Sputtered Silicon Nitride Thin Films for Non-Volatile Memory Applications

2019 ◽  
Vol 39 (1) ◽  
pp. 371-377
Author(s):  
Matheus Adam ◽  
Artur Vicente P. Coelho ◽  
Marcelo B. Pereira ◽  
Henri I. Boudinov
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Non Volatile Memory ◽  
Volatile Memory ◽  
Memory Applications

Characteristics of SrBi2Ta2O9 thin films prepared by pulsed laser deposition for non-volatile memory applications

2000 ◽  
Vol 375 (1-2) ◽  
pp. 200-204 ◽  
Author(s):  
Xinhua Zhu ◽  
Yiming Liu ◽  
Zhenghua An ◽  
Tao Zhu ◽  
Zhuangchun Wu ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Non Volatile Memory ◽  
Volatile Memory ◽  
Memory Applications

Electrical characterization of SrBi2Ta2O9 thin films for ferroelectric non-volatile memory applications

1996 ◽  
Vol 12 (1) ◽  
pp. 23-31 ◽  
Author(s):  
R. E. Jones ◽  
Peter Zurcher ◽  
B. Jiang ◽  
J. Z. Witowski ◽  
Y. T. Lii ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Characterization ◽  
Non Volatile Memory ◽  
Volatile Memory ◽  
Memory Applications

Epitaxial ferroelectric PbZrxTi1–xO3 thin films for non-volatile memory applications

2000 ◽  
Vol 40 (4-5) ◽  
pp. 671-674 ◽  
Author(s):  
C Guerrero ◽  
C Ferrater ◽  
J Roldán ◽  
V Trtı́k ◽  
F Sánchez ◽  
...  
Keyword(s):  
Thin Films ◽  
Non Volatile Memory ◽  
Volatile Memory ◽  
Memory Applications
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