Combinational Effects of Oxygen Plasma Irradiation and Annealing on LiMn[sub 2]O[sub 4] Thin Film Cathodes

2011 ◽  
Vol 158 (3) ◽  
pp. A262 ◽  
Author(s):  
Chen Chung Chen ◽  
Kuo-Feng Chiu ◽  
Kun Ming Lin ◽  
Hsin Chih Lin ◽  
Chang-Rung Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Oxygen Plasma ◽  
Plasma Irradiation

scholarly journals Formation of WO3 Reduction Coloring Thin Film Using a Combination Sputtering Method Featuring Radio-Frequency Oxygen Plasma Irradiation

2011 ◽  
Vol 54 (5) ◽  
pp. 317-321 ◽  
Author(s):  
Daisuke NOGUCHI ◽  
Shoji FUKUDOME ◽  
Megumi SHIMONIIHARA ◽  
Yoshihiko KAWANO ◽  
Fumihiro SEI
Keyword(s):  
Thin Film ◽  
Radio Frequency ◽  
Oxygen Plasma ◽  
Plasma Irradiation

Modification of low temperature deposited LiMn2O4 thin film cathodes by oxygen plasma irradiation

2009 ◽  
Vol 517 (14) ◽  
pp. 4192-4195 ◽  
Author(s):  
Chen Chung Chen ◽  
Kuo-Feng Chiu ◽  
Kun Ming Lin ◽  
Hsin Chih Lin
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Oxygen Plasma ◽  
Plasma Irradiation

Ion Conductivity of Ta2O5Solid Electrolyte Thin Film Prepared by Combination Sputtering with Radio Frequency Oxygen Plasma Irradiation

2012 ◽  
Vol 51 (2R) ◽  
pp. 025801
Author(s):  
Daisuke Noguchi ◽  
Hiroshi Taneda ◽  
Yukie Higashimaru ◽  
Yoshihiko Kawano ◽  
Fumihiro Sei
Keyword(s):  
Thin Film ◽  
Radio Frequency ◽  
Oxygen Plasma ◽  
Ion Conductivity ◽  
Plasma Irradiation

Improvement in stability of LiMn2O4 thin-film electrodes by oxygen-plasma irradiation to precursor gel

2010 ◽  
Vol 15 (3) ◽  
pp. 503-510 ◽  
Author(s):  
Yoshiaki Matsuo ◽  
Yosohiro Sugie ◽  
Kouta Sakamoto ◽  
Tomokazu Fukutsuka
Keyword(s):  
Thin Film ◽  
Oxygen Plasma ◽  
Plasma Irradiation ◽  
Thin Film Electrodes

Thin Film Growth of YBa2Cu3O7-xby ECR Oxygen Plasma Assisted Reactive Evaporation

1989 ◽  
Vol 28 (Part 2, No. 4) ◽  
pp. L635-L638 ◽  
Author(s):  
Toshiyuki Aida ◽  
Akira Tsukamoto ◽  
Kazushige Imagawa ◽  
Tokuumi Fukazawa ◽  
Sakae Saito ◽  
...  
Keyword(s):  
Thin Film ◽  
Oxygen Plasma ◽  
Film Growth ◽  
Thin Film Growth ◽  
Reactive Evaporation

Novel patterning of flexible and transparent Ag nanowire electrodes using oxygen plasma treatment

2018 ◽  
Vol 6 (35) ◽  
pp. 9394-9398 ◽  
Author(s):  
Hoijoon Kim ◽  
Giseok Lee ◽  
Stefan Becker ◽  
Ji-Seon Kim ◽  
Hyoungsub Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Plasma Treatment ◽  
Thin Film Transistors ◽  
Oxygen Plasma ◽  
Oxygen Plasma Treatment ◽  
Ag Nanowire

We explore a novel patterning method for flexible and transparent Ag nanowire electrodes using oxygen plasma treatment without a toxic etchant and its application to source/drain electrodes of MoS2-based thin-film transistors.

Atomic Layer Deposition of Lithium-Silicon-Tin Oxide Nanofilms for High Performance Thin Film Batteries Anodes

2020 ◽  
Vol 299 ◽  
pp. 1058-1063
Author(s):  
Denis Nazarov ◽  
Ilya Mitrofanov ◽  
Maxim Yu. Maximov
Keyword(s):  
Thin Film ◽  
Stainless Steel ◽  
Atomic Layer Deposition ◽  
Tin Oxide ◽  
Oxygen Plasma ◽  
Atomic Layer ◽  
Cycling Performance ◽  
Spectral Ellipsometry ◽  
X Ray ◽  
Layer Deposition

Tin oxide is the most promising material for thin film anodes of Li-ion batteries due to its cycling performance and high theoretical capacity. It is assumed that lithium-tin oxide can demonstrate even higher performance. Lithium-silicon-tin oxide nanofilms were prepared by atomic layer deposition (ALD), using the lithium bis (trimethylsilyl) amide (LiHMDS), tetraethyltin (TET) as a metal containing reagents and ozone or water or oxygen plasma as counter-reactants. Monocrystalline silicon (100) and stainless steel (316SS) were used as supports. The thicknesses of the nanofilms were measured by spectral ellipsometry (SE) and scanning electron microscopy (SEM). It was found that oxygen plasma is the most optimal ALD counter-reactant. The composition and structure were studied by Time-of-Flight Secondary Ion Mass Spectroscopy (ToF-SIMS), X-ray Photoelectron Spectroscopy (XPS) and X-ray diffraction (XRD). The nanofilms contain silicon as impurity, whose source is the ALD precursor (LiHMDS). The nanofilms deposited on stainless steel have shown the high Coulombic efficiency (99.1-99.8%) and cycling performance at a relatively high voltage (0.01 to 2.0V).

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