Discussion of “Silicon Deposition on a Rotating Disk” [R. Pollard and J. Newman (pp. 744–752, Vol. 127, No. 3)]

1980 ◽  
Vol 127 (12) ◽  
pp. 2755-2756
Author(s):  
Michael L. Hitchman
Keyword(s):  
Rotating Disk ◽  
Silicon Deposition

scholarly journals Silicon Deposition on a Rotating Disk

1980 ◽  
Vol 127 (3) ◽  
pp. 744-752 ◽  
Author(s):  
Richard Pollard ◽  
John Newman
Keyword(s):  
Rotating Disk ◽  
Silicon Deposition

A Sectional Model for Investigating Microcontamination in a Rotating Disk CVD Reactor

2004 ◽  
Vol 38 (12) ◽  
pp. 1161-1170 ◽  
Author(s):  
Z. Sun ◽  
R. L. Axelbaum ◽  
R. W. Davis
Keyword(s):  
Rotating Disk ◽  
Sectional Model

2D and 1D modeling of AMT barrel reactors for silicon deposition

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-273-Pr8-280
Author(s):  
M. Masi ◽  
C. Cavallotti ◽  
S. Carrà ◽  
D. Crippa ◽  
G. Vaccari
Keyword(s):  
Silicon Deposition ◽  
1D Modeling

Fabrication and Characterization of Nife Thin Film Composition Modulated Alloys

1996 ◽  
Vol 451 ◽  
Author(s):  
S. D. Leith ◽  
D. T. Schwartz
Keyword(s):  
Rotation Rate ◽  
Stripping Voltammetry ◽  
Rotating Disk ◽  
Oscillation Period ◽  
Rotating Disk Electrode ◽  
Disk Rotation ◽  
Rate Oscillation ◽  
Composition And Structure ◽  
Spatially Periodic

ABSTRACTDescribed are results showing that an oscillating flow-field can induce spatially periodic composition variations in electrodeposited NiFe films. Flow-induced NiFe composition modulated alloys (CMA's) were deposited on the disk of a rotating disk electrode by oscillating the disk rotation rate during galvanostatic plating. Deposit composition and structure were investigated using potentiostatic stripping voltammetry and scanning probe microscopy. Results illustrate a linear relationship between the composition modulation wavelength and the flow oscillation period. CMA's with wavelengths less than 10 nm can be fabricated when plating with a disk rotation rate oscillation period less than 3 seconds.

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