Nucleation and Growth of Noble Metals on Oxide Surfaces Using Atomic Layer Deposition

2019 ◽  
Vol 3 (15) ◽  
pp. 271-278 ◽  
Author(s):  
J. W. Elam ◽  
A. V. V. Zinovev ◽  
Michael J. Pellin ◽  
David J. Comstock ◽  
Mark C. Hersam
Keyword(s):  
Atomic Layer Deposition ◽  
Noble Metals ◽  
Atomic Layer ◽  
Nucleation And Growth ◽  
Oxide Surfaces ◽  
Layer Deposition

Nucleation and Growth During Tungsten Atomic Layer Deposition on Oxide Surfaces

2001 ◽  
Vol 672 ◽  
Author(s):  
S. M. George ◽  
J.W. Elam ◽  
R.K. Grubbs ◽  
C.E. Nelson
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Nucleation And Growth ◽  
Oxide Surfaces ◽  
Layer By Layer ◽  
Growth Region ◽  
Tungsten Film ◽  
Layer Deposition ◽  
Initial Nucleation ◽  
Reaction Cycles

ABSTRACTNucleation and growth has been studied during tungsten (W) atomic layer deposition (ALD) on oxide surfaces. Auger electron spectroscopy (AES) was utilized to examine the deposition of W during the sequential (A) WF6 and (B) Si2H6 reaction cycles that define W ALD. The AES results displayed an initial nucleation period of ∼10 AB cycles to deposit one tungsten monolayer on SiO2. Subsequently, the W and Si AES signals grew and oscillated dramatically versus WF6 and Si2H6 exposures. The increase in the W AES signal in the growth region was consistent with a W ALD growth rate of 3.5 Å per AB cycle. An examination of the oxygen and tungsten AES signals versus AB cycles indicated that W ALD displayed nearly ideal “layer-by-layer”, Frank- van der Merwe growth after the nucleation period. On Al2O3, the AES results displayed a much shorter nucleation period for W ALD. Only 3 AB cycles were required to deposit one tungsten monolayer. Subsequently, the tungsten film grew at a rate of 3.6 Å per AB cycle. The initial nucleation period and growth mechanism during ALD are important because they will affect the roughness of the resulting ALD film.

ChemInform Abstract: Atomic Layer Deposition of Noble Metals and Their Oxides

ChemInform ◽  
2014 ◽  
Vol 45 (11) ◽  
pp. no-no
Author(s):  
Jani Haemaelaeinen ◽  
Mikko Ritala ◽  
Markku Leskelae
Keyword(s):  
Atomic Layer Deposition ◽  
Noble Metals ◽  
Atomic Layer ◽  
Layer Deposition

Nucleation and Growth of Silver Nanoparticles by AB and ABC-Type Atomic Layer Deposition

2014 ◽  
Vol 118 (31) ◽  
pp. 17655-17661 ◽  
Author(s):  
Sicelo S. Masango ◽  
Lingxuan Peng ◽  
Laurence D. Marks ◽  
Richard P. Van Duyne ◽  
Peter C. Stair
Keyword(s):  
Silver Nanoparticles ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Nucleation And Growth ◽  
Layer Deposition

Nucleation and growth process of atomic layer deposition platinum nanoparticles on strontium titanate nanocuboids

2017 ◽  
Vol 28 (18) ◽  
pp. 185704 ◽  
Author(s):  
Chuandao Wang ◽  
Linhua Hu ◽  
Kenneth Poeppelmeier ◽  
Peter C Stair ◽  
Laurence Marks
Keyword(s):  
Atomic Layer Deposition ◽  
Strontium Titanate ◽  
Platinum Nanoparticles ◽  
Growth Process ◽  
Atomic Layer ◽  
Nucleation And Growth ◽  
Layer Deposition

scholarly journals Atomic layer deposition of perovskites—Part 1: Fundamentals of nucleation and growth

2019 ◽  
Vol 2 (1) ◽  
Author(s):  
Abdulla Bin Afif ◽  
Anup L. Dadlani ◽  
Stephanie Burgmann ◽  
Peter Köllensperger ◽  
Jan Torgersen
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Nucleation And Growth ◽  
Layer Deposition
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