Electrophoretic Deposition Kinetics of ZnO Nanoparticles into an Opal Template and Fabrication of Well-Ordered Macroporous Structure

2009 ◽  
Vol 156 (6) ◽  
pp. E91 ◽  
Author(s):  
Yi-Wen Chung ◽  
Ing-Chi Leu ◽  
Jian-Hong Lee ◽  
Min-Hsiung Hon
Keyword(s):  
Electrophoretic Deposition ◽  
Zno Nanoparticles ◽  
Macroporous Structure ◽  
Deposition Kinetics ◽  
Ordered Macroporous ◽  
Kinetics Of ◽  
Opal Template

Quantitative evaluation of electrophoretic deposition kinetics of graphene oxide

Carbon ◽  
2014 ◽  
Vol 67 ◽  
pp. 656-661 ◽  
Author(s):  
Mani Diba ◽  
Ainara García-Gallastegui ◽  
Robin N. Klupp Taylor ◽  
Fatemeh Pishbin ◽  
Mary P. Ryan ◽  
...  
Keyword(s):  
Graphene Oxide ◽  
Quantitative Evaluation ◽  
Electrophoretic Deposition ◽  
Deposition Kinetics ◽  
Kinetics Of

Microfibres Containing Laminates Prepared by EPD: Kinetics of Co-Deposition

2015 ◽  
Vol 654 ◽  
pp. 65-69 ◽  
Author(s):  
Hynek Hadraba ◽  
Zdeněk Chlup ◽  
Daniel Drdlík ◽  
Jaroslav Cihlář
Keyword(s):  
Electrophoretic Deposition ◽  
In Situ Monitoring ◽  
Alumina Powder ◽  
Deposition Kinetics ◽  
Layer Interface ◽  
Mixture Prior ◽  
Composite Deposition ◽  
Kinetics Of

The aim of this work was preparation of alumina laminates and fibre reinforced alumina containing zirconia micro-fibres inside the inter-layer interface. Electrophoretic deposition was performed from concentrated isopropanolic suspensions stabilised by monochloracetic acid containing mixture of alumina powder and certain amount of zirconia micro-fibres. A method for in-situ monitoring of deposited amount of mixture of particles and fibres mass was applied to control deposition kinetics. Two different approaches for composite deposition were applied: pre-milling of powders mixture prior electrophoretic deposition and milling of suspension containing stabilization aid. Applying the optimised procedure the alumina laminates were prepared consisting of fibres in the interlayer boundary affected dramatically fracture response of these materials.

Supercritical Fluid Deposition of Ruthenium Thin Films: A Kinetic Study

2007 ◽  
Vol 992 ◽  
Author(s):  
Christos F. Karanikas ◽  
James J. Watkins
Keyword(s):  
Thin Films ◽  
Growth Rate ◽  
Deposition Temperature ◽  
Zero Order ◽  
Measurable Effect ◽  
Deposition Rates ◽  
Reaction Pressure ◽  
Deposition Kinetics ◽  
First Order ◽  
Kinetics Of

AbstractThe kinetics of the deposition of ruthenium thin films from the hydrogen assisted reduction of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)(1,5-cyclooctadiene)ruthenium(II), [Ru(tmhd)2cod], in supercritical carbon dioxide was studied in order to develop a rate expression for the growth rate as well as to determine a mechanism for the process. The deposition temperature was varied from 240°C to 280°C and the apparent activation energy was 45.3 kJ/mol. Deposition rates up to 30 nm/min were attained. The deposition rate dependence on precursor concentrations between 0 and 0.2 wt. % was studied at 260°C with excess hydrogen and revealed first order deposition kinetics with respect to precursor at concentrations lower then 0.06 wt. % and zero order dependence at concentrations above 0.06 wt. %. The effect of reaction pressure on the growth rate was studied at a constant reaction temperature of 260°C and pressures between 159 bar to 200 bar and found to have no measurable effect on the growth rate.

The Influence of Temperature and Concentration on Copper Deposition Kinetics in Supercritical Carbon Dioxide

2004 ◽  
Vol 812 ◽  
Author(s):  
Yinfeng Zong ◽  
James J. Watkins
Keyword(s):  
Carbon Dioxide ◽  
Supercritical Carbon Dioxide ◽  
Supercritical Fluids ◽  
Zero Order ◽  
Copper Deposition ◽  
Deposition Kinetics ◽  
Zero Order Kinetics ◽  
Concentration Interval ◽  
Kinetics Of ◽  
Supercritical Carbon

AbstractThe kinetics of copper deposition by the hydrogen-assisted reduction of bis(2,2,7- trimethyloctane-3,5-dionato)copper in supercritical carbon dioxide was studied as a function of temperature and precursor concentration. The growth rate was found to be as high as 31.5 nm/min. Experiments between 220 °C and 270 °C indicated an apparent activation energy of 51.9 kJ/mol. The deposition kinetics were zero order with respect to precursor at 250 °C and 134 bar and precursor concentrations between 0.016 and 0.38 wt.% in CO2. Zero order kinetics over this large concentration interval likely contributes to the exceptional step coverage obtained from Cu depositions from supercritical fluids.

Study on deposition kinetics of high-K materials by X-ray fluorescence techniques

2004 ◽  
Vol 59 (8) ◽  
pp. 1183-1187 ◽  
Author(s):  
Caterina Carpanese ◽  
Barbara Crivelli ◽  
Massimo Caniatti
Keyword(s):  
X Ray ◽  
Deposition Kinetics ◽  
Fluorescence Techniques ◽  
High K ◽  
High K Materials ◽  
Kinetics Of
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