Formation of Silicon Nitride Layer on Microcrystalline Silicon Thin Films by Hot-wire Chemical Vapor Method using Nitrogen and Hydrogen Gases

2019 ◽  
Vol 25 (8) ◽  
pp. 339-342
Author(s):  
Akimori Tabata ◽  
Koji Mazaki ◽  
Akihiro Kondo
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Chemical Vapor ◽  
Nitride Layer ◽  
Hot Wire ◽  
Microcrystalline Silicon ◽  
Silicon Thin Films ◽  
Silicon Nitride Layer ◽  
Vapor Method

Ultrafast deposition of silicon nitride and semiconductor silicon thin films by hot wire chemical vapor deposition

2009 ◽  
Vol 517 (10) ◽  
pp. 3039-3042 ◽  
Author(s):  
R.E.I. Schropp ◽  
C.H.M. van der Werf ◽  
V. Verlaan ◽  
J.K. Rath ◽  
H. Li
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Semiconductor Silicon ◽  
Silicon Thin Films

Transport in microcrystalline silicon thin films deposited at low temperature by hot-wire chemical vapor deposition

2006 ◽  
Vol 501 (1-2) ◽  
pp. 133-136 ◽  
Author(s):  
Jean-Eric Bourée ◽  
Sandesh R. Jadkar ◽  
Samir Kasouit ◽  
Régis Vanderhaghen
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Microcrystalline Silicon ◽  
Silicon Thin Films
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