Reactive Ion Beam Etching with  CF 4: Characterization of a Kaufman Ion Source and Details of SiO2 Etching

1982 ◽  
Vol 129 (3) ◽  
pp. 585-591 ◽  
Author(s):  
T. M. Mayer ◽  
R. A. Barker
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Ion Beam Etching ◽  
Reactive Ion Beam Etching ◽  
Sio2 Etching

Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source

1982 ◽  
Vol 21 (Part 2, No. 1) ◽  
pp. L4-L6 ◽  
Author(s):  
Seitaro Matsuo ◽  
Yoshio Adachi
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Ecr Ion Source ◽  
Ion Beam Etching ◽  
Broad Beam ◽  
Reactive Ion Beam Etching

Characterization of Sidewall Damage Induced by Reactive Ion-Beam Etching

1992 ◽  
Vol 31 (Part 1, No. 5A) ◽  
pp. 1541-1544 ◽  
Author(s):  
Akihiro Matsutani ◽  
Fumio Koyama ◽  
Kenichi Iga
Keyword(s):  
Ion Beam ◽  
Ion Beam Etching ◽  
Reactive Ion Beam Etching

Reactive Ion Beam Etching Using a Selective Gallium Doping Method

1989 ◽  
Vol 28 (Part 2, No. 9) ◽  
pp. L1671-L1672
Author(s):  
Kyusaku Nishioka ◽  
Hiroaki Morimoto ◽  
Yoji Mashiko ◽  
Tadao Kato
Keyword(s):  
Ion Beam ◽  
Ion Beam Etching ◽  
Gallium Doping ◽  
Reactive Ion Beam Etching

Characterization of TMR Head Durability against Lapping Based on Magnetic Performance

2012 ◽  
Vol 523-524 ◽  
pp. 961-966
Author(s):  
Hideaki Tanaka ◽  
Yukio Maeda
Keyword(s):  
Ion Beam ◽  
Hysteresis Loops ◽  
Areal Density ◽  
Noise Spectrum ◽  
Crystallographic Analysis ◽  
Magnetic Characteristics ◽  
Ion Beam Etching ◽  
Verification Method ◽  
Magnetic Performance

Magnetic recording technologies are continuing to advance toward higher areal densities, driven by the availability of tunneling magnetoresistive (TMR) heads. However, high areal density heads require smaller physical dimensions, and this can render TMR heads more vulnerable to mechanical stresses generated during the lapping process. Although is important to verify the durability of TMR heads against lapping, it is very difficult to perform a crystallographic analysis of the affected layer because of the small dimensions involved. In this study, we attempted to establish an advanced TMR head verification method based on a magnetic performance analysis involving micro-Kerr hysteresis loops and the magnetic noise spectrum. We found that the magnetic performance changed when nanoscale scratches were removed from the lapped surface using ion beam etching. This indicates that the lapping process produces an affected layer which deteriorates the magnetic characteristics of the TMR head. A correlation was also found between the change in magnetic performance and the morphology of lapped surface.

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