Interface Properties Improvement of Ge/Al2O3 and Ge/GeO2/Al2O3 Gate Stacks using Molecular Beam Deposition
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1995 ◽
Vol 148
(4)
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pp. 336-344
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1995 ◽
Vol 34
(Part 1, No. 7B)
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pp. 3884-3888
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2017 ◽
Vol 8
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pp. 1191-1204
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1999 ◽
Vol 149
(1-2)
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pp. 213-227
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