Superconducting Thin Films of Niobium, Tantalum, Tantalum Nitride, Tantalum Carbide, and Niobium Nitride

1964 ◽  
Vol 111 (8) ◽  
pp. 936 ◽  
Author(s):  
D. Gerstenberg ◽  
P. M. Hall
Keyword(s):  
Thin Films ◽  
Niobium Nitride ◽  
Tantalum Carbide ◽  
Tantalum Nitride ◽  
Superconducting Thin Films

Pseudogap Effects in Disordered Niobium Nitride Superconducting Thin Films

2013 ◽  
Vol 13 (2) ◽  
pp. 330-332 ◽  
Author(s):  
R. Baskaran ◽  
A.V. ThanikaiAr ◽  
G. Chinnamma ◽  
M.P. Janawadkar
Keyword(s):  
Thin Films ◽  
Niobium Nitride ◽  
Superconducting Thin Films

Single-Source Precursors to Niobium Nitride and Tantalum Nitride Films

1993 ◽  
Vol 327 ◽  
Author(s):  
Charles H. Winter ◽  
Kumudini C. Jayaratne ◽  
James W. Proscia
Keyword(s):  
Thin Films ◽  
Niobium Nitride ◽  
Tantalum Nitride ◽  
Single Source ◽  
Single Source Precursors ◽  
Temperature Range ◽  
Glass Substrates

AbstractHerein we report our efforts to prepare new precursors to niobium nitride (NbN) and tantalum nitride (TAN, Ta3N5) thin films. Treatment of MC15 (M = Nb, Ta) with tertbutylamine in benzene solvent affords complexes of the formula [MCI2 (NtBu)(NHtBu)(NH2tBu)]2. The niobium complex [NbC12(NtBu)(NHtBu)- (NH2tBu)]2 affords NbN films on glass substrates between 500-600 °C, while the tantalum analog [TaC12(NtBu)(NHtBu)(NH2tBu)]2 gives films of Ta3N5 in this temperature range. Treatment of MCI5 (M = Nb, Ta) with 1,1-dimethylhydrazine in dichloromethane solvent affords complexes of the formula [MC12(NNMe2)(NHNMe2)(NH2NMe2)]n. These hydrazido complexes afford cubic MN films upon glass substrates at ≥400°C. Analyses of the films are presented.

scholarly journals Measurement of Electrical Properties of Superconducting YBCO Thin Films in the VHF Range

Materials ◽  
2021 ◽  
Vol 14 (12) ◽  
pp. 3360
Author(s):  
Yakir Dahan ◽  
Eldad Holdengreber ◽  
Elichai Glassner ◽  
Oz Sorkin ◽  
Shmuel E. Schacham ◽  
...  
Keyword(s):  
Thin Films ◽  
Theoretical Model ◽  
Quality Factor ◽  
High Frequency ◽  
Unit Length ◽  
Superconducting Thin Films ◽  
Electrical Parameters ◽  
Very High Frequency ◽  
Production Constraints ◽  
Very High

A new measurement technique of electrical parameters of superconducting thin films at the Very High Frequency (VHF) range is described, based on resonators with microstrip (MS) structures. The design of an optimal resonator was achieved, based on a thorough theoretical analysis, which is required for derivation of the exact configuration of the MS. A theoretical model is presented, from which an expression for the attenuation of a MS line can be derived. Accordingly, simulations were performed, and an optimal resonator for the VHF range was designed and implemented. Production constraints of YBa2Cu3O7 (YBCO) limited the diameter of the sapphire substrate to 3″. Therefore, a meander configuration was formed to fit the long λ/4 MS line on the wafer. By measuring the complex input reflection coefficients of a λ/4 resonator, we extracted the quality factor, which is mainly affected by the dielectric and conductor attenuations. The experimental results are well fitted by the theoretical model. The dielectric attenuation was calculated using the quasi-static analysis of the MS line. An identical copper resonator was produced and measured to compare the properties of the YBCO resonator in reference to the copper one. A quality factor of ~6·105 was calculated for the YBCO resonator, three orders of magnitude larger than that of the copper resonator. The attenuation per unit length of the YBCO layer was smaller by more than five orders of magnitude than that of the copper.

Plasmonic characteristics of niobium nitride thin films modulated by assisting ions

2021 ◽  
Vol 24 ◽  
pp. 101024
Author(s):  
Chang Gao ◽  
Yujing Ran ◽  
Qian Guo ◽  
Tianrun Wang ◽  
Huiping Lu ◽  
...  
Keyword(s):  
Thin Films ◽  
Niobium Nitride

Transverse rectification in superconducting thin films with arrays of asymmetric defects

2007 ◽  
Vol 91 (6) ◽  
pp. 062505 ◽  
Author(s):  
E. M. Gonzalez ◽  
N. O. Nunez ◽  
J. V. Anguita ◽  
J. L. Vicent
Keyword(s):  
Thin Films ◽  
Superconducting Thin Films

Substrate bias effects during R-F sputtering of Y-Ba-Cu-O films

1990 ◽  
Vol 5 (4) ◽  
pp. 677-679 ◽  
Author(s):  
A. J. Drehman ◽  
M. W. Dumais
Keyword(s):  
Thin Films ◽  
Strontium Titanate ◽  
Reactive Sputtering ◽  
Negative Bias ◽  
Superconducting Thin Films ◽  
Substrate Bias ◽  
Composition Control ◽  
Zero Resistance

Y-Ba-Cu-O films were made by R-F diode sputtering using a single oxide target. It was found that if a small negative bias is applied to the substrate, the etching associated with reactive sputtering is significantly reduced. This results in better composition control and uniformity, which are quite important for the formation of superconducting thin films. Films deposited on strontium titanate, when annealed in oxygen, become superconducting with zero resistance at 89 K.

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