Nanoscale Etching of In0.53Ga0.47As in H2O2/HCl Solutions for Advanced CMOS Processing

2014 ◽  
Vol 3 (6) ◽  
pp. P179-P184 ◽  
Author(s):  
Dennis H. van Dorp ◽  
Sophia Arnauts ◽  
Daniel Cuypers ◽  
Jens Rip ◽  
Frank Holsteyns ◽  
...  
Keyword(s):  
Cmos Processing

Sine-Wave Exciting Circuit for Quartz Vibrating Gyroscope

2013 ◽  
Vol 562-565 ◽  
pp. 417-420
Author(s):  
Qing Yi Wang ◽  
Xiao Wei Liu ◽  
Rui Zhang ◽  
Liang Yin ◽  
Zhi Ping Zhou
Keyword(s):  
High Performance ◽  
Small Volume ◽  
Angular Rate ◽  
Sine Wave ◽  
Processing Technology ◽  
Angular Rate Sensor ◽  
Square Wave ◽  
Rate Sensor ◽  
Is Design ◽  
Cmos Processing

Quartz vibrating gyroscope is a kind of angular rate sensor which is the compromise between the high performance and the small volume. Improvement of the performance is a focus of reach. In this paper, a sine-wave exciting method is discussed. A sine-wave exciting circuit is design and processed with 0.5μm CMOS processing technology. During comparing the sine-wave exciting response and the square-wave one, the sine-wave exciting circuit is more beneficial to improve the performance of the quartz vibrating gyroscope.

A Study of Stacking Faults during CMOS Processing: Origin, Elimination and Contribution to Leakage

1980 ◽  
Vol 127 (3) ◽  
pp. 716-724 ◽  
Author(s):  
S. P. Murarka ◽  
T. E. Seidel ◽  
J. V. Dalton ◽  
J. M. Dishman ◽  
M. H. Read
Keyword(s):  
Stacking Faults ◽  
Cmos Processing

Prevention of plasma-induced damage on thin gate oxides in BEOL sub-half micron CMOS processing

2013 ◽  
Vol 34 (6) ◽  
pp. 066003
Author(s):  
Qi He ◽  
Wenbin Zhao ◽  
Li Peng ◽  
Zongguang Yu
Keyword(s):  
Gate Oxides ◽  
Cmos Processing

P-well/N-well Compatible CMOS Processing for ASIC Applications

1986 ◽  
Author(s):  
Tadahiro KURODA ◽  
Hiroyuki AKIBA ◽  
Hiroaki SUZUKI ◽  
Takao AOKI
Keyword(s):  
Cmos Processing

Wet-Chemical Etching of InGaAs for Advanced CMOS Processing

2013 ◽  
Vol 58 (6) ◽  
pp. 281-287 ◽  
Author(s):  
D. H. v. Dorp ◽  
S. Arnauts ◽  
D. Cuypers ◽  
J. Rip ◽  
F. Holsteyns ◽  
...  
Keyword(s):  
Chemical Etching ◽  
Wet Chemical ◽  
Wet Chemical Etching ◽  
Cmos Processing
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