The Epitaxial Growth of GaP by a Ga[sub 2]O Vapor Transport Mechanism

1964 ◽  
Vol 111 (2) ◽  
pp. 180 ◽  
Author(s):  
C. J. Frosch
1967 ◽  
Vol 6 (8) ◽  
pp. 1013-1013 ◽  
Author(s):  
Yoshinobu Tsujimoto ◽  
Masakazu Fukai

2010 ◽  
Vol 645-648 ◽  
pp. 1183-1186
Author(s):  
Yuri N. Makarov ◽  
T.Yu. Chemekova ◽  
O.V. Avdeev ◽  
N. Mokhov ◽  
S.S. Nagalyuk ◽  
...  

AlN substrates are produced by Physical Vapor Transport (PVT) growth of AlN bulk single crystals followed by post growth processing of the crystals (calibration, slicing, lapping, and polishing). The AlN substrates are suitable for epitaxial growth. The substrates may be used for development of devices such as ultra violet (UV) light emitting diodes (LEDs) and laser diodes (LDs), Piezo-Electric Transducers, SAW devices, RF Transistors, etc.


1972 ◽  
Vol 13-14 ◽  
pp. 393-396 ◽  
Author(s):  
Heribert Wiedemeier ◽  
Eugene A Irene ◽  
Asim K Chaudhuri

2018 ◽  
Vol 57 (16) ◽  
pp. 10090-10099 ◽  
Author(s):  
Omar Concepción ◽  
Miguel Galván-Arellano ◽  
Vicente Torres-Costa ◽  
Aurelio Climent-Font ◽  
Daniel Bahena ◽  
...  

2016 ◽  
Vol 858 ◽  
pp. 5-10 ◽  
Author(s):  
Adrian R. Powell ◽  
Joseph J. Sumakeris ◽  
Yuri Khlebnikov ◽  
Michael J. Paisley ◽  
R.T. Leonard ◽  
...  

The growth of large diameter silicon carbide (SiC) crystals produced by the physical vapor transport (PVT) method is outlined. Methods to increase the crystal diameters, and to turn these large diameter crystals into substrates that are ready for the epitaxial growth of SiC or other non homogeneous epitaxial layers are discussed. We review the present status of 150 mm and 200 mm substrate quality at Cree, Inc. in terms of crystallinity, dislocation density as well as the final substrate surface quality.


1983 ◽  
Vol 130 (1) ◽  
pp. 252-254 ◽  
Author(s):  
Heribert Wiedemeier ◽  
Andrius E. Uzpurvis

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