
Po-Hao Tsai ◽  
Yu-Lin Kuo ◽  
Jing-Cheng Lin ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Diffusion Barriers ◽  
Electrical Studies

Stress Relaxation and the Formation of Silicides in the Process of the Crystallization of NI-NB Films on SI

1991 ◽  
Vol 49 ◽  
pp. 898-899
Author(s):  
N. Rozhanski ◽  
V. Lifshitz
Keyword(s):  
Thin Films ◽  
Stress Relaxation ◽  
Integrated Circuits ◽  
Direct Evidence ◽  
Alloy Film ◽  
Diffusion Barriers ◽  
Effective Barrier

Thin films of amorphous Ni-Nb alloys are of interest since they can be used as diffusion barriers for integrated circuits on Si. A native SiO2 layer is an effective barrier for Ni diffusion but it deformation during the crystallization of the alloy film lead to the appearence of diffusion fluxes through it and the following formation of silicides. This study concerns the direct evidence of the action of stresses in the process of the crystallization of Ni-Nb films on Si and the structure of forming NiSi2 islands.

scholarly journals The role of the substrate on the mechanical and thermal stability of Pd thin films during hydrogen (de)sorption

2021 ◽  
Vol 46 (5) ◽  
pp. 4137-4153
Author(s):  
Neha Verma ◽  
Rob Delhez ◽  
Niek M. van der Pers ◽  
Frans D. Tichelaar ◽  
Amarante J. Böttger
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Thermal Stability Of

scholarly journals Effect of Growth Temperature on the Characteristics of CsPbI3-Quantum Dots Doped Perovskite Film

Molecules ◽  
2021 ◽  
Vol 26 (15) ◽  
pp. 4439
Author(s):  
Shui-Yang Lien ◽  
Yu-Hao Chen ◽  
Wen-Ray Chen ◽  
Chuan-Hsi Liu ◽  
Chien-Jung Huang
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Quantum Dots ◽  
Quantum Dot ◽  
Growth Temperature ◽  
Electron Mobility ◽  
Surface Defects ◽  
Different Temperatures ◽  
Pb Doping ◽  
Pristine Film

In this study, adding CsPbI3 quantum dots to organic perovskite methylamine lead triiodide (CH3NH3PbI3) to form a doped perovskite film filmed by different temperatures was found to effectively reduce the formation of unsaturated metal Pb. Doping a small amount of CsPbI3 quantum dots could enhance thermal stability and improve surface defects. The electron mobility of the doped film was 2.5 times higher than the pristine film. This was a major breakthrough for inorganic quantum dot doped organic perovskite thin films.

scholarly journals The influence of an ultra-high resistivity Ta underlayer on perpendicular magnetic anisotropy in Ta/Pt/Co/Pt heterostructures

RSC Advances ◽  
2020 ◽  
Vol 10 (19) ◽  
pp. 11219-11224
Author(s):  
Wei Zhang ◽  
Xiaoxiong Jia ◽  
Rui Wang ◽  
Huihui Liu ◽  
Zhengyu Xiao ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Magnetic Anisotropy ◽  
High Stability ◽  
Essential Role ◽  
Perpendicular Magnetic Anisotropy ◽  
Low Energy ◽  
High Resistivity ◽  
Excellent Thermal Stability ◽  
Low Energy Consumption

Thin films with perpendicular magnetic anisotropy (PMA) play an essential role in the development of technologies due to their excellent thermal stability and potential application in devices with high density, high stability, and low energy consumption.

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