Electrodeposition of Poly(phenylene oxide) Nanoscale Patterns with Nanosphere Lithography

2019 ◽  
Vol 19 (6) ◽  
pp. 159-164 ◽  
Author(s):  
Jason Kang ◽  
Huaqing Li ◽  
Scott Cushing ◽  
Jin Wang ◽  
Nianqiang Wu
Keyword(s):  
Nanosphere Lithography ◽  
Phenylene Oxide ◽  
Nanoscale Patterns

Side-chain manipulation of poly (phenylene oxide) based anion exchange membrane: Alkoxyl extender integrated with flexible spacer

2021 ◽  
Vol 624 ◽  
pp. 119088
Author(s):  
Lv Li ◽  
Jiaao Wang ◽  
Manzoor Hussain ◽  
Lingling Ma ◽  
Naeem Akhtar Qaisrani ◽  
...  
Keyword(s):  
Anion Exchange ◽  
Anion Exchange Membrane ◽  
Side Chain ◽  
Flexible Spacer ◽  
Phenylene Oxide ◽  
Exchange Membrane

scholarly journals High-yield fabrication of perpendicularly magnetised synthetic antiferromagnetic nanodiscs

Nano Research ◽  
2021 ◽  
Author(s):  
Emma N. Welbourne ◽  
Tarun Vemulkar ◽  
Russell P. Cowburn
Keyword(s):  
Thin Film ◽  
Magnetic Properties ◽  
Sacrificial Layer ◽  
Nanosphere Lithography ◽  
High Yield ◽  
Perpendicular Anisotropy ◽  
Ion Milling ◽  
Lift Off

AbstractSynthetic antiferromagnetic (SAF) particles with perpendicular anisotropy display a number of desirable characteristics for applications in biological and other fluid environments. We present an efficient and effective method for the patterning of ultrathin Ruderman-Kittel-Kasuya-Yoshida coupled, perpendicularly magnetised SAFs using a combination of nanosphere lithography and ion milling. A Ge sacrificial layer is utilised, which provides a clean and simple lift-off process, as well as maintaining the key magnetic properties that are beneficial to target applications. We demonstrate that the method is capable of producing a particularly high yield of well-defined, thin film based nanoparticles.

scholarly journals Formation of SiO2 hard mask using dry etching and nanosphere lithography

2020 ◽  
Vol 1697 ◽  
pp. 012188
Author(s):  
E A Vyacheslavova ◽  
I A Morozov ◽  
D A Kudryashov ◽  
A S Gudovskikh
Keyword(s):  
Nanosphere Lithography ◽  
Dry Etching ◽  
Hard Mask

Large-Scale Metasurfaces Based on Grayscale Nanosphere Lithography

ACS Photonics ◽  
2021 ◽  
Author(s):  
Hanyu Zheng ◽  
You Zhou ◽  
Chibuzor Fabian Ugwu ◽  
Andrew Du ◽  
Ivan I. Kravchenko ◽  
...  
Keyword(s):  
Large Scale ◽  
Nanosphere Lithography

SEBS-based thermoplastic elastomers containing aluminum hypophosphite and melamine cyanurate: Thermal degradation, flame retardancy, and mechanical properties

2019 ◽  
Vol 37 (2) ◽  
pp. 137-154 ◽  
Author(s):  
Xi Cheng ◽  
Jianming Wu ◽  
Yulin Li ◽  
Chenguang Yao ◽  
Guisheng Yang
Keyword(s):  
Flame Retardant ◽  
Thermoplastic Elastomers ◽  
Char Residue ◽  
Melamine Cyanurate ◽  
Char Layer ◽  
Phenylene Oxide ◽  
Peak Heat Release Rate ◽  
Ul 94 ◽  
Flame Retardant Properties ◽  
Aluminum Hypophosphite

Aluminum hypophosphite combined with melamine cyanurate and poly(phenylene oxide) was applied to flame-retard TPE-S system (blends of SEBS and polyolefin). The flame-retardant properties of the TPE-S/AHP/MCA/PPO were investigated by LOI and vertical burning test (UL-94). The results indicated that TPE-S containing 16 wt% AHP, 20 wt% MCA, and 10 wt% PPO reached a V-0 rating in the UL-94 test, and its LOI value was 28.2%. It performed well in the cone calorimeter (reduction in peak heat release rate from 2001 to 494 kW m−2). Thermogravimetric-Fourier transform infrared spectroscopy tests showed that AHP and MCA acted in gaseous phase, while AHP and PPO helped to form char residue. The SEM graphs demonstrated that continuous and compact films cover bubbles of the char layer in TPE-S/AHP/MCA/PPO. The proposed flame-retardant mechanisms of such systems were summarized.

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